Claims
- 1. A process for producing a corrosion-resistant permanent magnet, comprising:
- providing a sintered body comprising 10 to 30 atomic R wherein R is at least one element selected from the group consisting of Nd, Pr, Dy, Ho and Tb or a mixture of said at least one element and at least one selected from the group consisting of La, Ce, Sm, Gd, Er, Eu, Tm, Yb, Lu and Y, 2 to 28 atomic % B and 65 to 80 atomic % Fe, and having a major phase of a tetragonal crystal structure;
- coating the surface of the sintered permanent magnet body with a noble metal film layer consisting essentially of at least one metal selected from the group consisting of Pd, Ag, Pt, Au and alloys thereof; and
- coating said noble metal film layer with a base metal film layer consisting essentially of at least one metal selected from the group consisting of Ni, Cu, Sn, Al, Cr, Zn, Co and alloys thereof.
- 2. A process for producing a corrosion-resistant permanent magnet, comprising:
- providing a sintered body comprising 10 to 30 atomic % R wherein R is at least one element selected from the group consisting of Nd, Pr, Dy, Ho and Tb or a mixture of said at least one element and at least one selected from the group consisting of La, Ce, Sm, Gd, Er, Eu, Tm, Yb, Lu and Y, 2 to 28 atomic % B and 65 to 80 atomic % Fe, and having a major phase of a tetragonal crystal structure;
- coating the surface of the sintered body with a noble metal film layer consisting essentially of at least one metal selected from the group consisting of Pd, Ag, Pt, Au and alloys thereof;
- coating said noble metal film layer with a base metal film layer consisting essentially of at least one .metal selected from the group consisting of Ni, Cu, Sn, Al, Cr, Zn, Co and alloys thereof; and
- diffusion-treating the coated sintered body in a non-oxidizing atmosphere at 400.degree. to 700.degree. C. for such a period of time as sufficient to form diffusion layers.
- 3. The process as defined in claim 1 or 2, wherein said noble metal film layer is coated on the surface of the sintered body in the form of colloid of the noble metal dispersed in a non-aqueous solvent or an aqueous solvent.
- 4. The process as defined in claim 3, wherein the non-aqueous solvent is a volatile solvent selected from the group consisting of aromatic hydrocarbon, halogenized aliphatic hydrocarbon, aliphatic ester and ketone.
- 5. The process as defined in claim 3, wherein in solvent is a neutral solvent of pH 6.0 to 9.0.
- 6. The process as defined in claim 3, wherein the solvent is removed after said absorption of the noble metal.
- 7. The process as defined in claim 1 or 2, wherein said noble metal film layer is coated on the surface of the sintered body by means of vapor deposition.
- 8. The process as defined in claim 7, wherein the vapor deposition is any one of vacuum deposition, ion sputtering, and ion plating.
- 9. The process as defined in claim 1 or 2, wherein the noble metal film layer has a thickness of 10 to 100 angstroms.
- 10. The process as defined in claim 1 or 2, wherein the base metal film layer is coated onto the noble metal film layer by means of vapor deposition technique or electroless plating technique.
- 11. The process as defined in claim 1 or 2, wherein the coating is carried out by any one of vacuum deposition, ion sputtering, and ion plating.
- 12. The process as defined in claim 1 or 2, wherein the base metal film layer has a thickness of 25 .mu.m or less.
- 13. The process as defined in claim 12, wherein the thickness of the base metal film layer is 3 to 20 .mu.m.
- 14. The process as defined in claim 2, wherein the diffusion treatment is effected at 500.degree. to 600.degree. C. for 0.5 to 2 hours.
- 15. The process as defined in claim 1 or 2, wherein said base metal is at least one selected from the group consisting of Ni, Cu, Sn and Co.
- 16. The process as defined in claim 1 or 2, wherein no more than 20 atomic % of Fe in the sintered body is substituted by Co.
- 17. The process as defined in claim 1 or 2, wherein said sintered body further comprises at least one of additional elements M in an amount no more than the value specified below:
- ______________________________________9.5 atomic % Al, 4.5 atomic % Ti,9.5 atomic % V, 8.5 atomic % Cr,8.0 atomic % Mn, 5.0 atomic % Bi,9.5 atomic % Nb, 9.5 atomic % Ta,9.5 atomic % Mo, 9.5 atomic % W,2.5 atomic % Sb, 7 atomic % Ge,3.5 atomic % Sn, 5.5 atomic % Zr,9.0 atomic % Ni, 9.0 atomic % Si,1.1 atomic % Zn, and 5.5 atomic % Hf,______________________________________
- provided that, when two or more cf the additional elements are contained, the highest total amount thereof is no higher than the atomic % of the additional elements that is actually added in the largest amount.
- 18. The process as defined in claim 2, wherein said non-oxiding atmosphere is vacuum, reducing atmosphere or inert atmosphere.
- 19. The process as defined in claim 1 or 2, wherein a chemically and thermally stable inorganic substance is absorbed in a colloidal state dispersed in a solvent before said coating of the noble metal film layer.
- 20. The process as defined in claim 19, wherein said stable inorganic substance is metal oxide.
- 21. The process as defined in claim 9, wherein said stable inorganic substance is colloidal alumina or silica.
- 22. The process as defined in claim 21, wherein the solvent is removed after said absorption of the stable inorganic substance.
- 23. The process as defined in claim 2, wherein the diffusion-heat-treatment is carried out simultaneously with an aging step.
Priority Claims (6)
Number |
Date |
Country |
Kind |
62-73920 |
Mar 1987 |
JPX |
|
62-90045 |
Apr 1987 |
JPX |
|
62-90046 |
Apr 1987 |
JPX |
|
62-100980 |
Apr 1987 |
JPX |
|
62-100981 |
Apr 1987 |
JPX |
|
62-297975 |
Nov 1987 |
JPX |
|
Parent Case Info
This application is a divisional of U.S. application Ser. No. 172,395, filed Mar. 24, 1988, now U.S. Pat. No. 4,942,098.
Foreign Referenced Citations (3)
Number |
Date |
Country |
0101552 |
Feb 1984 |
EPX |
0106948 |
May 1984 |
EPX |
0134304 |
Mar 1985 |
EPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
172395 |
Mar 1988 |
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