Claims
- 1. A system for producing sterile, pyrogen free water for injection, said system comprising:
a hydrothermal processing device for sterilization and depyrogenation of potable water, a multi-stage flash evaporation device for salt removal and heat recovery, and an in-situ high-temperature filtration device for particulate removal, said hydrothermal processing device (reactor), said flash evaporation device and said filtration device being operable simultaneously for treating potable water to sterile, demineralized, pyrogen free water the exposure time in said hydrothermal processing device (reactor) being less than five seconds.
- 2. A system as claimed in claim 1, wherein the flash evaporation device includes at least two repeat modules.
- 3. A system as claimed in claim 2, wherein each of the repeat modules includes a heat exchanger section and an evaporator section.
- 4. A system as claimed in claim 1, wherein the potable water is treated at a temperature of at least 230° C. and at a pressure at least equal to the pressure of saturated steam at said temperature.
- 5. A system as claimed in claim 4, wherein treatment time for the potable water to sterile, pyrogen free water is 0.05 to 5 seconds, in the hydrothermal processing reactor.
- 6. A system as claimed in claim 1, wherein treatment time for the potable water to sterile, pyrogen free water is less than 0.05 seconds, in the hydrothermal processing reactor.
- 7. A system as claimed in claim 1, wherein the hydrothermal processing device includes a purge cycle where the temperature is decreased to between 100 to 200° C. to dissolve deposited solids while maintaining sterility of the equipment.
- 8. A system as claimed in claim 7, wherein water produced during the purge cycle is discarded from the hydrothermal processing device.
- 9. A system as claimed in claim 6, wherein an oxidant is added to reduce the treatment time.
- 10. A system for producing sterile, pyrogen free water for injection, said system comprising:
a low temperature filter for receiving potable water, microchannel chambers for receiving the treated potable water from the low temperature filter and for flash evaporation coupled with heat exchange, high temperature filters connected to the microchannel chambers, and a hydrothermal processing reactor connected to the microchannel chambers and the high temperature filters for, pyrogen destruction, sterilization and particulate removal.
- 11. A system as claimed in claim 10, wherein the potable water is treated at a temperature of at least 230° C. and at a pressure at-least equal to the pressure of saturated steam of said temperature.
- 12. A system as claimed in claim 11, wherein treatment time in the hydrothermal processing reactor is less than five seconds.
- 13. A system as claimed in claim 12, wherein treatment time in the hydrothermal processing reactor is from 0.05 to five seconds.
- 14. A system as claimed in claim 12, wherein treatment time in the hydrothermal processing reactor is less than 0.05 seconds.
- 15. A system as claimed in claim 10, wherein the microchannel chambers each include a heat exchanger section and an evaporator section.
- 16. A system as claimed in claim 15, wherein pressure letdown devices amongst the microchannel chambers reduce pressure of the potable water to flash off a portion of the potable water in the evaporator section and a vapor portion is caused to pass through the heat exchanger.
- 17. A process of producing sterile, demineralized, pyrogen free water from potable water in a continuous cycle, said process comprising:
passing the potable water through microchannel chambers, passing the potable water through high temperature filters, passing the potable water through a hydrothermal processing reactor, and maintaining the microchannel chambers, the high temperature filters and-the hydrothermal processing reactor at a temperature greater than 230° C. and at a pressure greater than the pressure of saturated steam at said temperature to produce sterile, demineralized, pyrogen free water from potable water in a treatment time of less than five seconds, in the hydrothermal processing reactor.
- 18. A system as claimed in claim 17, wherein an oxidant is added to reduce treatment time, the hydrothermal processing reactor.
- 19. A system as claimed in claim 18, wherein the oxidant is in a form of one of a gas, a liquid and a solid.
- 20. A system as claimed in claim 17, wherein a purging cycle is conducted at a temperature in the range of 100 to 200° C. to dissolve deposited solids.
Parent Case Info
[0001] This application is a non-provisional application claiming priority from provisional application Serial No. 60/180,278, filed Feb. 4, 2000.
Government Interests
[0002] The U.S. Government has a paid-up license in this invention and the right in limited circumstances to require the patent owner to license others on reasonable terms as provided for by the terms of contract N00014-99-M-0254 awarded by the Office of Navel Research, United States Navy.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60180278 |
Feb 2000 |
US |
Divisions (1)
|
Number |
Date |
Country |
Parent |
09771572 |
Jan 2001 |
US |
Child |
10376312 |
Mar 2003 |
US |