Claims
- 1. A process for purifying a solid material comprising contacting said solid material at a temperature approaching the melting point of said solid material with a purifying agent in molten from which is substantially non-reactive with said solid material causing the impurities in said solid material to enter said purifying material.
- 2. The process of claim 1 where said purification step is carried out at a temperature not more than 300.degree. C. below the melting point of said solid material.
- 3. The process of claim 2 where said purification step is carried out at a temperature not more than 200.degree. C. below the melting point of said solid material.
- 4. The process of claim 3 where said purification step is carried out at a temperature not more than 150.degree. C. below the melting point of said solid material.
- 5. The process of claim 4 where said purification step is carried out at a temperature not more than 100.degree. C. below the melting point of said solid material.
- 6. The process of claim 1 including the step of providing said solid material in particulate form having an average particle size with at least 1 dimension smaller than 1 mm.
- 7. The process of claim 6 including the step of grinding said solid material to an average particle size of less than 1 mm.
- 8. The process of claim 1 including the step of providing said solid material in a form wherein the surface area to weight ratio of said solid material is at least 1 cm.sup.2 per gram.
- 9. The process of claim 1 wherein said solid material to be purified is silicon and said purifying agent is selected from the class consisting of silica, a silicate of lithium, sodium, potassium, magnesium, strontium, calcium, or barium; a halide of lithium, sodium, potassium, magnesium, strontium, calcium or barium; or mixtures thereof.
- 10. The process of claim 9 wherein said purifying agent is SiO.sub.2.
- 11. The process of claim 9 wherein said molten purifying agent is selected from the class consisting of silicates of lithium, sodium, or potassium.
- 12. The process of claim 9 wherein said molten purifying agent is selected from the class consisting of a fluoride or chloride of lithium, sodium, potassium, magnesium, strontium, calcium, or barium.
- 13. The process of claim 1 including heating said solid material to be purified and said purifying agent in a vessel having a material in contact with said solid material which is substantially non-reactive with said solid material at the purification temperature.
- 14. The process of claim 1 wherein said step of contacting said solid material at a temperature approaching the melting point of said solid material with a purifying agent which is substantially non-reactive with said solid material is carried out for a period of time of from 15 minutes to 3 hours.
- 15. The process of claim 1 wherein the steps of the process are repeated at least 1 additional time to increase the purity of the final solid material product.
- 16. The process of claim 1 including the steps of continuously feeding a particulate mixture of said solid material and said purifying agent into a reactor and continuously removing purified solid material and purifying agent from said reactor.
- 17. The process of claim 1 including the further step of providing in said purifying agent a doping agent.
- 18. The process of claim 1 including the step of passing said solid material as a thin sheet through a molten bath of said purifying agent whereby the purified sheet may be used directly in the manufacture of an electronic device, such as a solar cell.
- 19. The process of claim 1 wherein said purifying agent is selected from the class consisting of purifying agents having boiling points at least above 150.degree. C. below the melting point of the solid material to be purified.
- 20. The process of claim 19 wherein said purifying agent is selected from the class consisting of purifying agents having boiling points above the melting point of the solid material to be purified.
- 21. A process for removing impurities from a solid material comprising:
- (a) providing said solid material in a form wherein the surface area to weight ratio of said solid material is at least 1 cm.sup.2 per gram;
- (b) contacting said solid material at a temperature within 300.degree. C. of the melting point of said solid material for from about 15 minutes to about 3 hours with a molten purifying agent in which the impurity to be removed from said solid material has a lower chemical potential than the impurity has in said solid material, said purifying agent being substantially non-reactive with said solid material, whereby said impurities in said solid material enter said molten purifying material; and
- (c) separating said purified solid material from said purifying agent containing impurities removed from said solid material.
- 22. The process of claim 21 wherein said solid material to be purified is selected from the class consisting of titanium, zirconium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, gallium, sodium, boron, germanium, silicon, gallium arsenide, indium phosphide, copper indium selenide, silicon nitride, boron nitride, tungsten carbide, and silicon carbide.
- 23. The process of claim 21 wherein said solid material comprises silicon and said molten purifying agent is selected from the class consisting of silica, a silicate of lithium, sodium, potassium, magnesium, strontium, calcium, or barium; a halide of lithium, sodium, potassium, magnesium, strontium, calcium or barium; or mixtures thereof.
- 24. A process for purifying silicon comprising:
- (a) prepurifying solid silicon in an acid leach;
- (b) heating said prepurified solid silicon to a temperature below the melting point of silicon;
- (c) contacting said heated solid silicon with a purifying agent which is substantially non-reactive with silicon; and
- (d) causing the impurities in the silicon to enter the purifying material.
Parent Case Info
This application is a continuation-in-part of U.S. patent application Ser. No. 711,584, filed Mar. 13, 1985 now U.S. Pat. No. 4,612,179.
PCT Information
Filing Document |
Filing Date |
Country |
Kind |
102e Date |
371c Date |
PCT/US86/00499 |
3/7/1986 |
|
|
3/7/1986 |
3/7/1986 |
Publishing Document |
Publishing Date |
Country |
Kind |
WO86/05475 |
9/25/1986 |
|
|
US Referenced Citations (11)
Foreign Referenced Citations (5)
Number |
Date |
Country |
575687 |
Feb 1959 |
BEX |
1003223 |
Jan 1977 |
CAX |
1170557 |
Jan 1959 |
FRX |
1230158 |
Sep 1960 |
FRX |
358531 |
Oct 1981 |
GBX |
Non-Patent Literature Citations (2)
Entry |
A. Sanjurjo, "Silicon Sheet for Solar Cells," Journal of Electrochemical Society, vol. 128, No. 10, Oct., 1981. |
L. Nanis, A. Sanjurjo, and S. Westphal, "Fluxing Action of NaF on Oxidized Silicon," Metallurgical Transactions B, vol. 12B, Sep., 1981. |
Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
711584 |
Mar 1985 |
|