Claims
- 1. A method for purifying single-wall carbon nanotubes comprising the steps of:
(a) oxidizing a single-wall carbon nanotube material comprising single-wall carbon nanotubes, amorphous carbon, and a metallic impurity in an oxidizing gaseous atmosphere; and (b) treating the single-wall carbon nanotube material with a solution comprising a halogen-containing acid.
- 2. The method of claim 1 wherein the oxidizing gaseous atmosphere comprises a gas selected from the group consisting of oxygen, carbon dioxide and mixtures thereof.
- 3. The method of claim 1 wherein the oxidizing gaseous atmosphere comprises water vapor.
- 4. The method of claim 1 wherein the oxidizing gaseous atmosphere comprises oxygen and water vapor.
- 5. The method of claim 1 wherein the oxidizing gaseous atmosphere comprises carbon dioxide.
- 6. The method of claim 3 wherein the water vapor is at a concentration of at least about 0.5 vol % of the oxidizing gaseous atmosphere.
- 7. The method of claim 1 wherein the oxidizing step is performed at a temperature between about 200° C. and about 500° C.
- 8. The method of claim 2 wherein the oxidizing gaseous atmosphere further comprises a gas selected from the group consisting of inert gases and nitrogen.
- 9. The method of claim 1 further comprising reoxidizing the single-wall carbon nanotube material.
- 10. The method of claim 9, wherein the reoxidizing step is performed at a higher temperature than the oxidizing step.
- 11. The method of claim 9, wherein the reoxidizing step is performed in a gaseous mixture comprising argon and water vapor.
- 12. The method of claim 9, wherein reoxidizing step is performed in a gaseous mixture comprising carbon dioxide and water vapor.
- 13. The method of claim 9, wherein the reoxidizing step is performed in at a temperature at most about 800° C.
- 14. The method of claim 9, wherein the duration of the reoxidizing step is at most about one hour.
- 15. The method of claim 1, wherein the halogen-containing acid comprises an acid selected from the group consisting of HCl, HBr, HF, HI and combinations thereof.
- 16. The method of claim 1, wherein the halogen-containing acid comprises HCl.
- 17. The method of claim 1, wherein the solution is an aqueous solution.
- 18. The method of claim 17, wherein the concentration of the halogen-containing acid is present in an amount at least 9 wt % of the aqueous solution.
- 19. The method of claim 17, wherein the concentration of HCl is present in an amount between about 9 wt % and 38 wt % of the aqueous solution.
- 20. The method of claim 1, wherein the treating step comprises sonication.
- 21. The method of claim 1, wherein the treating step comprises stirring.
- 22. The method of claim 1 further comprising:
(a) performing a second oxidizing of the single-wall carbon nanotube material after the treating step, wherein the second oxidizing step is performed utilizing a gaseous atmosphere selected from the group consisting of the oxidizing gaseous atmosphere and a different oxidizing gaseous atmosphere than the oxidizing gaseous atmosphere; and (b) performing a second treating of the single-wall carbon nanotube material after the second oxidizing step, wherein the second treating step is performed utilizing an acid solution selected from the group consisting of the solution comprising the halogen-containing acid, a first different solution comprising the halogen-containing acid, and a second different solution comprising a different halogen-containing acid.
- 23. The method of claim 22 wherein the second oxidizing step is performed at the same temperature as the oxidizing step.
- 24. The method of claim 22 wherein the second oxidizing step is performed at a temperature higher than the oxidizing step.
- 25. The method of claim 1 further comprising recovering the single-wall carbon nanotube material to obtain purified single-wall carbon nanotube material.
- 26. The method of claim 25, wherein the amorphous carbon is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 27. The method of claim 25, wherein the amorphous carbon is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 28. The method of claim 25, wherein the amorphous carbon is present in an amount at most about 0.2 wt % of the purified single-wall carbon nanotube material.
- 29. The method of claim 25, wherein
(a) the metallic impurity comprises metal; and (b) the metal is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 30. The method of claim 29, wherein the metal is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 31. The method of claim 29, wherein the metal is present in an amount at most about 0.1 wt % of the purified single-wall carbon nanotube material.
- 32. The method of claim 25, wherein the recovering step comprises filtration.
- 33. The method of claim 25, wherein the recovering step comprises washing the single-wall carbon nanotube material with water.
- 34. The method of claim 25, wherein the recovering step comprises washing the single-wall carbon nanotube material with methanol.
- 35. The method of claim 25, wherein the recovering step comprises drying the single-wall carbon nanotube material.
- 36. The method of claim 35, wherein the drying step is performed in a vacuum.
- 37. The method of claim 1 further comprising annealing the single-wall carbon nanotube material.
- 38. The method of claim 37, wherein:
(a) the annealing step is performed at a temperature between about 600° C. and about 1000° C.; and (b) the annealing step utilizes an annealing gas mixture comprising a gas selected from the group consisting of inert gases, nitrogen, carbon dioxide, and combinations thereof.
- 39. The method of claim 38, wherein the annealing gas mixture further comprises water vapor.
- 40. The method of claim 37, wherein the annealing step is performed in a vacuum.
- 41. The method of claim 1 further comprising reduction of the single-wall carbon nanotube material.
- 42. The method of claim 41, wherein the reduction step is performed at a temperature between about 250° C. and about 500° C.
- 43. The method of claim 41, wherein the reduction step is performed with a gas comprising hydrogen gas.
- 44. A method for purifying single-wall carbon nanotubes comprising the steps of:
(a) oxidizing a single-wall carbon nanotube material comprising single-wall carbon nanotubes, amorphous carbon, and a metallic impurity in an oxidizing gaseous atmosphere at a temperature between about 200° C. and about 500° C.; (b) reoxidizing the single-wall carbon nanotube material at a temperature higher than the oxidizing step; and (c) treating the single-wall carbon nanotube material with an aqueous solution comprising HCl.
- 45. The method of claim 44, wherein the oxidizing gaseous atmosphere comprises oxygen and water vapor.
- 46. The method of claim 44, wherein the oxidizing gaseous atmosphere comprises carbon dioxide.
- 47. The method of claim 44, further comprising annealing the single-wall carbon nanotube material at a temperature between about 600° C. and about 1000° C.
- 48. The method of claim 47, wherein the annealing step is performed in an annealing gas atmosphere comprising a gas selected from the group consisting of carbon dioxide, nitrogen, inert gases, and combinations thereof.
- 49. The method of claim 47, wherein the annealing gas atmosphere further comprises water vapor at a concentration of at least about 0.5 vol % of the annealing gas atmosphere.
- 50. The method of claim 44 further comprising annealing the single-wall carbon nanotube material in a vacuum.
- 51. The method of claim 47, wherein the annealing step is performed in a vacuum.
- 52. The method of claim 44, wherein the treating comprises stirring.
- 53. The method of claim 44, wherein the treating comprises sonication.
- 54. The method of claim 44 further comprising:
(a) performing a second oxidizing of the single-wall carbon nanotube material after the treating step, wherein the second oxidizing step is performed utilizing a gaseous atmosphere selected from the group consisting of the oxidizing gaseous atmosphere and a different oxidizing gaseous atmosphere than the oxidizing gaseous atmosphere; (b) performing a second reoxidizing step of the single-wall carbon nanotube material after the second oxidizing step, wherein the second reoxidizing step is performed at a higher temperature than the second oxidizing step; and (c) performing a second treating of the single-wall carbon nanotube material after the second reoxidizing step, wherein the second treating step is performed utilizing an acid solution selected from the group consisting of the solution comprising the halogen-containing acid, a first different solution comprising the halogen-containing acid, and a second different solution comprising a different halogen-containing acid.
- 55. The method of claim 54, wherein the second oxidizing step is performed at a higher temperature than the first oxidizing step.
- 56. The method of claim 55, wherein the temperature of the second oxidizing step is at most about 500° C.
- 57. The method of claim 44, wherein the concentration of the HCl is present in an amount at least about 9 wt % of the aqueous solution.
- 58. The method of claim 44, wherein the concentration of the HCl is present in an amount between about 9 wt % and about 38 wt % of the aqueous solution.
- 59. The method of claim 44 further comprising filtering the single-wall carbon nanotube material.
- 60. The method of claim 44 further comprising washing the single-wall carbon nanotube material.
- 61. The method of claim 60, wherein the washing step is performed with methanol.
- 62. The method of claim 60, wherein the washing step is performed with water.
- 63. The method of claim 44 further comprising drying the single-wall carbon nanotube material.
- 64. The method of claim 63, wherein the drying step comprises vacuum drying.
- 65. The method of claim 63 further comprising heating the single-wall carbon nanotube material in a gaseous mixture comprising carbon dioxide and water vapor after the drying step.
- 66. The method of claim 65, wherein the heating step is performed at a temperature at most about 800° C.
- 67. The method of claim 44 further comprising annealing the single-wall carbon nanotube material in a gaseous atmosphere comprising an inert gas.
- 68. The method of claim 67, wherein the inert gas comprises argon.
- 69. The method of claim 44 further comprising annealing the single-wall carbon nanotube material in a gaseous atmosphere comprising nitrogen.
- 70. The method of claim 67, wherein the gaseous atmosphere comprises water vapor.
- 71. The method of claim 43 further comprising recovering the single-wall carbon nanotube material to obtain purified single-wall carbon nanotube material.
- 72. The method of claim 71, wherein the amorphous carbon is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 73. The method of claim 71, wherein the amorphous carbon is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 74. The method of claim 71, wherein the amorphous carbon is present in an amount at most about 0.2 wt % of the purified single-wall carbon nanotube material.
- 75. The method of claim 71, wherein
(a) the metallic impurity comprises metal; and (b) the metal is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 76. The method of claim 75, wherein the metal is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 77. The method of claim 75, wherein the metal is present in an amount at most about 0.2 wt % of the purified single-wall carbon nanotube material.
- 78. A single-wall carbon nanotube material comprising a mixture of single-wall carbon nanotubes, amorphous carbon, and a metallic impurity, wherein the amorphous carbon is present in an amount at most about 5 wt % of the mixture.
- 79. The single-wall carbon nanotube material of claim 78, wherein the single-wall carbon nanotube material is in a macroscopic amount.
- 80. The single-wall carbon nanotube material of claim 78, wherein the amorphous carbon is present in an amount at most about 1 wt % of the mixture.
- 81. The single-wall carbon nanotube material of claim 80, wherein the single-wall carbon nanotube material is in a macroscopic amount.
- 82. The single-wall carbon nanotube material of claim 78, wherein the amorphous carbon is present in an amount at most about 0.2 wt % of the mixture.
- 83. The single-wall carbon nanotube material of claim 80, wherein the single-wall carbon nanotube material is in a macroscopic amount.
- 84. A single-wall carbon nanotube material comprising a mixture of single-wall carbon nanotubes, amorphous carbon, and metallic impurity, wherein
(a) the metallic impurity comprises metal; and (b) the metal is present in an amount at most about 5 wt % of the mixture.
- 85. The single-wall carbon nanotube material of claim 84, wherein the single-wall carbon nanotube material is in a macroscopic amount.
- 86. The single-wall carbon nanotube material of claim 84, wherein the amorphous carbon is present in an amount at most about 5 wt % of the mixture.
- 87. The single-wall carbon nanotube material of claim 84, wherein the metal is present in an amount at most about 1 wt % of the mixture.
- 88. The single-wall carbon nanotube material of claim 87, wherein the single-wall carbon nanotube material is in a macroscopic amount.
- 89. The single-wall carbon nanotube material of claim 87, wherein the amorphous carbon is present in an amount at most about 1 wt % of the mixture.
- 90. The single-wall carbon nanotube material of claim 84, wherein metal is present in an amount at most about 0.1 wt % of the mixture.
- 91. The single-wall carbon nanotube material of claim 90, wherein the single-wall carbon nanotube material is in a macroscopic amount.
- 92. The single-wall carbon nanotube material of claim 90, wherein the amorphous carbon is present in an amount at most about 0.2 wt % of the mixture.
- 93. The purified single-wall carbon nanotube material of claim 84, wherein the purified single-wall carbon nanotube material is present in a material selected from the group consisting of composite materials, electrochemical materials, fibers, catalyst supports, films, coatings, and inks.
- 94. The purified single-wall carbon nanotube material of claim 84, wherein the purified single-wall carbon nanotube material is present in an article comprising a material selected from the group consisting of electrodes of fuel cells, electrodes of capacitors, electrodes of batteries, electromagnetic shielding materials, radio-frequency shielding materials, radar-absorbing materials, and optically-active materials.
- 95. The purified single-wall carbon nanotube material of claim 84, wherein the purified single-wall carbon nanotube material is present in an electronic device selected from the group consisting of sensors, field emission cathodes, transistors, pass elements, capacitors, inductors, resistors, connectors, switches, wires, antennae, transducers, and electrical transmission cables.
- 96. A purified single-wall carbon nanotube material made by the process comprising:
(a) oxidizing a single-wall carbon nanotube material comprising single-wall carbon nanotubes, amorphous carbon, and a metallic impurity in an oxidizing gaseous atmosphere; (b) treating the single-wall carbon nanotube material with a solution comprising a halogen-containing acid; and (c) recovering the single-wall carbon nanotubes to obtain purified single-wall carbon nanotube material, wherein the amorphous carbon is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 97. The single-wall carbon nanotube material of claim 96, wherein the amorphous carbon is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 98. The single-wall carbon nanotube material of claim 96, wherein the amorphous carbon is present in an amount at most about 0.2 wt % of the purified single-wall carbon nanotube material.
- 99. A single-wall carbon nanotube material made by the process comprising:
(a) oxidizing a single-wall carbon nanotube material comprising single-wall carbon nanotubes, amorphous carbon, and a metallic impurity in an oxidizing gaseous atmosphere; (b) treating the single-wall carbon nanotube material with a solution comprising a halogen-containing acid; and (c) recovering the single-wall carbon nanotubes to obtain purified single-wall carbon nanotube material, wherein
(i) the metallic impurity comprises metal, and (ii) the metal is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 100. The single-wall carbon nanotube material of claim 99, wherein the amorphous carbon is present in an amount at most about 5 wt % of the purified single-wall carbon nanotube material.
- 101. The single-wall carbon nanotube material of claim 99, wherein the metal is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 102. The single-wall carbon nanotube material of claim 101, wherein the amorphous carbon is present in an amount at most about 1 wt % of the purified single-wall carbon nanotube material.
- 103. The single-wall carbon nanotube material of claim 99, wherein the metal is present in an amount at most about 0.1 wt % of the purified single-wall carbon nanotube material.
- 104. The single-wall carbon nanotube material of claim 103, wherein the amorphous carbon is present in an amount at most about 0.2 wt % of the purified single-wall carbon nanotube material.
- 105. A method for purifying carbon nanotubes comprising the steps of:
(a) oxidizing a carbon nanotube material comprising carbon nanotubes, amorphous carbon, and a metallic impurity in an oxidizing gaseous atmosphere; and (b) treating the carbon nanotube material with a solution comprising a halogen-containing acid.
- 106. A method for purifying carbon nanotubes comprising the steps of:
(a) oxidizing a carbon nanotube material comprising carbon nanotubes, amorphous carbon, and a metallic impurity in an oxidizing gaseous atmosphere at a temperature between about 200° C. and about 500° C.; (b) reoxidizing the carbon nanotube material at a temperature higher than the oxidizing step; and (c) treating the carbon nanotube material with an aqueous solution comprising HCl.
CROSS-REFERENCES TO RELATED APPLICATION
[0001] This application claims priority from U.S. provisional application, Serial No. 60/268,228 filed Feb. 12, 2001, and No. 60/284,419 filed Apr. 17, 2001, which applications are each incorporated herein by reference.
[0002] This patent application is related to U.S. patent application Ser. No. ______, “GAS PHASE PROCESS FOR PURIFYING SINGLE-WALL is CARBON NANOTUBES AND COMPOSITIONS THEREOF,” to Smalley, et al., (Attorney Docket No. 11321-P021US), filed concurrent herewith. This United States Patent Application is also incorporated herein by reference.
Government Interests
[0003] This invention was made with United States Government support under Grant 5 No. NCC9-77 and Grant No. DMR-0073046 awarded by the National Aeronautical and Space Administration and the National Science Foundation, respectively. Government may have certain rights in the invention.
Provisional Applications (2)
|
Number |
Date |
Country |
|
60268228 |
Feb 2001 |
US |
|
60284419 |
Apr 2001 |
US |