Claims
- 1. An acid gas scrubbing process providing for the selective removal of a cyclic urea reaction product which forms as a by-product of the acid gas removal, said process comprising:
- a. contacting an acid gas mixture with an aqueous solution in an absorption zone, said aqueous solution comprising a basic alkali salt, or metal hydroxide selected from the group consisting of alkali metal bicarbonates, carbonates, hydroxides, borates, phosphates and their mixtures, and an activator for said basic salt comprising at least one sterically hindered amine having the generic formula:
- R--NH--(CH.sub.2).sub.m --NH.sub.2
- where R is a secondary or tertiary alkyl or cycloalkyl hydrocarbon having 4-20 carbon atoms and m is 2-5, at elevated temperatures and pressures such that there is formed a cyclic urea reaction product having the formula: ##STR2## where R is a secondary or tertiary alkyl or cycloalkyl hydrocarbon having 4-20 carbon atoms and m is 0-3;
- b. passing said acid gas rich aqueous solution to a regeneration zone where it is contacted with steam to remove the acid gas impurities therefrom;
- c. cooling a portion of the lean solution exiting from said regeneration zone to a temperature ranging from 180.degree.-80.degree. F. to selectively precipitate the cyclic urea from said lean solution;
- d. passing said lean solution containing said precipitated cyclic urea to a separation zone to remove at least a portion of the cyclic urea from said lean solution.
- 2. The process of claim 1 wherein said sterically hindered amine is an N-alkyl alkylene diamine.
- 3. An acid gas scrubbing process providing for the selective removal of a cyclic urea reaction product which forms as a by-product of the acid gas removal, said process comprising:
- a. contacting an acid gas mixture with an aqueous solution in an absorption zone, said aqueous solution comprising a basic alkali salt, or metal hydroxide selected from the group consisting of alkali metal bicarbonates, carbonates, hydroxides, borates, phosphates and their mixtures, and an activator for said basic salt comprising at least one sterically hindered amine having the generic formula:
- R--NH--(CH.sub.2).sub.m --NH.sub.2
- where R is a secondary or tertiary alkyl or cycloalkyl hydrocarbon having 4-20 carbon atoms and m is 2-5, at elevated temperatures and pressures such that there is formed a cyclic urea reaction product having the formula: ##STR3## where R is a secondary or tertiary alkyl or cycloalkyl hydrocarbon having 4-20 carbon atoms and m is 0-3;
- b. passing said acid gas rich aqueous solution to a regeneration zone where it is contacted with steam to remove the acid gas impurities therefrom;
- c. cooling a portion of the lean solution exiting from said regeneration zone to a temperature ranging between 120.degree.-80.degree. F. to selectively precipitate the cyclic urea from said lean solution;
- d. passing said lean solution containing said precipitated cyclic urea to a separation zone to remove at least a portion of the cyclic urea from said lean solution.
- 4. The process of claim 3 wherein said sterically hindered amine is an N-alkyl alkylene diamine.
- 5. The process of claim 4 wherein said lean solution exiting from said regeneration zone is cooled to temperatures ranging between 90.degree.-120.degree. F.
- 6. The process of claim 5 wherein said sterically hindered amine is cyclohexyl-1,3-propane diamine.
- 7. The process of claim 6 wherein said cyclic urea is removed by passing said lean solution through separation media comprising porous filters or activated carbon beds.
- 8. The process of claim 6 wherein the accumulation of said cyclic urea on said filter is monitored until the pressure drop across said filter reaches about 25 psi at which time said filter is segregated and a second filter is substituted therefor.
CROSS-REFERENCE TO RELATED APPLICATIONS
This application is a continuation-in-part of U.S. Patent Application, Ser. No. 972,500, filed Dec. 22, 1978 now U.S. Pat. No. 4,180,548.
US Referenced Citations (8)
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
972500 |
Dec 1978 |
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