Claims
- 1. In a process for spin-dyeing an acid-modified polymer or copolymer of acrylonitrile with a cationic dyestuff according to the wet-spinning procedure, the improvement consisting essentially of employing, as the cationic dyestuff, a quaternary dyestuff which contains in the cation two or three cationic quaternary groups selected from ammonium, lower dialkyl hydrazonium and cyclammonium groups, and which has a migration factor M of 20 or less, a combination index K of less than 2.5 and a cation weight CW of more than 310.
- 2. A process according to claim 1 wherein the quaternary dyestuff has a migration factor M of equal to or less than 10, a K-value of less than 2 and a CW-value of greater than 380.
- 3. A process according to claim 1 wherein the ratio of cation weight to anion weight of the quaternary dyestuff is greater than 2.5.
- 4. A process according to claim 1, wherein the quanternary dyestuff is a dyestuff of the formula ##STR120## in which A is the radical of an aromatic carbocyclic or aromatic heterocyclic tetrazo component,
- Ar, being identical to or different from one another, each is p-phenylene or 1,4-naphthylene unsubstituted or substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy, halogen, nitro, lower alkanoylamino and trifluoromethyl,
- R, being identical to or different from one another, each is hydrogen or lower alkyl unsubstituted or substituted, or an aralkyl or a cycloalkyl,
- B, being identical to or different from one another, each is a divalent aliphatic bridge member,
- Q.sub.1.sup.(+), being identical to or different from one another, each is a quaternary ammonium group, a 18wer dialkylhydrazonium group or a cyclammonium radical and
- X.sup.(-) is the equivalent of an anion.
- 5. A process according to claim 1 wherein the quaternary dyestuff is a dyestuff of the formula ##STR121## in which R.sub.3 is lower alkyl unsubstituted or substituted by one or two substituents selected from the group consisting of hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl, carbamoyl, carbamoyl mono-substituted or di-substituted by lower alkyl, phenyl or benzyl, and phenyl substituted by substituents selected from the group consisting of halogen, lower alkyl, lower alkoxy, nitro, acetylamino, sulfamoyl and carbamoyl, or is phenylalkyl the phenyl being unsubstituted or substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy and chlorine,
- Z, being identical to or different from one another, each is hydrogen, halogen, lower alkyl, lower alkoxy, nitro, an aryloxy, an aralkoxy or lower carbalkoxy,
- Q.sub.3 is lower alkylene which is optionally interrupted by --O--, --NH-- or an aromatic carbocyclic radical,
- R.sub.1 and R.sub.2, being identical to or different from one another, each is hydrogen or lower alkyl unsubstituted or substituted, or
- R.sub.1 and R.sub.2 conjointly with the two nitrogen atoms and the radical Q.sub.3 form a heterocyclic ring,
- the benzene nuclei a and b each are unsubstituted or substituted in an identical or different manner, the substituents being 1 or 2 substituents selected from the group consisting of lower alkyl, lower alkoxy, halogen, trifluoromethyl and lower alkanoylamino, or
- the benzene nuclei a or b or both contain a fused benzene ring thus forming a naphthylene, and
- X.sup.(-) is the equivalent of an anion.
- 6. A process according to claim 1, wherein the quaternary dyestuff is a dyestuff of the formula ##STR122## in which A.sub.3 is the divalent radical of benzene, diphenyl, glycol diphenyl ether, diglycol diphenyl ether, of a lower diphenylalkane, diphenyl ether, diphenyl sulfide, diphenyl sulfone, azobenzene or diphenylurea, the benzene nuclei of which may additionally be substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy, halogen, carbamoyl and sulfamoyl, or
- A.sub.3 is the divalent radical of 2-phenyl-benzimidazole, 2-phenyl-benzthiazole, 2-phenyl-benzoxazole or diphenyloxadiazole, the heterocyclic ring of which may additionally be substituted by lower alkyl, or
- A.sub.3 is the divalent group of the formula ##STR123## in which alk is lower alkylene,
- R.sub.4 and R.sub.5, being identical to or different from one another, each is hydrogen or lower alkyl unsubstituted or substituted by one or two substituents selected from the group consisting of hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl, carbamoyl, carbamoyl mono-substituted or di-substituted by lower alkyl, phenyl or benzyl, and phenyl substituted by substituents selected from the group consisting of halogen, lower alkyl, lower alkoxy, nitro, acetylamino, sulfamoyl and carbamoyl,
- R.sub.3 is lower alkyl unsubstituted or substituted by one or two substituents selected from the group consisting of hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl, carbamoyl, carbamoyl mono-substituted or di-substituted by lower alkyl, phenyl or benzyl, and phenyl substituted by substituents selected from the group consisting of halogen, lower alkyl, lower alkoxy, nitro, acetylamino, sulfamoyl and carbamoyl mono-substituted or di-substituted by lower alkyl, or is phenylalkyl the phenyl being unsubstituted or substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy and chlorine,
- Z, being identical to or different from one another, each is hydrogen, halogen, lower alkyl, lower alkoxy, nitro, an aryloxy, an aralkoxy or lower carbalkoxy, and
- X.sup.(-) is the equivalent of an anion.
- 7. A process according to claim 1, wherein the quaternary dyestuff is a dyestuff of the formula ##STR124## in which A.sub.3 is divalent radical of benzene, diphenyl, glycol diphenyl ether, diglycol diphenyl ether, of a lower diphenylalkane, diphenyl ether, diphenyl sulfide, diphenyl sulfone, azobenzene or diphenylurea, the benzene nuclei of which may additionally be substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy, halogen, carbamoyl and sulfamoyl, or
- A.sub.3 is the divalent radical of 2-phenyl-benzimidazole, 2-phenyl-benzthiazole, 2-phenyl-benzoxazole or diphenyloxadiazole, the heterocyclic ring of which may additionally be substituted by lower alkyl, or
- A.sub.3 is the divalent radical of the formula ##STR125## in which alk is lower alkylene,
- R.sub.4 and R.sub.5, being identical to or different from one another, each is hydrogen or lower alkyl unsubstituted or substituted by one or two substituents selected from the group consisting of hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl, carbamoyl, carbamoyl mono-substituted or di-substituted by lower alkyl, phenyl or benzyl, and phenyl substituted by substituents selected from the group consisting of halogen, lower alkyl, lower alkoxy, nitro, acetylamino, sulfamoyl and carbamoyl,
- R.sub.3 is lower alkyl unsubstituted or substituted by one or two substituents selected from the group consisting of hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl, carbamoyl, carbamoyl mono-substituted or di-substituted by lower alkyl, phenyl or benzyl, and phenyl substituted by substituents selected from the group consisting of halogen, lower alkyl, lower alkoxy, nitro, acetylamino, sulfamoyl and carbamoyl, or is phenylalkyl the phenyl being unsubstituted or substituted by one or two substitutents selected from the group consisting of lower alkyl, lower alkoxy and chlorine,
- Z, being identical to or different from one another, each is hydrogen, halogen, lower alkyl, lower alkoxy, nitro, an aryloxy, an aralkoxy or lower carbalkoxy, and
- X.sup.(-) is the equivalent of an anion.
- 8. A process according to claim 1, wherein the quaternary dyestuff is a dyestuff of the formula
- [D.sup.(+) -N=N-K].multidot.2X.sup.(-)
- in which
- D.sup.(+) is the radical of a quaternary, aromatic carbocyclic or heterocyclic diazo component which contains one of the quaternary groups mentioned in claim 1,
- K is the radical of a coupling component selected from the coupling components of the benzene, aminonaphthalene, naphthol and indole series, which is substituted via a bridge member by one of the quaternary groups mentioned in claim 1, and
- X.sup.(-) is the equivalent of an anion.
- 9. A process according to claim 6, wherein the quaternary dyestuff of the formula ##STR126## is defined as follows: A.sub.3 is the divalent radical of benzene, of diphenyl, of glycol diphenyl ether, of diglycol diphenyl ether, of a lower diphenylalkane, of diphenyl ether or of azobenzene, the benzene nuclei of which are unsubstituted or substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy and halogen, or
- A.sub.3 is the divalent group of the formula ##STR127## in which alk is lower alkylene, R.sub.3 is lower alkyl unsubstituted or substituted by hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl or carbamoyl,
- R.sub.4 and R.sub.5, being identical to or different from one another, each is hydrogen or lower alkyl unsubstituted or substituted by hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl or carbamoyl,
- Z, being identical to or different from one another, each is hydrogen, lower alkyl, lower alkoxy, nitro or lower carbalkoxy,
- X.sup.(-) is the equivalent of an anion.
- 10. A process according to claim 7, wherein the quaternary dyestuff of the formula ##STR128## is defined as follows: A.sub.3 is the divalent radical of benzene, of diphenyl, of diphenyl ether, of glycol diphenyl ether, of diglycol diphenyl ether or of a lower diphenylalkane, the benzene nuclei of which are unsubstituted or substituted by one or two substituents selected from the group consisting of lower alkyl, lower alkoxy and halogen, or
- A.sub.3 is the divalent group of the formula ##STR129## in which alk is lower alkylene, R.sub.3 is lower alkyl unsubstituted or substituted by hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl or carbamoyl,
- R.sub.4 and R.sub.5, being identical to or different from one another, each is hydrogen or lower alkyl unsubstituted or substituted by hydroxy, acetoxy, lower alkoxy, cyano, lower carbalkoxy, chlorine, phenyl or carbamoyl,
- Z, being identical to or different from one another, each is hydrogen, lower alkyl, lower alkoxy, nitro or lower carbalkoxy,
- X.sup.(-) is the equivalent of an anion.
- 11. A process according to claim 9, wherein the quaternary dyestuff employed is a dyestuff of the formula ##STR130## in which X.sup.(-) is the equivalent of an anion and R.sub.3 is lower alkyl.
- 12. A process according to claim 11 in which X(-) is the tetrafluoroborate anion.
- 13. A process according to claim 1, wherein two or more of said quaternary dyestuffs are employed.
- 14. A process according to claim 1, wherein the quaternary dyestuff has a migration factor M of 10 or less than 10, a K-value of less than 2 and a CW-value of greater than 480.
- 15. A process according to claim 3, wherein the quaternary dyestuff has a migration factor M of 10 or less than 10, a K-value of less than 2 and a CW-value of greater than 480.
- 16. A fiber or a fiber material made of an acid-modified polymer of copolymer of acrylonitrile, which had been colored by wet spin-dyeing with a quaternary dyestuff, said dyestuff containing, in the cation, two or three quaternary groups selected from ammonium, lower dialkylhydrazonium and cyclammonium groups, and having a migration factor M of 20 or less, a combination index K of less than 2.5 and a cation weight CW of more than 310.
Parent Case Info
This application is a continuation of Ser. No. 538,800, filed Oct. 4, 1983, now U.S. Pat. No. 4,557,732, which is a continuation-in-part application of U.S. patent application Ser. No. 420,516 filed Sept. 20, 1982, abandoned, which is a continuation application of U.S. patent application Ser. No. 225,851 filed Jan. 16, 1981, abandoned, which again was a continuation application of the U.S. patent application Ser. No. 40,760 filed May 21, 1979, abandoned.
US Referenced Citations (8)
Continuations (3)
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538800 |
Oct 1983 |
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225851 |
Jan 1981 |
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40760 |
May 1979 |
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Continuation in Parts (1)
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420516 |
Sep 1982 |
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