Claims
- 1. A process for surface treatment of vulcanized rubber, said process comprising:
- generating a nonequilibrium low-temperature plasma by glow discharge under atmospheric pressure between a cathode and an insulating dielectric which is interposed between the cathode and an anode while introducing a gas for generating plasma to a plasma-generating region between the cathode and the insulating dielectric,
- placing the vulcanized rubber in air and outside the plasma-generating region so that a surface of the vulcanized rubber faces the plasma-generating region, and
- directing the gas from the plasma-generating region toward the surface of the vulcanized rubber so that the gas impinges against the rubber surface for effecting surface treatment, while keeping the vulcanized rubber in the air atmosphere.
- 2. The process of claim 1 wherein the distance between the cathode and the insulating dielectric is 0.05 mm to 30 mm.
- 3. The process of claim 1 wherein the vulcanized rubber is placed in air so that the distance between the vulcanized rubber and the outer end of the plasma-generating region is from more than 0 mm to 100 mm.
- 4. The process of claim 1 wherein the nonequilibrium low-temperature plasma is generated under atmospheric pressure by using an AC power supply while passing a rare gas between the cathode and the dielectric with or without a reactive gas selected from the group consisting of N.sub.2, O.sub.2, H.sub.2 O, CO.sub.2, CO, H.sub.2, NH.sub.3, air, CF.sub.4, SF.sub.6, NF.sub.3, Freon gas, silane, CH.sub.4, C.sub.2 H.sub.6, ketones, phenols, alcohols, ethers, and chlorinated hydrocarbons.
- 5. A process for production of rubber-based composite material, said process comprising bonding a material to the surface of vulcanized rubber which has been treated by the process defined in claim 1, directly or indirectly with an adhesive interposed between them.
- 6. The process of claim 1, wherein the nonequilibrium low-temperature plasma is generated by glow discharge at an electron temperature of 10.sup.3 to 10.sup.6 .degree. K.
- 7. The process of claim 1, wherein the distance D.sub.1 between the cathode and the dielectric is 0.05 to 30 mm.
- 8. The process of claim 1, wherein the distance D.sub.1 between the cathode and the dielectric is 0.5 to 5 mm.
- 9. The process of claim 7, wherein the nonequilibrium low-temperature plasma generated by glow discharge is a high density plasma with a power density of about 10.sup.7 to 10.sup.11 W/m.sup.3.
- 10. The process of claim 7, wherein the nonequilibrium low-temperature plasma generated by glow discharge is a high density plasma with a power density of about 10.sup.8 to 10.sup.10 W/m.sup.3.
- 11. The process of claim 1, wherein the gas for generating plasma is introduced to the plasma-generating region at a flow rate of 0.01 l/m to 100 l/min.
- 12. The process of claim 1, wherein the gas for generating plasma is introduced to the plasma-generating region at a flow rate of 0.1 l/min to 10 l/min.
- 13. The process of claim 1, wherein the speed of the gas for generating plasma is 10.sup.-6 to 10.sup.4 m/sec.
- 14. The process of claim 1, wherein the speed of the gas for generating plasma is 10.sup.-4 to 10.sup.3 m/sec.
- 15. The process of claim 1, wherein the speed of the gas for generating plasma is 10.sup.-3 to 10.sup.2 m/sec.
- 16. The process of claim 1, wherein the surface of the vulcanized rubber is only partially treated.
Priority Claims (1)
Number |
Date |
Country |
Kind |
8-46661 |
Feb 1996 |
JPX |
|
CROSS REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of copending application Ser. No. 08/796,215 filed on Feb. 7, 1997, now abandoned, the entire contents of which are hereby incorporated by reference.
US Referenced Citations (5)
Foreign Referenced Citations (6)
Number |
Date |
Country |
575260 |
Dec 1993 |
EPX |
606014 |
Jul 1994 |
EPX |
5275193 |
Oct 1993 |
JPX |
5275190 |
Oct 1993 |
JPX |
5275191 |
Oct 1993 |
JPX |
2259185 |
Mar 1993 |
GBX |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
796215 |
Feb 1997 |
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