Claims
- 1. A compound represented by formula 1:
- 2. The compound according to claim 1, selected from:
- 3. The compound according to claim 1, wherein Rx is H and Ry is OR2; R5 is F; n is 0 or 1; and p is 0.
- 4. The compound according to claim 1, selected from the group consisting of:
- 5. The compound according to claim 4,
- 6. A process for producing a compound of the formula 2:
- 7. The process according to claim 6, further comprising the steps of:
a) providing a mixture of compound 1 and an organic solvent; b) adding to the mixture produced in step a):
i) a base; and ii) a silver salt selected from Ag2O and AgO2CPh; c) adjusting the resulting solution to a temperature in the range of −50° C. and about 150° C. for a period of between about 1 minute and about 48 hours to provide compound 2.
- 8. The process according to claim 7 wherein a compound R4H is added to the step a) mixture before step b).
- 9. The process according to claim 7, comprising the further step of purifying compound 2.
- 10. The process according to claim 6 wherein said compound of formula 2 is produced in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 11. The process according to claim 6 wherein said compound of formula 2 is produced in greater than about 95% enantiomeric excess.
- 12. The process according to claim 6 wherein said compound of formula 2 is produced in greater than about 98% enantiomeric excess.
- 13. The process according to claim 6 wherein said compound of formula 1 is in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 14. The process according to claim 6 wherein said compound of formula 1 is in greater than about 95% enantiomeric excess.
- 15. The process according to claim 6 wherein said compound of formula 1 is in greater than about 98% enantiomeric excess.
- 16. The process according to claim 6 for producing a compound of formula 2a or 2b:
- 17. The process according to claim 6, wherein Rx is H and Ry is OR2; R4 is OR; R is CH3, Bn, or t-butyl; R5 is F; n is 0 or 1; and p is 0.
- 18. The process according to claim 6, wherein the silver salt is AgO2CPh.
- 19. A process for producing a compound of the formula 2:
- 20. A process for producing a compound of the formula 2:
- 21. A process for producing a compound of the formula 3:
- 22. The process according to claim 21 further comprising the step of purifying compound 3.
- 23. The process according to claim 21 wherein said compound of formula 3 is produced in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 24. The process according to claim 21 wherein said compound of formula 3 is produced in greater than about 95% enantiomeric excess.
- 25. The process according to claim 21 wherein said compound of formula 3 is produced in greater than about 98% enantiomeric excess.
- 26. The process according to claim 21 wherein said compound of formula 1 is in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 27. The process according to claim 21 wherein said compound of formula 1 is in greater than about 95% enantiomeric excess.
- 28. The process according to claim 21 wherein said compound of formula 1 is in greater than about 98% enantiomeric excess.
- 29. The process according to claim 21 for producing a compound of formula 3a or 3b:
- 30. The process according to claim 21, wherein Rx is H and Ry is OR2; R4 is OR; R is H, CH3, Bn, or t-butyl; R5 is F; n is 0 or 1; and p is 0.
- 31. A process for producing a compound of the formula 4:
- 32. The process according to claim 31, further comprising the steps of producing a compound of the formula 4:
- 33. The process according to claim 32 further comprising the step of purifying compound 4.
- 34. The process according to claim 31 wherein said compound of formula 4 is produced in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 35. The process according to claim 31 wherein said compound of formula 4 is produced in greater than about 95% enantiomeric excess.
- 36. The process according to claim 31 wherein said compound of formula 4 is produced in greater than about 98% enantiomeric excess.
- 37. The process according to claim 31 wherein said compound of formula 1 is in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 38. The process according to claim 31 wherein said compound of formula 1 is in greater than about 95% enantiomeric excess.
- 39. The process according to claim 31 wherein said compound of formula 1 is in greater than about 98% enantiomeric excess.
- 40. The process according to claim 31 for producing a compound of formula 4a or 4b:
- 41. The process according to claim 31 wherein Rx is H and Ry is OR2; R4 is OR; R is H, CH3, Bn, or t-butyl; R5 is F; n is 0 or 1; and p is 0.
- 42. A process for producing a compound of the formula 1:
- 43. The process according to claim 42, further comprising the steps of producing a compound of the formula 1 from a compound of the formula 9:
- 44. The process according to claim 42 wherein said compound of formula 1 is produced in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 45. The process according to claim 42 wherein said compound of formula 1 is produced in greater than about 95% enantiomeric excess.
- 46. The process according to claim 42 wherein said compound of formula 1 is produced in greater than about 98% enantiomeric excess.
- 47. The process according to claim 42 wherein said compound of formula 11 is in greater than about 50% diastereomeric excess and greater than about 50% enantiomeric excess.
- 48. The process according to claim 42 wherein said compound of formula 11 is in greater than about 95% enantiomeric excess.
- 49. The process according to claim 42 wherein said compound of formula 11 is in greater than about 98% enantiomeric excess.
- 50. The process according to claim 42 for producing a compound of formula 1a or 1b:
- 51. The process according to claim 42 wherein Rx is H and Ry is OR2; R3 is Br, Cl, OC(O)OCH2CH(CH3)2, OC(O)OCH2CH3, OC(O)OCH3, or Cbz; n is 0 or 1; and p is 0.
- 52. The process according to claim 42, wherein compound 11 is reacted with diazomethane or trimethylsilyldiazomethane to form compound 1.
CROSS-REFERENCE TO RELATED APPLICATION
[0001] This application claims the benefit of U.S. Provisional Patent Application No. 60/328,065, filed Oct. 9, 2001.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60328065 |
Oct 2001 |
US |