Claims
- 1. A process for treating nitinol comprising the steps of:
- exposing said nitinol to a primary annealing temperature within the range of approximately 475.degree. C. to 525.degree. C. for a first time period of approximately 10 minutes;
- quenching said nitinol; and
- exposing said nitinol to a secondary annealing temperature within the range of approximately 550.degree. C. to 800.degree. C. for a second time period.
- 2. The process of claim 1, wherein said second time period is within the range of approximately 1 to 10 minutes.
- 3. The process of claim 1, wherein said nitinol is in the form of a wire.
- 4. The process of claim 3, further comprising the step of winding said wire on a mandrel before said step of exposing said nitinol to said primary annealing temperature.
- 5. The process of claim 1, wherein said secondary annealing temperature is within the range of approximately 600.degree. to 800.degree. C.
- 6. The process of claim 5, wherein said secondary annealing temperature is within the range of approximately 650.degree. C. to 750.degree. C.
- 7. The process of claim 6, wherein said secondary annealing temperature is approximately 700.degree. C.
- 8. The process of claim 1, wherein said primary annealing temperature is approximately 500.degree. C.
- 9. The process of claim 1, wherein said primary annealing temperature is approximately 500.degree. C. and said secondary annealing temperature is approximately 700.degree. C.
- 10. The process of claim 1, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is localized to a portion of said nitinol.
- 11. The process of claim 10, wherein said at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by heating said portion of said nitinol with an inert gas brazing torch.
- 12. The process of claim 10, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by placing said portion of said nitinol in contact with a heated object.
- 13. The process of claim 10, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by heating said portion of said nitinol with a laser.
- 14. The process of claim 1, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by placing said nitinol in a heated fluidized bed.
- 15. The process of claim 1, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by placing said nitinol in an oven.
- 16. A process for treating nitinol comprising the steps of:
- exposing said nitinol to a primary annealing temperature within the range of approximately 475.degree. C. to 525.degree. C. for a first time period of approximately 10 minutes; and
- exposing said nitinol to a secondary annealing temperature within the range of approximately 550.degree. C. to 800.degree. C. for a second time period.
- 17. The process of claim 16, wherein said second time period is within the range of approximately 1 to 10 minutes.
- 18. The process of claim 16, further comprising the step of water quenching said nitinol after said step of exposing said nitinol to said primary annealing temperature.
- 19. The process of claim 16, wherein said nitinol is in the form of a wire.
- 20. The process of claim 19, further comprising the step of winding said wire on a mandrel before said step of exposing said nitinol to said primary annealing temperature.
- 21. The process of claim 16, wherein said secondary annealing temperature is within the range of approximately 600.degree. to 800.degree. C.
- 22. The process of claim 21, wherein said secondary annealing temperature is within the range of approximately 650.degree. C. to 750.degree. C.
- 23. The process of claim 22, wherein said secondary annealing temperature is approximately 700.degree. C.
- 24. The process of claim 16, wherein said primary annealing temperature is approximately 500.degree. C.
- 25. The process of claim 16, wherein said primary annealing temperature is approximately 500.degree. C. and said secondary annealing temperature is approximately 700.degree. C.
- 26. The process of claim 16, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is localized to a portion of said nitinol.
- 27. The process of claim 26, wherein said at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by heating said portion of said nitinol with an inert gas brazing torch.
- 28. The process of claim 26, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by placing said portion of said nitinol in contact with a heated object.
- 29. The process of claim 26, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by heating said portion of said nitinol with a laser.
- 30. The process of claim 16, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by placing said nitinol in a heated fluidized bed.
- 31. The process of claim 16, wherein at least one of said steps of exposing said nitinol to a primary annealing temperature and exposing said nitinol to a secondary annealing temperature is accomplished by placing said nitinol in an oven.
RELATED APPLICATIONS
This application is a continuation-in-part of U.S. Ser. No. 09/026,170, filed Feb. 19, 1998, now abandoned.
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
026170 |
Feb 1998 |
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