Claims
- 1. The process for the preparation of azodinitriles comprising reacting an alpha-aminonitrile selected from the group consisting of ##STR8## mixtures of (a) and (b) wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are selected from the group consisting of (1) acylic aliphatic hydrocarbon radicals of 1 to 9 carbon atoms, (2) carbon acylic aliphatic radicals of 1 to 8 carbon atoms substituted with carboxyl, hydroxyl or --OR wherein R is selected from an acyclic aliphatic hydrocarbon radical of 1 to 4 carbon atoms, (3) cyclic aliphatic hydrocarbon radicals of 3 to 6 carbon atoms and (4) cyclic aliphatic hydrocarbon radicals of 3 to 11 carbon atoms formed by combining R.sub.1 and R.sub.2 or R.sub.3 and R.sub.4, with 5 to 15% by weight based on the reaction mixture of a metal hypochlorite, M(OCl).sub.x where M is selected from sodium, potassium or calcium and x is the valence of M, in an aqueous medium in the presence of 0.25 to 10% by weight based on the weight of aminonitrile of a surface active compound or mixtures thereof having an HLB of 8 to 35 at a temperature of -10.degree. C to 30.degree. C said metal hypochlorite and alpha-aminonitrile being present in an equivalent ratio of from 1:1 to 2:1 of hypochlorite to aminonitrile and recovering from the reaction mixture an aliphatic azodinitrile compound of the formula ##STR9## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are as defined and R.sub.1 and R.sub.2 may be the same as R.sub.3 and R.sub.4.
- 2. The process of claim 1 wherein the equivalent ratio of hypochlorite to aminonitrile is from 1.2:1 to 1.8:1.
- 3. The process of claim 1 wherein the metal, M, is sodium.
- 4. The process of claim 1 wherein the surface active compound is 1.0 to 4.0% by weight of the aminonitrile.
- 5. The process of claim 1 wherein the surface active compound is selected from (1) cationic, (2) anionic, (3) nonionic, (4) amphoteric and (5) mixtures of at least two surfactants selected from cationic, anionic, non-ionic, and amphoteric surfactants.
- 6. The process of claim 1 wherein the surface active compound is cationic.
- 7. The process of claim 1 wherein the temperature is from 5.degree. C to 15.degree. C.
- 8. The process of claim 1 wherein the alpha-aminonitrile is 2-amino-2,4-dimethylpentanenitrile and the azodinitrile is 2,2'-azobis-(2,4-dimethylpentanenitrile).
- 9. The process of claim 1 wherein the alpha-aminonitrile is 1-amino-cyclohexanecarbonitrile and the azodinitrile is 1,1'-azobis(cyclohexanecarbonitrile).
- 10. The process of claim 1 wherein the alpha-aminonitrile is 2-amino-2,4-dimethyl-4-methoxypentanenitrile and the azodinitrile is 2,2'-azobis(2,4-dimethyl-4-methoxypentanenitrile).
- 11. The process of claim 1 wherein the alpha-aminonitrile is a mixture of 2-amino-2-methylbutyronitrile and 2-amino-2-methylhexanenitrile and the azodinitrile is 2-[(1-cyano-1-methylpropyl)azo]-2-methylthexanenitrile.
- 12. The process of claim 6 wherein the cationic surface active compound is a tetraalkyl ammonium halide.
- 13. The process of claim 6 wherein the cationic surface active compound is an alkyl trimethyl ammonium chloride or bromide.
- 14. The process of claim 6 wherein the cationic surface active compound is hexadecyl trimethyl ammonium chloride.
- 15. The process of claim 1 wherein the surface active compound is nonionic.
- 16. The process of claim 15 wherein the nonionic surface active compound is selected from the group consisting of a condensate of ethylene oxide or propylene oxide with a propylene or ethylene glycol, polyoxyalkylene fatty acid esters, polyoxyalkylene alkyl ethers, polyoxyalkylene fatty alcohol ethers and polyoxyethylene sorbitan fatty acid esters.
- 17. The process of claim 15 wherein the nonionic surface active compound is a polyoxyethylene lauryl ether.
- 18. The process of claim 1 wherein the HLB range is from 8 to 30.
- 19. The process of claim 1 wherein the HLB range is from 12 to 15.
- 20. The process of claim 1 wherein the alpha-aminonitrile is 2-amino-2-methylpropanenitrile and the azodinitrile is 2,2'-azobis(isobutyronitrile).
CROSS REFERENCE TO RELATED APPLICATION
This is a continuation-in-part of copending application Ser. No. 540,084, filed Jan. 10, 1975 now abandoned.
US Referenced Citations (5)
Continuation in Parts (1)
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Number |
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540084 |
Jan 1975 |
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