Claims
- 1. A process for the production of a soldered joint between a carbon part, comprising no diamond structures, and a silicon carbide part, via a silver-titanium solder, having a titanium content in the range of 2-6% by weight, wherein the solder is interposed between the carbon part and the silicon part in a vacuum furnace, the process comprising:
- heating in a first step, a combination, formed of the carbon part, the silicon carbide part and the interposed solder, to a temperature just below the melting temperature of the solder, at a rate of less than 600.degree. C./hour;
- further heating, in a second step, the combination to the actual melting temperature of the solder which, depending on the composition of the solder, is in the range between 1000 and 1050.degree. C., at a rate in the range of 200.degree.-1000.degree. C./hour;
- further maintaining, in a third step, the combination, at a predetermined soldering temperature between 1000 and 1050.degree. C. for a soldering time between 5 and 20 minutes;
- cooling, in a fourth step, the combination, to an intermediate temperature, with the intermediate temperature being below the melting temperature of the solder, at a rate of less than 200.degree. C./hour; and
- further cooling, in a fifth step, the combination from the intermediate temperature to ambient temperature, at a rate of less than 400.degree. C./hour.
- 2. The process of claim 1 further including, maintaining, in an optional intermediate step, between the first and second steps, the combination at a holding temperature that is below the melting temperature of the solder, until the entire combination has reached the holding temperature.
- 3. The process of claim 2 wherein the holding temperature is about 10.degree. C. below the melting temperature of the solder.
- 4. The process of claim 1 wherein said intermediate temperature is about 650.degree. C.
- 5. The process of claim 1 further including outgassing the carbon and silicon carbide parts in a preliminary step, prior to the first step.
- 6. The process of claim 5 including heating the carbon and silicon carbide parts in a vacuum furnace and thereafter cooling same in a vacuum.
- 7. The process of claim 1 further including interposing the solder between the carbon and silicon carbide parts, in the form of at least one foil, wherein the foil has a thickness in the range of 0.1 to 1.0 mm.
- 8. The process of claim 7 further including the step of maintaining the solder under a surface pressure in the range of 0.4 to 1.0N/cm.sup.2.
- 9. The process of claim 1 wherein the carbon part is comprised of synthetic graphite.
- 10. The process of claim 9 wherein the synthetic graphite has the following properties:
- Temperature stability in an oxygen-containing atmosphere, 500.degree. C.;
- Modulus of elasticity, 12,000N/mm.sup.2 ;
- Brinell hardness, HB 25;
- porosity, 10% by volume; and
- thermal conductivity, 65 W/m.degree. k.
- 11. The process of claim 1 wherein the silicon carbide is comprised of a carbon-doped silicon carbide.
- 12. The process of claim 11 wherein the silicon carbide is comprised of a silicon, silicon carbide, carbon composition.
- 13. The process of claim 12 wherein the silicon, silicon carbide, carbon composition has the following properties:
- a chemical composition, in % weight of <6.5% Si, 15% C in the form of free carbon, <1% impurities, with the remainder consisting of SiC;
- a density of 2.9 g/cm.sup.3 ;
- a porosity of <1% by volume; and
- a thermal conductivity of 130 Watts/m.degree. k.
- 14. A process for the production of a soldered joint between a carbon part and a silicon carbide part, via a silver-titanium solder, having a titanium content in the range of 2-6% by weight, wherein the solder is interposed between the carbon part and the silicon part in a vacuum furnace, the process comprising:
- heating in a first step, a combination, formed of the carbon part, the silicon carbide part and the interposed solder, to a temperature just below the melting temperature of the solder, at a rate of less than 600.degree. C./hour;
- further heating, in a second step, the combination to the actual melting temperature of the solder which, depending on the composition of the solder, is in the range between 1000.degree. and 1050.degree. C., at a rate in the range of 200.degree.-1000.degree. C./hour;
- further maintaining, in a third step, the combination, at a predetermined soldering temperature between 1000.degree. and 1050.degree. C. for a soldering time between 5 and 20 minutes;
- cooling, in a fourth step, the combination, to an intermediate temperature, with the intermediate temperature being below the melting temperature of the solder, at a rate of less than 200.degree. C./hour; and
- further cooling, in a fifth step, the combination from the intermediate temperature to ambient temperature, at a rate of less than 400.degree. C./hour,
- wherein the carbon part is comprised of synthetic graphite.
- 15. The process of claim 14 wherein the synthetic graphite comprises:
- a temperature stability in an oxygen-containing atmosphere of 500.degree. C.;
- a modulus of elasticity of 12,000N/mm.sup.2 ;
- a Brinell hardness of HB 25;
- a porosity of 10% by volume; and
- a thermal conductivity of 65 W/m.degree. k.
- 16. A process for the production of a soldered joint between a carbon part and a silicon carbide part, via a silver-titanium solder, having a titanium content in the range of 2-6% by weight, wherein the solder is interposed between the carbon part and the silicon part in a vacuum furnace, the process comprising:
- heating in a first step, a combination, formed of the carbon part, the silicon carbide part and the interposed solder, to a temperature just below the melting temperature of the solder, at a rate of less than 600.degree. C./hour;
- further heating, in a second step, the combination to the actual melting temperature of the solder which, depending on the composition of the solder, is in the range between 1000.degree. and 1050.degree. C., at a rate in the range of 200-1000.degree. C./hour;
- further maintaining, in a third step, the combination, at a predetermined soldering temperature between 1000.degree. and 1050.degree. C. for a soldering time between 5 and 20 minutes;
- cooling, in a fourth step, the combination, to an intermediate temperature, with the intermediate temperature being below the melting temperature of the solder, at a rate of less than 200.degree. C./hour;
- further cooling, in a fifth step, the combination from the intermediate temperature to ambient temperature, at a rate of less than 400.degree. C./hour,
- wherein the silicon carbide is comprised of a carbon-doped silicon carbide.
- 17. The process of claim 16, wherein the silicon carbide is comprised of a silicon, silicon carbide, carbon composition.
- 18. The process of claim 17, wherein the silicon, silicon carbide, carbon composition comprises:
- a chemical composition, in % weight of <6.5% Si, 15% C in the form of free carbon, <1% impurities, with the remainder consisting of SiC;
- a density of 2.9 g/cm.sup.3 ;
- a porosity of <1% by volume; and
- a thermal conductivity of 130 Watts/m.degree. k.
Priority Claims (1)
Number |
Date |
Country |
Kind |
01724/92 |
May 1992 |
CHX |
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CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation in part of now abandoned U.S. patent application Ser. No. 08/054,297, filed Apr. 30, 1993, which claims the priorities of Swiss Applications No. 01 724/92-2, filed May 27, 1992 and No. 01 962/92-7, filed Jun. 22, 1992, the disclosures of which is incorporated herein by reference in their entireties.
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
54297 |
Apr 1993 |
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