Claims
- 1. The process for producing compounds of formula (V) ##STR15## wherein R and R.sup.1 are lower alkyl; R.sup.2, R.sup.3, and R.sup.5 are hydrogen, or lower alkyl wherein lower alkyl contains 1 to 6 carbon atoms; each R.sup.4 is independently selected from the group consisting of hydrogen, and lower alkyl wherein lower alkyl contains 1 to 6 carbon atoms, or R.sup.3 is joined to the R.sup.4 which is cis to the carbon bearing R.sup.3 to form --CH.sub.2 --.sub.m wherein m is 2 to 3 which comprises
- (a) dihalogenating the compound of formula (I) ##STR16## wherein R and R.sup.1 are as defined above with a halogenating agent in a suitable solvent to produce the compound (II) ##STR17## wherein R and R.sup.1 are as defined above; and X is chlorine, or bromine;
- (b) dehydrohalogenating the compound (II) in the presence of a base and optionally in the presence of added salts in a suitable solvent to produce the compound (III) ##STR18## wherein R, R.sup.1, and X are as defined above; (c) reacting the compound (III) with ##STR19## wherein R.sup.2, R.sup.3, and R.sup.5 are hydrogen, or lower alkyl wherein lower alkyl contains 1 to 6 carbon atoms; each R.sup.4 is independently selected from the group consisting of hydrogen, or lower alkyl wherein lower alkyl contains 1 to 6 carbon atoms, or R.sup.3 is joined to one of the R.sup.4 substituents to form --CH.sub.2 --.sub.m wherein m is 2 to 3; Y is selected from the group consisting of SiR.sup.6 R.sup.7 R.sup.8 and SnR.sup.6 R.sup.7 R.sup.8 wherein R.sup.6, R.sup.7, and R.sup.8 are independently selected from the group consisting of hydrogen, straight chain or branched lower alkyl containing 1 to 6 carbon atoms, cycloalkyl, aryl, arylalkykl, halogen, or alkoxy in the presence of a Lewis acid to produce the compound (IV) ##STR20## wherein R, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, and X are as defined above;
- (d) dehalogenating the compound (IV) with a reducing agent to produce the desired compound (V).
- 2. The process according to claim 1 for producing the compound of formula (Va-(.+-.)cis) ##STR21## which comprises (a) dibrominating the compound of formula ##STR22## with bromine in methylene chloride solvent to produce the dibromo compound of formula ##STR23## (b) treating said dibromo compound with lithium bromide and lithium carbonate in N,N-dimethylformamide solvent to produce the monobromo compound of formula ##STR24## (c) reacting a methylene chloride solution of said monobromo compound dropwise with titanium tetrachloride followed by the dropwise addition of a methylene chloride solution of allyltrimethylsilane to produce the allylbromo compound ##STR25## (d) debrominating said allylbromo compound with zinc dust in acetic acid or with sodium dithionite in aqueous N,N-dimethylformamide to produce the desired compound (Va-(.+-.)cis).
- 3. The process for producing compounds of formula (V) ##STR26## wherein R and R.sup.1 are lower alkyl; R.sup.2 and R.sup.3 are hydrogen, or lower alkyl wherein lower alkyl contains 1 to 6 carbon atoms; the R.sup.4 which is trans to R.sup.5 is selected from the group consisting of hydrogen, or lower alkyl wherein lower alkyl contains 1 to 6 carbon atoms, and R.sup.5 is joined to the R.sup.4 which is cis to R.sup.5 to form --CH.dbd.CH--CH.dbd.CH-- which comprises
- (a) dihalogenating the compound of formula (I) ##STR27## wherein R and R.sup.1 are as defined above with a halogenating agent in a suitable solvent to produce the compound (II) ##STR28## wherein R and R.sup.1 are as defined above; and X is chlorine, or bromine;
- (b) dehydrohalogenating the compound (II) in the presence of a base and optionally in the presence of added salts in a suitable solvent to produce the compound (III) ##STR29## wherein R, R.sup.1, and X are as defined above; (c) reacting the compound (III) with ##STR30## wherein R.sup.2, R.sup.3, R.sup.4, and R.sup.5 are as defined above and Z is Cl, Br or I, in the presence of a copper salt such as copper (I) bromide-dimethyl sulfide complex, cuprous iodide, cuprous bromide, copper acetate, cuprous chloride, tributylphosphine cuprous iodide complex, or cuprous cyanide, and simultaneously in the presence of a Lewis acid such as titanium tetrachloride, zinc bromide, zinc iodide, zinc triflate, lithium bromide, lithium iodide, magnesium bromide, magnesium chloride, magnesium triflate, or stannic chloride to produce the compound (IV) ##STR31## wherein R, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, and X are as defined above;
- (d) dehalogenating the compound (IV) with a reducing agent to produce the desired compound (V).
- 4. The process according to claim 4 for producing the compound of formula (Vb-(.+-.)cis) ##STR32## which comprises (a) dibrominating the compound of formula ##STR33## with bromine in methylene chloride solvent to produce the dibromo compound of formula ##STR34## (b) treating said dibromo compound with lithium bromide and lithium carbonate in N,N-dimethylformamide solvent to produce the monobromo compound of formula ##STR35## (c) reacting a tetrahydrofuran solution of said monobromo compound and dimethyl sulfide in the presence of about 0.1 molar equivalent of copper (1) bromide-dimethyl sulfide complex and about 1 molar equivalent of zinc bromide dropwise with a solution of benzylmagnesium chloride in tetrahydrofuran to produce the benzylbromo compound of formula (IVb-(.+-.)cis) ##STR36## (d) debrominating said benzylbromo compound with zinc dust in acetic acid or with sodium dithionite in aqueous N,N-dimethylformamide to produce the desired compound (Vb-(.+-.)cis).
- 5. The process according to claim 1, 2, 3 and 4 for producing the compound of formula ##STR37## which comprises (a) dibrominating the compound of formula ##STR38## with bromine in methylene chloride solvent to produce the dibromo compound of formula ##STR39## (b) treating said dibromo compound with lithium bromide and lithium carbonate in N,N-dimethylformamide solvent to produce the desired compound.
Parent Case Info
This is a divisional of co-pending application Ser. No. 131,698 filed on Dec. 11, 1987, which is in turn a division of copending application Ser. No. 020,426, filed on Mar. 2, 1987, issued as U.S. Pat. No. 4,748,266, which is in turn a continuation-in-part of copending application U.S. Ser. No. 868,230, filed May 28, 1986, which is now abandoned.
US Referenced Citations (1)
Number |
Name |
Date |
Kind |
4189596 |
Van Rheenen |
Feb 1980 |
|
Non-Patent Literature Citations (2)
Entry |
A. A. Asselin et al., J. Med. Chem. 19(6) 787-791 (1976). |
A. A. Asselin et al., J. Med. Chem. 19(6) 792-797 (1976). |
Divisions (2)
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Number |
Date |
Country |
Parent |
131698 |
Dec 1987 |
|
Parent |
20426 |
Mar 1987 |
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Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
868230 |
May 1986 |
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