Process shield for a substrate processing chamber

Abstract

Description

FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to one embodiment of the novel design.

FIG. 2 is a bottom isometric view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a top plan view thereof.

FIG. 5 is a front elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a left side elevation view thereof.

FIG. 8 is a right side elevation view thereof.

FIG. 9 is cross-sectional view taken along line 9-9 of FIG. 3.

FIG. 10 is a top isometric view of a process shield for a substrate processing chamber, according to another embodiment of the novel design.

FIG. 11 is a bottom isometric view thereof.

FIG. 12 is a bottom plan view thereof.

FIG. 13 is a top plan view thereof.

FIG. 14 is a front elevation view thereof.

FIG. 15 is a back elevation view thereof.

FIG. 16 is a left side elevation view thereof.

FIG. 17 is a right side elevation view thereof.

FIG. 18 is cross-sectional view taken along line 18-18 of FIG. 12; and,

FIG. 19 is cross-sectional view taken along line 19-19 of FIG. 14.

The dashed lines in FIGS. 1-19 represent unclaimed environment forming no part of the claimed design.

Claims

The ornamental design for a process shield for a substrate processing chamber, as shown and described.