Process shield for a substrate processing chamber

Abstract

Description

FIG. 1 is a top isometric view of a process shield for a substrate processing chamber, according to the first embodiment of the novel design.

FIG. 2 is a top plan view thereof.

FIG. 3 is a bottom plan view thereof.

FIG. 4 is a left side elevation view thereof.

FIG. 5 is a right side elevation view thereof.

FIG. 6 is a back elevation view thereof.

FIG. 7 is a front elevation view thereof.

FIG. 8 is a cross-sectional view taken along line 8-8′ of FIG. 2.

FIG. 9 is a top isometric view of a process shield for a substrate processing chamber, according to the second embodiment of the novel design.

FIG. 10 is a top plan view thereof.

FIG. 11 is a bottom plan view thereof.

FIG. 12 is a left side elevation view thereof.

FIG. 13 is a right side elevation view thereof.

FIG. 14 is a back elevation view thereof.

FIG. 15 is a front elevation view thereof; and,

FIG. 16 is a cross-sectional view taken along line 16-16′ of FIG. 10.

The dashed lines in FIGS. 1-16 represent unclaimed environment forming no part of the claimed design.

Claims

The ornamental design for a process shield for a substrate processing chamber, as shown and described.