Patent Application
20230002946
The present disclosure relates to a processing data generation device, a non-transitory computer-readable medium, and a sewing machine.
Based on drawing pattern data representing a pattern for patchwork, a known pattern data processing device divides the drawing pattern into a plurality of divided patterns, provides a margin of a predetermined width between the adjacent divided patterns, and prints the plurality of divided patterns on sewing objects. A user can obtain the patchwork by joining together the plurality of divided drawing patterns, by sewing the printed sewing objects so as to hide the margins.
The above-described drawing pattern data processing device prints a boundary line representing a boundary between the divided pattern and the margin. The user causes the boundary lines to face each other, and sews along the boundary lines in a state in which the sewing objects are placed face to face. It is thus difficult to verify a position of the boundary line, and an operation to determine a sewing position such that the adjacent divided patterns are appropriately sewn together at the boundary line is complex.
An object of the present disclosure is to provide a processing data generation device, a non-transitory computer-readable medium, and a sewing machine that improve user convenience when creating a patchwork, compared to known art.
Embodiments of the broad principles derived herein provide a processing data generation device according to a first aspect of the present disclosure. The processing data generation device includes a processor and a memory. The memory is configured to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes. The processes include acquiring processing of acquiring a pattern represented by a contour, division processing of dividing the pattern into a plurality of pattern pieces. The processes include offset setting processing of setting an offset line, for each of two pattern pieces adjacent to each other from among the plurality of pattern pieces representing the pattern as a whole. The offset line is disposed at a position separated to an outside, from an adjacent portion, by a predetermined distance, the adjacent portion being a portion of the contour of one of the two pattern pieces. The adjacent portion is adjacent to another of the two pattern pieces. The outside is opposite, with respect to the contour of the first piece, to a region surrounded by the contour of the first piece. The processes include processing line setting processing of setting, for each of the plurality of pattern pieces, a processing line including the offset line and surrounding a pattern piece from among the plurality of pattern pieces and processing line processing of generating processing line processing data, for each of the plurality of pattern pieces, for processing a sheet-shaped workpiece along the processing line, using a processing device configured to perform processing on the workpiece.
The processing data generation device according to the first aspect of the present disclosure is configured to generate the processing data for causing the processing device to process the workpiece along the processing line. The processing device can process the workpiece along the processing line on the basis of the generate processing data. For example, using the workpiece processed in accordance with the processing data generated using the following procedure, a user can create a patchwork including contours that are aligned with the contours of the pattern as a whole. The user acquires a plurality of sewing object pieces cut along the shape of the processing line, on the basis of the workpiece processed along the processing line. The user places two of the sewing object pieces, which correspond to the two adjacent pattern pieces, face to face, and overlaps the ends of the sewing object pieces in accordance with the offset line. By sewing at a position of the predetermined distance from the ends of the sewing object pieces corresponding to the offset line, the user can sew together the two sewing object pieces at a position corresponding to the adjacent portions of the two adjacent pattern pieces. The user sews, in order, the plurality of sewing object pieces respectively corresponding to the plurality of pattern pieces. When the processing data generated by the processing data generation device is used to create the patchwork, it is not necessary for the user to check the position at which the sewing object pieces are sewn together. Thus, the processing data generation device contributes to improving convenience of the user when creating the patchwork, and in particular contributes to the efficiency of an operation to determine the position at which the two sewing object pieces corresponding to the two pattern pieces are sewn together.
Embodiments also provide a non-transitory computer-readable medium that stores computer-readable instructions that are executed by a processor of a sewing data editing device. The computer-readable instructions performing processes. The processes include acquiring processing of acquiring a pattern represented by a contour, division processing of dividing the pattern into a plurality of pattern pieces. The processes include offset setting processing of setting an offset line, for each of two pattern pieces adjacent to each other from among the plurality of pattern pieces representing the pattern as a whole. The offset line is disposed at a position separated to an outside, from an adjacent portion, by a predetermined distance, the adjacent portion being a portion of the contour of one of the two pattern pieces. The adjacent portion is adjacent to another of the two pattern pieces. The outside is opposite, with respect to the contour of the first piece, to a region surrounded by the contour of the first piece. The processes include processing line setting processing of setting, for each of the plurality of pattern pieces, a processing line including the offset line and surrounding a pattern piece from among the plurality of pattern pieces and processing line processing of generating processing line processing data, for each of the plurality of pattern pieces, for processing a sheet-shaped workpiece along the processing line, using a processing device configured to perform processing on the workpiece. The non-transitory computer-readable medium according to a second aspect of the present disclosure contributes to achieving the same effects as the processing data generation device according to the first aspect, by causing the processor of the processing data generation device to execute the instructions.
Embodiments further provide a sewing machine that includes a presser bar, a processor, and a memory. The presser bar is configured to press a sewing object from above. The presser foot is configured to be mounted to a lower end portion of the presser bar. The memory is configured to store computer-readable instructions that, when executed by the processor, instruct the processor to perform processes. The processes include acquiring processing of acquiring a pattern represented by a contour, division processing of dividing the pattern into a plurality of pattern pieces, and predetermined distance setting processing of setting a predetermined distance depending on a type of the presser foot mounted to the lower end portion of the presser bar. The processes include offset setting processing of setting an offset line, for each of two pattern pieces adjacent to each other from among the plurality of pattern pieces representing the pattern as a whole. The offset line is disposed at a position separated to an outside, from an adjacent portion, by the predetermined distance, the adjacent portion being a portion of the contour of one of the two pattern pieces. The adjacent portion is adjacent to another of the two pattern pieces. The outside is opposite, with respect to the contour of the first piece, to a region surrounded by the contour of the first piece. The processes include processing line setting processing of setting, for each of the plurality of pattern pieces, a processing line including the offset line and surrounding a pattern piece from among the plurality of pattern pieces and processing line processing of generating processing line processing data, for each of the plurality of pattern pieces, for processing a sheet-shaped workpiece along the processing line, using a processing device configured to perform processing on the workpiece. The sewing machine according to the third aspect of the present disclosure contributes to achieving the same effects as the processing data generation device according to the first aspect. Further, the sewing machine is configured to set the predetermined distance in accordance with the type of the presser foot mounted to the lower end of the presser bar. Thus, by acquiring the sewing object pieces using the workpiece processed in accordance with the processing data generated by the sewing machine, the sewing machine contributes to the user acquiring the sewing object pieces for which the margin is set that is appropriate for the presser foot.
An embodiment of the present disclosure will be described with reference to the drawings. A physical configuration of a sewing machine 1 will be described with reference to
The sewing machine 1 includes a function as a processing data generation device that generates processing data for causing a processing device 3 to be described later with reference to
An electrical configuration of the sewing machine 1 will be described, in order, with reference to
An oscillation motor 32 is connected to the drive circuit 90. The drive circuit 90 is configured to drive the oscillation motor 32 in accordance with a control signal from the CPU 81. The oscillation mechanism 57 is driven by the driving of the oscillation motor 32, and moves the needle bar 6 to the left and the right. A sewing machine motor 33 is connected to the drive circuit 91. The drive circuit 91 is configured to drive the sewing machine motor 33 in accordance with a control signal from the CPU 81. The needle bar up-down drive mechanism 55 is driven via a drive shaft 34 by the driving of the sewing machine motor 33 and moves the needle bar 6 up and down. A feed amount adjustment motor 17 is connected to the drive circuit 92. The drive circuit 92 is configured to drive the feed amount adjustment motor 17 in accordance with a control signal from the CPU 81. A feed amount of the sewing object by the feed mechanism 16 is adjusted by the driving of the feed amount adjustment motor 17. The drive circuit 93 is configured to display an image on the LCD 25 in accordance with a control signal from the CPU 81.
The processing device 3 will be described with reference to
The processing data generation processing performed by the sewing machine 1 will be described with reference to
As shown in
The controller 2 sets a shape (step S3). In main processing of the present embodiment, the pattern specified by the user is disposed inside the shape. The shape is represented as a loop using a single line. The graphic may be a geometrical shaped pattern, such as a circular shape, an elliptical shape, a polygonal shape, a star shape, a trapezoid, and the like. A configuration may be adopted in which the user can set the shape, size, and the like of the shape, or a configuration may be adopted in which the shape, size, and the like of the shape are set in advance. The controller 2 of the present embodiment sets a rectangular shape 61, and, as shown in
The controller 2 determines whether the selection of the OK key 63 has been detected (step S4). The controller 2 stands by until the selection of the OK key 63 is detected (no at step S4). When the selection of the OK key 63 is detected (yes at step S4), the controller 2 acquires the pattern 62 disposed inside the graphic 61 (step S5). The pattern 62 is the T-shaped pattern represented by a contour. The controller 2 divides the pattern 62 acquired at step S5 into a plurality of pattern pieces (step S6). As the method for dividing the pattern acquired at step S5 into the plurality of pattern pieces, a known technique may be adopted as appropriate. As shown in
The controller 2 determines, on the basis of the setting in the check box 68 when the selection of the OK key 63 is detected, whether to divide the margin pattern 67 (step S7). As shown in
When the margin pattern 67 is not to be divided (no at step S7), or after the processing at step S8, when the selection of the key 59 is detected, as shown in
The controller 2 refers to the pattern storage area 87, and sets a common pattern with respect to the set of adjacent pattern pieces acquired at step S11 (step S12). When the patchwork is to be created using the sewing object pieces corresponding to the pattern pieces, in order to make it easy to identify the set of sewing object pieces that are to be sewn together, from the plurality of sewing object pieces, the controller 2 generates the processing data for processing the adjacent portions of the common pattern or the seam allowance set for the adjacent portions. The controller 2 of the present embodiment can set, as the common pattern, at least one selected from the group of a cutting pattern and a drawing pattern. As shown in the pattern storage area 87 shown in
The controller 2 sets offset lines for the adjacent portions of the set of adjacent pattern pieces acquired at step S11 (step S13). The offset line is a line disposed at a position separated by the predetermined distance D from the adjacent portion of the set of adjacent pattern pieces, on the outside, with respect to the contour of a first piece. The first piece is one of set of adjacent pattern pieces. The adjacent portion is adjacent to a second piece. The second piece is another of set of adjacent pattern pieces. The outside is opposite to a side of a region surrounded by the contour of the first piece. A region between the offset line and the adjacent portion indicates the seam allowance of the sewing object piece corresponding to the pattern piece. The predetermined distance D is the distance set at step S2. As shown in
Of the plurality of pattern pieces 71 to 78, the controller 2 determines whether all the sets of adjacent pattern pieces have been acquired at step S11 (S14). When the sets of adjacent pattern pieces acquired at step S11 are not all of the sets of adjacent pattern pieces (no at step S14), the controller 2 returns the processing to step S11. At step S11, when the adjacent portion of the one pattern piece and the adjacent portion of the other pattern piece are not the same length as each other, for each of the two adjacent pattern pieces, the controller 2 identifies all of the pattern pieces adjacent to the edge that includes the adjacent portion of the pattern piece for which the adjacent portion is longer, and acquires the pattern piece having the longer adjacent portion and all of the pattern pieces adjacent to the edge including that adjacent portion, as the set of adjacent pattern pieces. For example, for the pattern piece 73, the lower edge of the pattern piece 73 is in contact with the upper edge of the pattern piece 74, but the lower edge of the pattern piece 73 is longer than the upper edge of the pattern piece 74. In this case, the controller 2 identifies the pattern pieces 74 to 76 as the pattern pieces that are adjacent to the pattern piece 73 at the lower edge of the pattern piece 73, and acquires the pattern pieces 73 to 76 as the set of adjacent pattern pieces. The controller 2 sets, as the common pattern for the set of adjacent pattern pieces 73 to 76, the cutting pattern having the triangular notch (step S12). As shown in
Of the plurality of pattern pieces 71 to 78, when all of the sets of adjacent pattern pieces have been acquired at step S11 (yes at step S14), the controller 2 sets offset lines, for the contours of each of the plurality of pattern pieces 71 to 78, disposed at positions separated by the predetermined distance D to the outside of portions that do not include the adjacent portion (step S15). At step S15, the controller 2 sets straight line offset lines. As shown in
For each of the plurality of pattern pieces 71 to 78, the controller 2 performs a left-right inversion of the contour of the pattern piece 71 with the offset lines set by the processing at step S13 and step S15 (step S16). The processing data generated by the controller 2 of the present embodiment includes contour drawing data that draws, on the reverse surface of the sewing object piece, the contour of the sewing object piece configuring the patchwork. Thus, the controller 2 performs processing at step S16. For example, as shown in
The controller 2 categorizes the pattern pieces 71 to 78 into a plurality of groups (step S17). A method for categorizing the pattern pieces 71 to 78 into the plurality of groups may be set as appropriate. On the basis of the attribute information allocated to each of the pattern pieces 71 to 78 by the processing at step S9, the controller 2 of the present embodiment categorizes the pattern pieces 71 to 78 into three groups, namely, a first group including the six pattern pieces 71, 72, 74, and 76 to 78, a second group including the pattern piece 73, and a third group including the pattern piece 75. Of the plurality of groups categorized at step S17, the controller 2 acquires one of the groups that has not been acquired by the processing at step S18 (step S18), and, for the one or more pattern pieces included in the group acquired at step S18, sets processing lines and contour drawing lines inside the processing region R of the processing device 3 (step S19).
The processing line is a line indicating a position at which the workpiece W is processed, using the processing device 3, along the offset line that has been set at step S13 and step S15 and has been left-right inverted at step S16. As the processing line, the controller 2 of the present embodiment sets the line indicating a position at which the sewing object is cut, using the processing device 3, along the offset line that has been set at step S13 and step S15 and has been left-right inverted at step S16. The contour drawing line is a line indicating a position of the contour of the pattern piece that has been left-right inverted at step S16 that is drawn on the reverse surface of the sewing object using the processing device 3. The size of the processing region R of the processing device 3 may be stored in advance in the flash memory 84, for example, or a configuration may be adopted in which the size of the processing region R can be set by the user. The controller 2 sets the processing lines and the contour drawing lines inside the processing region R such that regions surrounded by the processing lines do not overlap. When the controller 2 cannot dispose all of the one or more pattern pieces included in the same group inside the same processing region R, the controller 2 sets a plurality of the processing regions R, and only disposes the pattern pieces included in the same group inside the same processing region R. In the processing at step S18 relating to the first group, as shown in
The controller 2 generates processing line processing data for processing the workpiece W along the processing lines set at step S19 using the processing device 3 (step S20). The controller 2 of the present embodiment generates the processing line processing data for cutting the sewing object along the processing lines set at step S19 using the processing device 3 to which the cutting blade 7 is mounted. The controller 2 generates contour drawing data for drawing the contours of the pattern pieces on the sewing object along the contour drawing lines set at step S19, using the processing device 3 to which the drawing pen 8 is mounted (step S21). The controller 2 of the present embodiment includes data that draws the pattern piece identification information allocated at step S10 in the contour drawing data. Of the pattern pieces 71 to 78, for each of the two adjacent pattern pieces, the controller 2 generates identification drawing data that draws common identification information that is common to a pair of the adjacent portions and that identifies the adjacent portion adjacent to the other pattern piece (step S22). As the common identification information, the controller 2 of the present embodiment sets a number indicating a sewing order of the sewing object pieces, when sewing together the eight sewing object pieces and creating the patchwork representing the pattern 62 as a whole. As shown in
The controller 2 determines whether or not all of the groups set by the processing at step S17 have been acquired by the processing at step S18 (step S23). When there is a group that has not been acquired at step S18 (no at step S23), the controller 2 returns the processing to step S18. As shown in
On the basis of the output data, the user causes the processing device 3 to be driven in accordance with the processing data. The processing device 3 processes the workpiece W with the sewing object as the workpiece W. For example, the user causes the sewing object of the first color to be held by the holding member 9 such that the reverse surface of the sewing object is the upper surface, and causes the processing device 3 to be driven on the basis of the processing line processing data, the contour drawing data, and the identification drawing data for performing the processing inside the processing region R1. When the patchwork is created by cutting out the sewing object pieces from the sewing object and sewing them together, of the surfaces of the sewing object, the reverse surface of the sewing object is the surface of the side on which the seam allowance is disposed. The processing device 3 processes the sewing object in accordance with each of the data. An order of executing the processing line processing data, the contour drawing data, and the identification drawing data may be set as appropriate. For example, after the processing device 3 performs the drawing processing that draws on the reverse surface of the sewing object on the basis of the contour drawing data and the identification drawing data, in a state in which the drawing pen 8 is mounted, the processing device 3 may perform the cutting processing that cuts the sewing object along the processing lines on the basis of the processing line processing data, in a state in which the drawing pen 8 is replaced with the cutting blade 7. Similarly, the user can obtain the eight sewing object pieces corresponding to each of the pattern pieces 71 to 78 by causing each of the processing processes to be executed for the processing region R2, or by causing each of the processing processes to be executed for the processing region R3 using the sewing object of the second color, and the processing region R4 using the sewing object of the third color.
The sewing guide processing will be described with reference to
As shown in
As shown in
The controller 2 determines whether the variable N indicates the last of the sewing order (step S36). When the variable N does not indicate the last of the sewing order (no at step S36), the controller 2 determines whether or not the selection of the key 97 has been detected (step S38). The controller 2 continues the processing at step S38 until the selection of the key 97 is detected (no at step S38). When the selection of the key 97 is detected (yes at step S38), the controller 2 increments the variable N by adding 1 (step S40), and returns the processing to step S34. When the variable N indicates the last in the sewing order (yes at step S36), the controller 2 determines whether selection of an END key for inputting a command to end the sewing guide processing, which is included in the screen displayed on the LCD 25 at step S35, has been detected (step S37). The controller 2 continues the processing at step S37 until the selection of the END key is detected (no at step S37). When the selection of the END key is detected (yes at step S37), the controller 2 ends the sewing guide processing.
The sewing machine 1 of the above-described embodiment is provided with the presser bar 21, the controller 2, and the ROM 82. The presser foot 22 can be detachably mounted to the lower end portion of the presser bar 21, and presses the sewing object from above. The ROM 82 stores the programs executed by the controller 2. In accordance with the programs stored in the ROM 82, the controller 2 acquires the pattern 62 represented by the contours (step S5), divides the acquired pattern 62 into the plurality of pattern pieces 73 and 75 (step S6), and sets the predetermined distance D that corresponds to the type of the presser foot 22 mounted to the lower end portion of the presser bar 21 (step S2). As shown in
The sewing machine 1 is configured to generate the processing line processing data that causes the processing device 3 to process the workpiece W along the processing lines. The processing device 3 can process the workpiece W along the processing lines, on the basis of the generated processing data. For example, the user can create the patchwork on the basis of the workpiece W using the following procedure. On the basis of the workpiece W that has been processed along the processing lines, the user acquires the plurality of sewing object pieces cut in the shapes of the processing lines. The user causes the two sewing object pieces corresponding to the adjacent two pattern pieces to be placed face-to-face, and overlaps the ends of the sewing object pieces to correspond with the offset lines. By sewing at a position of the predetermined distance D from the ends of the sewing object pieces corresponding with the offset lines, the user can sew together the two sewing object pieces at a position corresponding to the adjacent portions of the two adjacent pattern pieces. The user sequentially sews the plurality of sewing object pieces corresponding to each of the plurality of pattern pieces. As shown in
For each of the pattern pieces 73 and 75, the controller 2 of the sewing machine 1 sets, for the whole contour of the pattern pieces 73 and 75, the offset lines disposed at the position separated by the predetermined distance D to the outside of the contour of the pattern piece (step S13 and step S15), and sets the offset lines surrounding the pattern pieces as the processing lines (step S19). The sewing machine 1 contributes to generating the processing line processing data in which, of the pattern pieces 73 and 75 representing the pattern 62 as a whole, the processing lines are disposed at the positions separated by the predetermined distance D to the outside of the contours of the pattern pieces, for the portions that are not the adjacent portions also.
The processing device 3 can cut the workpiece W using the cutting blade 7. For each of the pattern pieces 73 and 75 representing the pattern 62 as a whole, the controller 2 of the sewing machine 1 generates, as the processing line processing data, the cutting data that cuts the workpiece W along the processing lines, using the processing device 3 (step S20). Thus, the sewing machine 1 can generate the cutting data that cuts the workpiece W along the processing lines using the processing device 3. For example, when the workpiece W is the sewing object, the processing device 3 can cut the sewing object along the processing lines in accordance with the processing line processing data. The sewing machine 1 contributes to reducing time and effort for the user to manually cut the sewing object in order to obtain the plurality of sewing object pieces for creating the patchwork.
The processing device 3 can draw on the workpiece W using the drawing pen 8. For each of the pattern pieces 73 and 75, the controller 2 of the sewing machine 1 generates the contour drawing data that draws the contours of the pattern pieces 73 and 75 on the workpiece W, in accordance with the program stored in the ROM 82 (step S21). The sewing machine 1 is configured to generate the contour drawing data that draws formation positions of stitches. For example, when the sewing object is the workpiece W, the processing device 3 can draw the contours of the pattern pieces on the sewing object on the basis of the contour drawing data. The sewing machine 1 contributes to enabling the user to confirm, on the basis of the drawn contours of the pattern pieces, the position at which the two sewing object pieces corresponding to the two adjacent pattern pieces are sewn together.
The controller 2 of the sewing machine 1 categorizes the plurality of pattern pieces generated at step S6 into the plurality of groups, in accordance with the program stored in the ROM 82 (S17). For each of the plurality of pattern pieces 73 and 75, the controller 2 generates the processing line processing data that processes the workpiece W along the processing lines per group, using the processing device 3 (step S20). The sewing machine 1 can generate the processing line processing data for each of the categorized groups. The processing device 3 can process the workpiece W along the processing lines, per group, in accordance with the processing line processing data. For example, when the plurality of type of sewing object are cut into the sewing object pieces, and the patchwork is created that represents the pattern as a whole, compared to a case in which the processing data is not generated per group, by categorizing the pattern pieces represented by the same type of the sewing object pieces into the same group, the user can reduce time and effort when preparing the sewing object pieces. Thus, the sewing machine 1 contributes to improving user convenience when the plurality of types of sewing object are cut into the sewing object pieces, and the patchwork representing the pattern as a whole is created.
The controller 2 of the sewing machine 1 generates the contour drawing data that draws the contours of the pattern pieces on the workpiece W per group, for each of the plurality of pattern pieces, in accordance with the program stored in the ROM 82 (step S21). Thus, the sewing machine 1 is configured to generate, per group, the contour drawing data that draws the formation positions of the stitches. For example, when the sewing object is the workpiece W, the processing device 3 can draw the contours of the pattern pieces on the sewing object pieces on the basis of the contour drawing data. On the basis of the drawn contours of the pattern pieces, the user can verify the position at which the two sewing object pieces corresponding to the two adjacent pattern pieces are sewn together. For example, when cutting the plurality of types of sewing object into the sewing object pieces and creating the patchwork that represents the pattern as a whole, the user can categorize the pattern pieces represented by the same type of the sewing object pieces into the same group. Compared to a case in which the processing data is not generated per group, the sewing machine 1 contributes to simplifying the processing by the processing device 3 that draws the contours of the pattern pieces on the sewing object.
For at least some of the pattern pieces 73 and 75 representing the pattern 62 as a whole, the controller 2 of the sewing machine 1 generates the processing line processing data that processes the workpiece W along the processing lines set with respect to the pattern pieces that have been inverted with respect to a reference (step S16, step S20). For at least some of the pattern pieces 73 and 75, the controller 2 generates the contour drawing data that draws, on the workpiece W, the contours of the pattern pieces that have been inverted with respect to the reference (step S16, step S21). For example, when the sewing object is the workpiece W, the processing device 3 can draw the contours of the pattern pieces on the reverse surface of the sewing object, on the basis of the contour drawing data. On the basis of the drawn contours of the pattern pieces, the user can verify the position at which the two sewing object pieces corresponding to the two adjacent pattern pieces are sewn together. Since the contours of the pattern pieces are drawn on the reverse surface of the sewing object, the sewing machine 1 contributes to allowing the user to easily verify the drawn position, even when sewing together the two sewing object pieces in a state of being placed face-to-face.
For each of the two adjacent pattern pieces, the controller 2 of the sewing machine 1 generates the identification drawing data that draws the identification information that is common to the pair of adjacent portions, of the pattern pieces 73 and 75, and that identifies the adjacent portion adjacent to the other pattern piece (step S22). Thus, the processing device 3 can draw the common identification information on the workpiece W, on the basis of the identification drawing data. On the basis of the drawn common identification information, the user easily identifies the pair of adjacent portions that are to be sewn together, of the plurality of sewing object pieces representing the pattern as a whole. The common identification information of the above-described embodiment represents the sewing order of the two adjacent pattern pieces, and thus, the sewing machine 1 contributes to the user referring to the identification information and sewing the pattern pieces together in an appropriate order.
For each of the two adjacent pattern pieces 73 and 75, the controller 2 of the sewing machine 1 sets the offset lines that use the pattern common to the pair of adjacent portions, of the contours of the pattern pieces, at the positions disposed in the positions separated by the predetermined distance D to the outside from the adjacent portions (step S12 and step S13). Thus, for each of the two adjacent pattern pieces, the sewing machine 1 can set the offset lines that use the common pattern at the positions disposed at the positions separated by the predetermined distance D to the outside from the adjacent portions. On the basis of the processing data, the processing device 3 can process the workpiece W along the offset lines that use the common pattern. On the basis of the workpiece W processed in accordance with the processing data, the user can obtain the sewing object pieces cut along the offset lines that use the common pattern. The user can easily identify the position at which the two sewing object pieces corresponding to the two adjacent pattern pieces are to be sewn together, using the common pattern as a guide. The common pattern of the present embodiment is the shape of the notch formed in the seam allowance of the sewing object piece. As shown in
The controller 2 sets the shape 61 that encompasses the pattern 62, in accordance with the program stored in the ROM 82 (step S3), and divides margin pattern 67 representing the portion between the pattern and the shape into the plurality of pattern pieces 71, 72, 74, and 76 to 78 (step S8). The controller 2 sets the offset lines for the plurality of pattern pieces 73 and 75 representing the pattern 62 as a whole and for each of the plurality of pattern pieces 71, 72, 74, and 76 to 78 representing the margin pattern 67 as a whole (step S13), and generates the processing line processing data (step S20). In addition to the processing line processing data for the pattern pieces 73 and 75 representing the pattern 62 as a whole, the sewing machine 1 can also generate the processing line processing data of the pattern pieces 71, 72, 74, and 76 to 78 representing the margin pattern 67. The sewing machine 1 contributes to improving the user convenience when creating the patchwork of the shape 61 surrounding the desired pattern 62.
While the invention has been described in conjunction with various example structures outlined above and illustrated in the figures, various alternatives, modifications, variations, improvements, and/or substantial equivalents, whether known or that may be presently unforeseen, may become apparent to those having at least ordinary skill in the art. Accordingly, the example embodiments of the disclosure, as set forth above, are intended to be illustrative of the invention, and not limiting the invention. Various changes may be made without departing from the spirit and scope of the disclosure. Therefore, the disclosure is intended to embrace all known or later developed alternatives, modifications, variations, improvements, and/or substantial equivalents. Some specific examples of potential alternatives, modifications, or variations in the described invention are provided below:
(A) The configuration of the sewing machine 1 may be changed as appropriate. The sewing machine 1 may be an industrial sewing machine or may be a multi-needle sewing machine. The present disclosure can be realized in various modes, and, for example, may be realized as a processing system or the like provided with the programs and the processing device 3. The processing data generation processing shown in
(B) The program including the instructions to execute the processing data generation processing shown in
(C) Each of the steps of the processing data generation processing shown in
(C-1) In the processing data generation processing, the controller 2 may omit at least some of the processing at step S3, step S7, and step S8. After acquiring the pattern (step S5), the controller 2 may set the shape surrounding the acquired pattern. The controller 2 may omit step S1, and may set the predetermined distance D regardless of the type of the presser foot 22. The processing at step S16 may be omitted as appropriate. The controller 2 may omit the processing at step S16 for the pattern piece having a left-right symmetrical configuration around a center axis in the left-right direction of the pattern piece, or may perform the processing at step S16 for the pattern piece having the left-right symmetrical configuration. The reference for the processing at step S16 may be changed as appropriate, and an up-down inversion may be performed, for example. The controller 2 may omit at least one selected from the group of the processing at step S10, step S21, and step S22. At step S19, the controller 2 may set the processing lines with respect to the processing region R such that regions surrounded by the plurality of processing lines partially overlap with each other. The controller 2 may set the processing lines and the contour drawing lines in the mutually different processing regions R. In other words, the contour drawing line need not necessarily be disposed on the inside of one of the processing lines. At step S21, the contour drawing data may be data that draws some of the contours of the pattern pieces, and the contour drawing data need not necessarily include data that draws the identification information of the pattern pieces. The common pattern at step S12 may be changed as appropriate. When the cutting pattern is set as the common pattern, the cutting pattern need not necessarily be used for determining the positions of the ends of the two sewing objects. At step S11, the controller 2 may acquire the two pattern pieces regardless of whether or not there is the plurality of the adjacent pattern pieces with the edges that are targeted, among the contours of the pattern pieces.
(C-2) For the pattern 62 and the shape 61 of the specific example, the controller 2 may set the processing lines and the contour drawing lines as in processing regions R5 and R6 shown in
This application is a continuation application of International Application No. PCT/JP2020/014652, filed Mar. 30, 2020, the disclosure of which is herein incorporated by reference in its entirety.
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/JP2020/014652 | Mar 2020 | US |
| Child | 17931721 | US |
