Claims
- 1. A process for fabricating a substrate of a glass plate, ceramic plate, or a porcelain-enameled plate for a thin-film semiconductor while the substrate is being held in a holding container comprising the steps of:
- placing the substrate in a holding container comprising two panels which are disposed in opposing relation to each other and define a plurality of grooves for holding the substrates spacedly, the holding container being made of polyether ether ketone having a recurring unit: ##STR2## and having a melt flow index of 1-5 g/10 minutes at 360.degree. C. under a load of 2.16 kg in accordance with ASTM D 1238;
- subjecting the container holding the substrate to chemical treatments, masking, and etching without giving off fine powder;
- washing the substrates and then subjecting the substrates to heat drying without deformation of the holding container, even in a 200.degree. C. drying step; and
- forming a semiconductor on the substrates in a form of thin film.
- 2. The process according to claim 1 wherein the polyether ether ketone is not reinforced with glass fibers.
- 3. A strong, light weight, abrasion-, deformation-, etch-, and heat-resistant holding container for holding glass plate, ceramic plate, and porcelain-enameled steel plate substrates during chemical treatments, processing including masking, etching, washing, and heat drying, transportation and storage, said container comprising a PEEK resin having a recurring unit characterized by the form: ##STR3## said resin molded to a shape defined by two opposing planar panels having a plurality of grooves therein and spaced by a plurality of round bars that are extrusion molded of said PEEK resin, the bars having a diameter of about 10-15 mm, wherein the PEEK resin has a melt flow index in the range of 1-5 g/10 minutes as measured at 360.degree. C. and under a load of 2.16 Kg in accordance with ASTM D 1238, the grooved panels having a dimension of about 175.times.220 mm, whereby said container resists abrasion by said substrates and resists deformation even in a 200.degree. C. drying step.
Parent Case Info
This is a continuation of application Ser. No. 08/152,260 filed Nov. 12, 1993, now U.S. Pat. No. 5,455,201, which in turn is a continuation of application Ser. No. 07/867,062, filed Apr. 10, 1992, abandoned, which in turn is a continuation of application Ser. No. 07/595,691 filed Oct. 4, 1990, now abandoned, which in turn is a continuation of the patent application Ser. No. 07/237,739 filed Aug. 12, 1988, now abandoned.
US Referenced Citations (18)
Foreign Referenced Citations (3)
Number |
Date |
Country |
60-147127 |
Aug 1985 |
JPX |
61-090171 |
Oct 1987 |
JPX |
62-276849 |
Dec 1987 |
JPX |
Continuations (4)
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Number |
Date |
Country |
Parent |
152260 |
Nov 1993 |
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Parent |
867062 |
Apr 1992 |
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Parent |
595691 |
Oct 1990 |
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Parent |
237739 |
Aug 1988 |
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