Claims
- 1. Process for the manufacture of styryl compounds, which comprises reacting (A) a Schiff base formula ##STR328## wherein h represents hydrogen or halogen and,
- W.sub.6 represents a phenyl residue ##STR329## wherein R.sub.x denotes a phenoxy group or an alkoxy group containing 1 to 4 carbon atoms,
- R.sub.y represents an alkoxy group containing 1 to 4 carbon atoms and,
- p represents the numbers 1 to 3 with (B) compound of formula ##STR330## wherein M.sub.2 represents hydrogen, the methyl group or phenyl, with this reaction being carried out at temperatures from 10.degree. to 150.degree. C. In the presence of a basic compound of the formula KOC.sub.x-1 H.sub.2x-1 wherein x represents an integer from 1 to 6 and with dimethylformamide as the reaction medium, and wherein in the case, where potassium hydroxide is used as a basic compound, this may have a water content of up to 15%, and wherein the ratio of the Schiff base to the basic potassium compound being 1:1 to 1:8.
Priority Claims (1)
Number |
Date |
Country |
Kind |
101110/67 |
Jul 1967 |
CHX |
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Parent Case Info
The instant application is a divisional of application Ser. No. 506,663, filed on Sept. 16, 1974, and now U.S. Pat. No. 3,991,049, which application is a continuation of application Ser. No. 292,229 filed Sept. 25, 1972, and now abandoned, which application is a continuation of application Ser. No. 743,001 filed July 8, 1968, and now abandoned.
US Referenced Citations (2)
Number |
Name |
Date |
Kind |
3697513 |
Siegrist |
Oct 1972 |
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3781279 |
Crounse et al. |
Dec 1973 |
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Non-Patent Literature Citations (3)
Entry |
Becker, Jour. Org. Chem., vol. 29 (1964), pp. 2891-2894. |
Russell et al., J.A.C.S., vol. 84 (1962), 2652-2653. |
Siegrist (II), Helvetica Chimica Acta, vol. 50, Fasc. 3, Apr. 20, 1967, pp. 906-925, 956-957. |
Divisions (1)
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Date |
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Parent |
506663 |
Sep 1974 |
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Continuations (2)
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Number |
Date |
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Parent |
292229 |
Sep 1972 |
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Parent |
743001 |
Jul 1968 |
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