Claims
- 1. A process, in the production of silicon product in a reactor, for maintaining the purity of said silicon product and for protecting said silicon product from contamination by impurities generated by erosion of a dispensing valve through which said silicon product is discharged from said reactor, said process comprising the steps of:
- (a) fluidizing a heated bed of silicon seed particles with a gas stream comprising a silicon-containing compound in a reactor having a gas-tight dispensing valve below said reactor and an angle of repose valve comprising a non-contaminating surface between said reactor and said gas-tight dispensing valve, so as to thermally decompose said silicon-containing compound and deposit silicon on said seed particles to form silicon product;
- (b) collecting said silicon product on said non-contaminating surface in an amount such that the collected silicon product forms a pile having a sloping surface angle equal to the angle of repose of said silicon product whereby said pile of silicon product blocks the flow of solids through said angle of repose valve;
- (c) opening said gas-tight dispensing valve; and
- (d) unblocking the flow of and discharging said silicon product from said non-contaminating surface through said open dispensing valve so that said silicon product free falls through said open dispensing valve without significantly contacting said dispensing valve, thereby (1) reducing erosion of said dispensing valve and (2) protecting said silicon product from contamination by impurities generated by erosion of said dispensing valve.
- 2. The process of claim 1, which includes in step (d), applying a non-contaminating gas to said pile of silicon product accumulated on said non-contaminating surface, to transfer said silicon product from said non-contaminating surface, thereby unblocking the flow of said silicon product and discharging the same from said non-contaminating surface.
- 3. The process of claim 1, wherein in step (d) said non-contaminating surface is rotated to transfer said silicon product from said non-contaminating surface, thereby unblocking the flow of said silicon product and discharging the same from said non-contaminating surface.
- 4. The process of claim 1, wherein said non-contaminating surface is defined by the inner surface of a cylinder, and in step (d) said cylinder is rotated to remove said silicon product from said non-contaminating surface thereby unblocking the flow of said silicon product and discharging the same from said non-contaminating surface.
- 5. The process of claim 1, wherein said non-contaminating surface is within a serpentine flow path.
- 6. The process of claim 5, which includes in step (d) applying a non-contaminating gas to said pile of silicon product accumulated on said non-contaminating surface to transfer said silicon product from said non-contaminating surface through said serpentine flow path beneath said non-contaminating surface.
CROSS REFERENCE TO RELATED APPLICATION
This application is a continuation of application Ser. No. 59,565, filed June 8, 1987, which in turn is a division of application Ser. No. 761,434, filed Aug. 1, 1985 both now abandoned.
US Referenced Citations (7)
Divisions (1)
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Number |
Date |
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Parent |
761434 |
Aug 1985 |
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Continuations (1)
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59565 |
Jun 1987 |
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