Claims
- 1. A device for displacing a predetermined optical element which is a constituent of a projection optical system, in a direction of an optical axis of the projection optical system, said device comprising:
- an air-bearing guide for guiding displacement of the optical element in the direction of the optical axis; and
- air supplying means for moving the optical element in the direction of the optical axis by using air pressure.
- 2. A projection exposure apparatus for projecting a pattern of a first object upon a second object, said apparatus comprising:
- a projection lens system having lens elements and an optical axis;
- a support for supporting at least one of said lens elements of said projection lens system, said support being displaceable in a direction of the optical axis of said projection lens system;
- an air-bearing guide for guiding displacement of said support in the direction of the optical axis of said projection lens system; and
- air supplying means for moving said support in the direction of the optical axis of said projection lens system by using air pressure.
- 3. An apparatus according to claim 2, further comprising means for detecting a change in an ambient pressure of said projection lens system and means for controlling said air supplying means on the basis of an output of said detecting means so as to displace said at least one lens element to maintain a substantially constant magnification in regard to the projection of the pattern upon the second object with use of said projection lens system.
- 4. An apparatus according to claim 2, further comprising means for detecting a change in an ambient pressure of said projection lens system and means for controlling said air supplying means on the basis of an output of said detecting means so as to displace said at least one lens element to adjust a focus of said projection lens system.
- 5. An apparatus according to claim 2, further comprising means for controlling said air supplying means to adjust magnification in regard to the projection of the pattern upon the second object with use of said projection lens system.
- 6. An apparatus according to claim 3, further comprising means for adjusting an interval between the second object and said projection lens system in the direction of the optical axis of said projection lens system so that a focus position of said projection lens system lies on the plane of the second object.
Priority Claims (1)
Number |
Date |
Country |
Kind |
60-171157 |
Aug 1985 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 139,106, filed Dec. 24, 1987, now abandoned; which was a continuation of application Ser. No. 891,595, filed Aug. 1, 1986, now abandoned.
US Referenced Citations (7)
Foreign Referenced Citations (1)
Number |
Date |
Country |
48-90538 |
Nov 1973 |
JPX |
Continuations (2)
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Number |
Date |
Country |
Parent |
139106 |
Dec 1987 |
|
Parent |
891595 |
Aug 1986 |
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