Claims
- 1. A method of making a prosthetic implant having a metal body with a metal porous surface layer metallurgically bonded to said metal body with the metallurgical bond prevented at predetermined locations relative to said metal body, said method comprising the steps of;
- a) providing a prosthetic implant having a metal body, said metal body having a predetermined location of high stress;
- b) providing a porous layer formed from a first metal;
- c) metallurgically bonding said porous layer to the metal body such that said porous layer and;
- d) providing means for preventing the porous layer from bonding with the metal body at said predetermined location of high stress.
- 2. The method of claim 1 wherein steps c and d further includes the steps of;
- a) bonding a thin layer of a second metal to a portion of said porous layer;
- b) positioning said porous layer about said implant such that said thin layer is adjacent said predetermined location of high stress;
- c) metallurgically bonding said porous layer to said metal body, wherein said thin layer of said second metal has a melting temperature higher than a melting temperature of said porous layer and said metal body such that metallurgical bonding is prevented at said predetermined location of high stress.
- 3. A method of making a prosthetic implant having a metal body with a metal porous surface layer metallurgically bonded to said metal body with the metallurgical bond prevented at predetermined locations relative to said metal body, said method comprising the steps of:
- a) providing a prosthetic implant having a metal body, said metal body having a predetermined location of high stress;
- b) providing a porous layer formed from a first metal;
- c) metallurgically bonding a portion of said porous layer to the metal body, and;
- d) providing means for preventing the porous layer from bonding with the metal body at said predetermined location of high stress.
- 4. The method of claim 3 wherein step c and d further include the steps of:
- a) bonding a thin layer of a second metal to a portion of said porous layer;
- b) positioning said porous layer about said implant such that said thin layer is adjacent said predetermined location of high stress;
- c) metallurgically bonding said porous layer to said metal body, wherein said thin layer of said second metal has a melting temperature higher than a melting temperature of said porous layer and said metal body such that metallurgical bonding is prevented at said predetermined location of high stress.
Parent Case Info
This application is a continuation of application Ser. No. 07/994,018 filed Dec. 21, 1992 abandoned.
US Referenced Citations (17)
Continuations (1)
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Number |
Date |
Country |
Parent |
994018 |
Dec 1992 |
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