Printing devices utilize print heads to selectively deposit fluid, such as inks, onto print media. In many cases, the print heads degrade over time due to ink corrosion, thus reducing print quality.
For a detailed description of exemplary embodiments of the invention, reference will now be made to the accompanying drawings. The drawings are not necessarily drawn to scale unless otherwise specified.
Certain terms are used throughout the following description and claims to refer to particular system components. As one skilled in the art will appreciate, printer companies may refer to a component by different names. This document does not intend to distinguish between components that differ in name but not function.
In the following discussion and in the claims, the terms “including” and “comprising” are used in an open-ended fashion, and thus should be interpreted to mean “including, but not limited to . . . .”
In this disclosure, the term “coupled” means the joining of two members directly or indirectly to one another. Such joining may be stationary in nature or movable in nature. Such joining may be achieved with the two members or the two members and any additional intermediate members being integrally formed as a single unitary body with one another or with the two members or the two members and any additional intermediate member being attached to one another. Such joining may be permanent in nature or alternatively may be removable or releasable in nature. The term “operably coupled” means that two members are directly or indirectly joined such that motion may be transmitted from one member to the other member directly or via intermediate members.
In this disclosure, the term “protective coating” refers to a coating comprising at least one layer of material which protects silicon (Si) feed slots from ink corrosion (i.e., chemical etching or physical damage to the feed slot by one or more component of the ink and/or by fluid forces of the ink), unless otherwise specified.
In this disclosure, the term “sputtering” refers to a direct physical bombardment and interaction of gaseous atoms and ions onto a target material (metals) species in either atomic (neutrals) or as ions. Sputter coating refers to the deposition of the target material onto a substrate.
The term “re-sputtering” refers to material being removed from the substrate and redeposited onto other areas of the substrate due to interactions with incident energetic atoms or ions and thus is an indirect interaction between target material and gas species.
In this disclosure, the term “aspect ratio” refers to the ratio between the vertical (depth) dimension of a structure and the shortest lateral dimension of the structure. For example, the aspect ratio of an inkjet print head feed slot is the ratio between the depth of the slot and the width of the slot. For the purposes of this disclosure, the term “high aspect ratio” generally refers to a structure in which the vertical dimension is more than two times the minimal lateral width.
The following discussion is directed to various embodiments of the invention. Although one or more of these embodiments may be preferred, the embodiments disclosed should not be interpreted, or otherwise used, as limiting the scope of the disclosure, including the claims. In addition, one skilled in the art will understand that the following description has broad application, and the discussion of any embodiment is meant only to be exemplary of that embodiment, and not intended to intimate that the scope of the disclosure, including the claims, is limited to that embodiment.
Printing Device
In accordance with various embodiments, print cartridge 16 comprises a nozzle plate and a print head die that have fluid feed slots, the surfaces of which are provided with a protective coating which does not extend into the firing chamber. The protective coating inhibits or reduces corrosion of the die caused by the interaction between the die and the ink while not substantially interfering with the ejection of ink from the firing chambers and through the nozzles. As a result, print quality over the life of print cartridge 16 is enhanced and prolonged.
Although cartridge 16 is illustrated in
Printer 10 may have other configurations and may comprise other printing devices which print a controlled pattern, image, layout, or the like of ink onto a surface. Examples of other such printing devices include, but are not limited to, facsimile machines, photocopiers, multifunction devices or other devices which print or eject ink.
Print Head
In accordance with some embodiments, head assembly 20 comprises a mechanism coupled to reservoir 18 by which the ink is selectively ejected onto a medium. In the embodiment as illustrated by
In the particular embodiment as illustrated by
Encapsulants 34 in
Print head die 30 (also known as a print head substrate or chip) comprises feed slots 40, ribs 41 (
As shown by
Resistors 32 comprise resistive elements or firing circuitry coupled to print head die 30 and configured to generate heat so as to vaporize portions of the ink to forcibly expel drops of printing fluid through nozzles 42 in orifice plate 36. In one embodiment, resistors 32 (schematically shown) are formed by multiple thin film layers 33 which may also form transistors, electrical routing lines, cavitation and chemical protection layers and contact pads for such resistors 32. The thin films include materials such as tantalum aluminum or tungsten silicon nitride for resistors, materials such as polysilicon, borophosphosilicate glass, and silicon oxide on doped silicon for transistors, materials such as aluminum for electrical traces, materials such as tantalum, silicon oxide, silicon nitride, and silicon carbide for cavitation and chemical protection layers, and materials such as aluminum or gold for contact pads. In yet other embodiments, the firing circuitry may have other configurations.
Body 22 of reservoir 18 includes inter-posers or headlands 48. Headlands 48 comprise those structures or portions of body 22 which are connected to die 30 so as to fluidly seal one or more chambers of reservoir 18 to a second side 50 of die 30. In an embodiment as shown in
In an embodiment as shown in
Orifice plate 36 comprises a plate or panel having a multitude of orifices which define nozzle openings through which the printing fluid is ejected. Orifice plate 36 is mounted or secured on the bottom side of slots 40 and their associated firing circuitry or resistors 32. In one embodiment, orifice plate 36 comprises a photo-imagable epoxy substrate. As shown in
Prink Head Die
As shown in
As rib structures are supports that strengthen the feed slots; they are especially useful in die size shrinkage. “Die size shrinkage” or “die shrinkage” generally refers to the practice of modifying the design of a die of given size by reducing the width of each feed slot as well as non slotted areas and increasing the number of dies on a wafer, or increasing the total number of feed slots in the die. One potential advantage of using a print head having an increased number of feed slots and nozzles is that higher resolution and better image quality of the printed image is possible. The spacing of the feed slots may be reduced to shrink die size by using rib structures. Alternatively, the number of feed slots may be increased by reducing the spacing using the same size die. Therefore, the number of ink colors in a given application may be increased by storing different inks in different feed slots. In some embodiments, rib structures 41 extend through the entire depth of the feed slot (through ribs) while in other embodiments the rib structure extends only partially in the vertical dimension (as illustrated in
Feed slots without ribs may also be used for die size shrinkage. These feed slots usually have high aspect ratios (e.g., greater than 2) so that sufficient amount of ink may be stored in the slots and a sufficient number of slots may be included in the die. In some cases, the feed slots have an aspect ratio of greater than 3.
As shown in the embodiment of
Protective Coating
It has been observed that many fluids or inks, especially high performance inks, tend to corrode the one or more materials of print head die 30 over time. For example, it is been found that many high-performance inks tend to corrode the silicon from which die 30 is formed. Ribs 41 in slots 40, having a high surface area, are likewise vulnerable to ink corrosion. High performance inks typically contain one or more potentially corrosive substances such as dispersants which may have charged functionality or buffered solutions with high pH. The corroded and dissolved silicon contaminates the fluid or the ink and may affect the ejection of the ink by affecting either the quality of the ink itself or by being deposited upon resistors 32 or other components that eject the ink. It has also been found that the dissolved silicon contaminants in the fluid or the ink subsequently precipitate out of the ink and become deposited in the openings 70 or 42 to at least partially occlude such openings. In certain instances, the silicon growth in the nozzle opening 42 may create nozzle directionality issues and reduce printing performance. Thus, in some applications, ink components known to be corrosive to Si may be included in inks that are used in a coated print head assembly.
As further shown by
Coating Material. Coating 60 comprises one or more layers of one or more materials that are impervious to the ink components. Coating 60 has an outermost surface that is substantially inert to the fluid directed through slots 40 of print head die 30. Suitable coating materials comprise titanium (Ti), titanium nitride (TiN), tungsten (W), tantalum (Ta), or tantalum nitride (TaN). The protective coating may comprise a homogeneous single layer of a particular material or comprise multiple layers of a combination of materials. In an embodiment, the protective coating comprises a layer of Ti. In another embodiment, the protective coating comprises a layer of TiN. In a further embodiment, the protective coating comprises a layer of W. In yet another embodiment, the protective coating comprises a layer of Ta. In an embodiment, the protective coating comprises a layer of TaN. In an embodiment, the protective coating comprises a layer of Ti and a layer of TiN with the TiN layer as the outermost surface. In another embodiment, the protective coating comprises a layer of Ta and a layer of TaN with the TaN layer as the outermost surface. In yet another embodiment, the protective coating comprises a layer of Ti and a layer of W with the W layer as the outermost surface.
Coating 60 has a sufficient thickness to ensure the integrity (e.g., continuous with no cracking or breaking) of the protective coating formed on the surfaces of feed slot 40. At the same time, coating 60 is thin enough that cracking or delamination of coating 60 resulting from tensile stresses during use is avoided or minimized. In some applications, the total thickness of the protective coating is in the range of from about 50 to about 300 angstroms. In some applications, the coating is from about 75 to about 250 angstroms in thickness. In still other applications, the coating is from about 90 to about 210 angstroms in thickness. When the protective coating is very thin (e.g., less than about 300 angstroms), it is transparent in visible light and facilitates downstream die inspection. In some other applications, the total thickness of the protective coating is up to 1000 angstroms. In yet other applications, the total thickness of the protective coating is up to 2000 angstroms.
In some embodiments, when the protective coating comprises multiple layers, the stress in the protective layer is balanced to zero. For example, the Ti layer has compressive stress and the TiN layer has tensile stress. These two layers in combination result in a zero-stress protective coating that is also resistant to delamination. The stress of a deposited film is readily determined by measuring the curvature of a wafer after a film is deposited and accounting for the substrate thickness, Young's modulus of the substrate, and the thickness of the deposited film using known methods. Compressive stressed films cause the substrate to bend convex, while tensile stressed films cause the substrate to bend concave.
Coated Area. Coating 60 covers all the surfaces associated with feed slot 40, including all of the surfaces of the rib structures. In
In an embodiment, coating 60 covers the back face 74 of die 30 (the backside of the wafer including die 30). As a result, coating 60 further protects the top surface of die 30 during contact with fluid from chambers 51. In addition, those portions of die 30 which are bonded to head lands 48 by adhesive 52 are also benefited. In particular, coating 60 improves adhesion of the materials of die 30 to the structural adhesive 52. In alternative embodiments, coating 60 either coats a portion or does not coat the back face 74 of die 30.
As shown in
Because the coverage of coating 60 is controlled and limited so as to not extend appreciably into firing chambers 47 as discussed below under “SIP method,” coating 60 does not interfere with the firing properties, such as a turn on energy, of resistors 32 or those fluid ejection characteristics achieved by the overall firing system. This may be especially important where coating 60 is formed from materials having a relatively low thermal conductivity (a thermal conductivity much lower than the material of resistors 32), which would otherwise impact the ejection of fluid within each firing chamber 47.
SIP mMethod
The coating material may be deposited using self-ionized plasma (SIP) physical vapor deposition technology that is known in the art. For example, SIP deposition apparatus and procedures as described in US Pat. App. No. 20040112735 may be suitably employed for this purpose.
In some cases, coating 60 needs to be kept away from certain surfaces of the print head assembly (such as the resistor surfaces). This may be achieved by conventional techniques such as shadow masking or liftoff, which are known methods in the art. For chemical vapor deposition (CVD) and atomic layer deposition (ALD), masking or liftoff is often necessary to avoid spreading the coating to unwanted area. However, masking or liftoff is not necessary for the SIP vapor deposition method disclosed herein. Therefore, the SIP vapor deposition method reduces the complexity of the coating process.
In an embodiment, the print head die with feed slots is sputtered prior to being assembled with the print head architecture (including firing chamber, nozzles, and other relevant structures). In some embodiments, the die is similar to die 30 shown in
In another embodiment, as shown in
Referring to
A pedestal electrode 220 has a support surface 225 which supports the DAA 130′ and biases the DAA 130′ to attract ionized deposition material. DAA 130′ is removably fixed on the support surface 225 of the pedestal electrode 220 on its front side or orifice plate 145. The pedestal electrode 220 is powered by an AC power source 250. Resistive heaters, refrigerant channels, and a thermal transfer gas cavity in the pedestal 220 may be provided to allow the temperature of the pedestal to be controlled to temperatures of less than −40° C., thereby allowing the die temperature to be similarly controlled. The DAA 130′ is placed on the pedestal electrode 220 with the wide portion of the feed slots facing toward target 290.
The SIP PVD reactor comprises a controller 210, which in some cases controls the magnetron 280, the DC power source 260, and the AC power source 250. In an embodiment, process conditions for the SIP vapor deposition process are chamber pressure in the range of 0.5 to 2 millitorr, argon gas flow into the chamber in range of 10 to 15 SCCM, pedestal gas flow in the range of 3 to 6 SCCM, pedestal temperature in the range of −50° C. to 130° C., DC power in the range of 8 to 25 kilowatts, AC bias in the range of 230 to 270 watts, and deposition time in the range of 5 to 90 seconds based on target thickness and process conditions.
The rate at which material is sputtered may be controlled by controlling the power of the source biasing the target. Because a relatively thin layer deposition is often desired, a low sputtering rate is often used to facilitate controlling the thickness of deposition. Consequently, the power level of the target biasing source may be set relatively low to assist in achieving the desired thin layer deposition. For example, at a sufficiently high plasma density adjacent a target, a sufficiently high density of target metal ions can develop that ionizes additional metal sputtered from the target. As noted above, such a plasma is referred to as a self-ionizing plasma (SIP). The sputtered metal ions may be accelerated across the plasma sheath and toward a biased substrate, thus increasing the directionality of the sputtered material. In this case, the biased substrate is the DAA 130′. The increased energetics of the impinging ion and deposited material on non vertical planes of the substrate/slot allow material to be resputtered on vertical sidewalls. Coating of vertical sidewalls is a challenge in conventional physical vapor deposition (PVD) systems especially in high aspect ratio structures. As a result, sidewall and bottom coverage in deep and narrow slots may be improved by the present SIP method.
SIP is able to deposit material into high aspect ratio feed slots and the underside surface 69 of rib structures 41 (
When the resulted coated die is used for printing, protective coating 60 (
In an embodiment, a method of making a corrosion resistant print head die is described. The method comprises creating a self-ionized plasma (SIP) of a coating material; establishing a bias on a print head die comprising a plurality of feed slots (40), each feed slot (40) comprising side wall surfaces (61); and causing the coating material plasma to be deposited on the surfaces mentioned above to form a protective coating, wherein at least a portion of the coating material is deposited on at least a portion of the surfaces by resputtering. In some cases, the feed slots have an aspect ratio greater than 2. In some further embodiments, the feed slot comprises at least one rib (41), each rib (41) comprising a top surface (68), two side surfaces (66), and an under surface (69), and the formed protective coating is deposited on the top surface (68), two side surfaces (66), and under surface (69) of each rib (41).
In some cases, the coating material is selected from the group consisting of titanium (Ti), titanium nitride (TiN), tungsten (W), tantalum (Ta), tantalum nitride (TaN) and combinations thereof. In some cases, the protective coating comprises at least two layers of the material. For example, the protective coating comprises a layer of titanium (Ti) and a layer of titanium nitride (TiN), wherein the layer of titanium nitride (TiN) is outermost. In some embodiments, the formed protective coating has zero stress. In applications, the protective coating is capable of protecting the coated surfaces from ink corrosion. In some applications, the protective coating is transparent under visible light.
In another embodiment, a print head is disclosed. The print head comprises a die (30) comprising a plurality of feed slots (40) having an aspect ratio greater than 2, each feed slot (40) comprising side wall surfaces (61); a protective coating disposed on each mentioned surface; and a plurality of firing chambers (47) in fluid communication with the feed slots (40), respectively, wherein the protective coating does not extend into the firing chambers (47) for more than 5 microns. In some cases, each feed slot of the print head further comprises at least one rib (41), each rib (41) comprising a top surface (68), two side surfaces (66), and an under surface (69), and the protective coating is disposed on the top surface (68), two side surfaces (66), and under surface (69) of each rib (41).
In some cases, the protective coating has substantially zero stress. In some cases, the protective coating is formed by self-ionized plasma physical vapor deposition. In some embodiments, the protective coating is formed from a material selected from the group consisting of titanium (Ti), titanium nitride (TiN), tungsten (W), tantalum (Ta), tantalum nitride (TaN) and combinations thereof. In some cases, the protective coating comprises at least two layers of the material.
In yet another embodiment, an inkjet cartridge is disclosed, comprising a print head assembly including the print head described herein and printing circuitry, and ink reservoir attached to the assembly.
Although the present disclosure has been described with reference to example embodiments, workers skilled in the art will recognize that changes may be made in form and detail without departing from the spirit and scope of the claimed subject matter. For example, although different example embodiments may have been described as including one or more features providing one or more benefits, it is contemplated that the described features may be interchanged with one another or alternatively be combined with one another in the described example embodiments or in other alternative embodiments. Because the technology of the present disclosure is relatively complex, not all changes in the technology are foreseeable. The above discussion is meant to be illustrative of the principles and various embodiments of the present invention. Numerous variations and modifications will become apparent to those skilled in the art once the above disclosure is fully appreciated. For example, although SIP PVD is emphasized in the foregoing description, any other suitable coating technique capable of achieving the same result may be substituted. Also, it should be understood that coating materials other than those expressly described herein which are capable of serving the same purpose and are capable of being applied similarly may be substituted. It is intended that the following claims be interpreted to embrace all such variations and modifications.
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/US2009/062406 | 10/28/2009 | WO | 00 | 2/9/2012 |