The field of the invention is that of semiconductor devices made on a semiconductor-on-insulator substrate (SeOI substrate) comprising a thin layer of semiconducting material separated from a base substrate by an insulating layer.
The invention more specifically relates to a pseudo-inverter SeOI circuit which, depending on the inputs which are applied to it, may provide the logic INV (inversion), NOR and NAND functions, so that the whole of the standard library of CMOS cells may be described on the basis of a single circuit of the invention.
A preferential application of the invention relates to the making of a wordline driver circuit for a network of memory cells.
A conventional DRAM (Dynamic Random Access Memory) memory cell is formed by associating a transistor and a capacitance for storing charges. More recently, a DRAM memory cell only consisting of one transistor has been proposed. This cell utilizes a floating channel effect for storing charges and does not require any additional capacitance.
Memory cells are conventionally laid out in a memory array so that the gates of the transistors of the cells laid out along a line of the memory array share a wordline, while the sources of the transistors of the cells laid out along a column of the memory array share a bitline. The stored datum in a memory cell may be accessed by means of a single row address represented by the wordline and of a single column address represented by the bitline.
Each wordline is controlled via a wordline driver circuit, which is itself driven by a row address decoder.
In practice, the access transistor in the DRAM memory cell must have a very low leakage to sustain the information as long as possible. Its threshold voltage should thus be relatively high. This implies that a relatively large voltage has to be applied on the gate in order to make it conducting. It will be noted that the voltage of the wordline should also take into account the source-dependent change in the threshold voltage of the transistor of the memory cell known as “body effect”. The wordline driving the gate of the transistor should thus deliver a voltage which is typically 1.5 to 2 times higher than the nominal voltage.
Conventional wordline driver circuits are thus relatively bulky notably relatively to the size of a memory cell, which generally causes integration problems (notably the requirement for resorting to a stacking technique, a so-called “staggering” technique, for several driver circuits behind each other in order to address several adjacent lines of memory cells).
In
The driver circuit 300 addresses a line of memory cells 100 via the wordline WL. All the nodes of the circuit 300 have a high voltage, except for the input signals Yi and Yi# from the line address decoder 330. The transistors of the driver circuit 300 thus have to support high voltages, notably the transistors 303 and 313.
By taking into account the different interconnections, the Applicant was able to estimate that the area of the driver circuit 300 of
The staggering of several driver circuits 300 behind each other then proves to be necessary in order to take into account the pitch difference.
A simpler wordline driver circuit is illustrated in
It will first of all be noted that this circuit includes two logic NOR gates 2, 3 in parallel, having a common input MWL# and having as another input, a single signal A or its complementary A#. The outputs are formed by local wordlines LWLE and LWL0.
It will then be noted that unlike the circuit of
An estimation made by the Applicant of the size of each of the transistors relatively to the reference W303 designating the width of the transistor 303 of
The invention now proposes a circuit which does not have the drawbacks mentioned earlier, in particular that it is a relatively compact, not very bulky, low consumption circuit, which may be used as a wordline driver circuit in a memory array.
The invention also proposes a particularly simple, compact and not very bulky circuit which may be used for providing different logic functions.
In this context, the invention relates to a circuit made on a semiconductor-on-insulator substrate comprising a thin layer of semiconducting material separated from a base substrate by an insulating layer. This circuit comprises a first transistor having a first channel, a second transistor having a second channel, with the transistors provided in serial association between first and second terminals for applying a power supply potential, each of the transistors comprising a drain region and a source region in the thin layer, a channel extending between the source region and the drain region, and a front control gate located above the channel. Each transistor has a back control gate formed in the base substrate below the channel of the transistor and capable of being biased in order to modulate the threshold voltage of the transistor. Advantageously, at least one of the transistors is configured for operating in a depletion mode under the action of a back gate signal which will sufficiently modulate its threshold voltage.
Preferably, the first terminal for application of a power supply potential is biased by the complementary signal of the back gate signal, whereas the second terminal for application of a power supply potential is biased at an OFF state, while the second transistor is configured in order to operate in a depletion mode when the back gate signal is in an ON state.
Another embodiment of the invention includes a wordline driver circuit comprising at least one pair of circuits as defined herein and laid out in parallel, each circuit of the pair being intended to receive an input signal from a row address decoder and providing at the output a signal intended to be used as a local wordline for a plurality of memory cells laid out as a row.
A further embodiment of the invention is a memory incorporating a wordline driver circuit as disclosed herein.
Finally, a further embodiment of the invention is a method for controlling a driver circuit as disclosed herein, wherein in the active mode, the signal for biasing the back gates of the first circuit of a pair of circuits is complementary of the signal for biasing the back gates of the second circuit of the pair of circuits; and in the inactive mode, the first terminal for application of a power supply potential and the signals for biasing the back gates of each of the circuits of the pair are in the OFF state.
Other aspects and advantages of the present invention will become better apparent upon reading the following detailed description of preferred embodiments thereof, given as a non-limiting example, and made with reference to the appended drawings wherein:
a and 3b illustrate examples of transistors having a back control gate;
According to a first aspect, provides a circuit made on a semiconductor-on-insulator substrate comprising a thin layer of semiconducting material separated from a base substrate by an insulating layer, including a transistor of a first type of channel in series with a transistor of a second type of channel between a first and a second terminals for application of a power supply potential, each of the transistors comprising a drain region and a source region in the thin layer, a channel extending between the source region and the drain region and a front control gate located above the channel. Each transistor advantageously has a back control gate formed in the base substrate below the channel of the transistor and capable of being biased for modulating the threshold voltage of the transistor. Also, at least one of the transistors is configured in order to operate in a depletion mode under the action of a back gate signal which will sufficiently modulate its threshold voltage.
Certain preferred but non-limiting aspects of this device include the following:
According to a second aspect, the invention relates to a wordline driver circuit comprising at least one pair of circuits according to the first aspect of the invention, laid out in parallel, each circuit of the pair being intended to receive an input signal from a row address decoder and providing at the output a signal intended to be used as a local wordline for a plurality of memory cells laid out as a row.
According to still another aspect, the invention relates to a memory incorporating a wordline driver circuit according to the second aspect of the invention.
According to still another aspect, the invention relates to a method for controlling a driver circuit according to the second aspect of the invention, wherein in an active mode, the signal for biasing the back gates of the first circuit of a pair of circuits is the complementary signal of the signal for biasing the back gates of the second circuit of the pair of circuits; while in an inactive mode, the first terminal for application of a power supply potential and the signals for biasing the back gates of each of the circuits of a pair are in the “OFF” state.
The invention according to a preferred aspect relates to a circuit made on a semiconductor-on-insulator substrate comprising a thin layer of semiconducting material separated from a base substrate by an insulating layer.
The circuit includes a transistor of a first channel type in series with a transistor of a second channel type between a first and a second terminals for application of a power supply potential, each of the transistors comprising a drain region and a source region in the thin layer, a channel extending between the source region and the drain region, and a front control gate located above the channel.
In the embodiment illustrated in
The gates of the transistors TP, TN of the circuit are connected together and connected to a common input (B in
The circuit according to the first aspect of the invention is said to be a pseudo-inverter in that it has the standard structure of a CMOS inverter. However, as this will be described further subsequently, depending on the inputs which are applied on this circuit, the latter may produce other logic functions.
It will be noted that the logic inversion function may moreover be achieved by setting in a standard way the first terminal for application of a power supply potential to the high state VDD and by setting the second terminal for application of a power supply potential to the low state GND.
Within the scope of the invention, each of the transistors has a back control gate formed in the base substrate below the channel and capable of being biased for modulating the threshold voltage of the transistor.
A P channel transistor is illustrated in
An N channel transistor is illustrated in
In
A transistor for which the channel has N type conductivity and a back control gate of conductivity P has a very high threshold voltage. This threshold voltage may then be reduced by applying a positive voltage on the back control gate. A transistor for which the channel has N type conductivity and a back control gate of conductivity N, as for it, has a nominal threshold voltage which may be reduced by applying a positive voltage on the back control gate.
This variation of the threshold voltage of the transistor via the back control gate may be formulated as Vth=Vt0−α.VBG, wherein Vth represents the threshold voltage of the transistor, VBG the voltage applied to the back control gate, Vt0 the nominal threshold voltage (which may be shifted by the work function depending on whether a back control gate of the N or P type is used), and α is a coefficient related to the geometry of the transistor.
As shown in the thesis “Architectures innovantes de mémoire non-volatile embarquée sur film mince de silicium” (Innovating architectures of non-volatile memory embedded on a thin film of silicon) defended by Germain Bossu in June 2009 at the University of Provence Aix Marseille I, the coefficient α may notably be approached as
wherein tox designates the thickness of the dielectric gate layer separating the front control gate from the channel, tBOX designating the thickness of the insulating layer separating the back control gate from the channel and tSi designating the thickness of the thin layer.
It is therefore understood that the type of doping of the back control gate associated with a transistor either shifts the nominal threshold voltage or not, and that the bias of the back control gate allows adjustment of the threshold voltage.
In this respect,
An N type transistor has a nominal threshold voltage VTN0. The effective threshold voltage of this transistor may be reduced from the nominal threshold voltage VTN0 by increasing the bias VBG of its back control gate, and this globally linearly according to a slope corresponding to the coefficient a related to the geometry of the transistor.
Two possible variations of the threshold voltage of an N channel transistor versus the geometry coefficient α are illustrated in
A P type transistor has a nominal threshold voltage VTP0. The effective threshold voltage of this transistor may be increased from the nominal threshold voltage VTP0 by reducing the bias VBG of its back control gate, and this globally linearly according to a slope corresponding to the coefficient a related to the geometry of the transistor.
Two possible variations of the threshold voltage of a P channel transistor versus the geometry coefficient α are illustrated in
Preferentially, provision is made for the transistors of the circuit according to the first aspect of the invention to be fully depleted. The benefit is thus due to the fact that such transistors have very low fluctuation of dopants (RDF: Random Dopant Fluctuation): the nominal threshold voltage is then defined very specifically, as well as the variation of the threshold voltage versus bias of the back control gate.
Referring back to the description of the invention, it is provided that at least one of the transistors of the circuit is configured so as to operate in a depletion mode under the action of a back gate signal which will sufficiently modulate its threshold voltage.
It may also be advantageously provided that the back control gates of the transistors TP and TN are biased by a same back gate signal (possibly with a modification of the amplitude of the back gate signal).
It will be noted at this stage that depending on the contemplated applications, transistors may be selected for which the nominal threshold voltages (VTN0 and VTP0) are not identical (in absolute value), so that only one of the two transistors of the circuit is capable of operating in a depletion mode. Alternatively, a back gate signal which does not have the same amplitude may also be applied to the back control gate of each of the transistors TP and TN.
According to a first possible embodiment of the circuit according to the first aspect of the invention illustrated in
In
It will be noted that within the claims, the term “ON state” is preferred to “high state” and the term “OFF state” is preferred to “low state” as the concept high/low is fine for the N-channel transistor but inverted for the Pchannel transistor.
Hence ON means that the transistor is boosted and leaky. It can even be depletion if there is enough amplitude in threshold voltage modulation. OFF means that the threshold voltage of the transistor is elevated by the back gate control: the transistor has less leakage and less drive. The voltage effects by the back control gate are symmetrical for P and N channels.
The operation of the circuit of
B=H and A=H
When the input B of the pseudo-inverter circuit is in the high state, the transistor TN is conducting while the transistor TP is blocked.
As the signal A applied to the first terminal for application of a power supply potential is high, the circuit is powered.
The complementary signal A# applied to the back gates is such that the transistor TP remains in an enhancement mode and is therefore blocked.
Alternatively, a transistor geometry (via the parameters tox, tBOX and tSi) may be adopted such that TP is in an enhancement mode when A#=0V. This alternative should of course be compatible with the properties that the transistor TN should have in the other cases.
The OUT output of the circuit is then in the low state.
B=H and A=L
As the input B of the pseudo-inverter circuit is in the high state, the transistor TN is conducting while the transistor TP is blocked.
As the signal A applied to the first terminal for application of a power supply potential is (sufficiently) low, the circuit is not powered.
As the back gate signal A# is in the high state, the transistor TP is blocked and has very low leakage current IOFF.
As the back gate signal A# is in the high state, the transistor TN has a strong conduction current and therefore perfectly maintains a low state on the output OUT of the circuit.
B=L and A=H
As the input B of the pseudo-inverter circuit is in the low state, the transistor TN is blocked while the transistor TP is conducting.
As the signal A applied to the first terminal for application of a power supply potential is high, the circuit is powered.
The complementary signal A# applied to the back control gates is such that the transistor TP remains in an enhancement mode and is therefore conducting with strong conduction current. A high state is therefore perfectly maintained on the output OUT of the circuit.
B=L and A=L
As the input B of the pseudo-inverter circuit is in the low state, the transistor TN is blocked while the transistor TP is conducting.
As the signal A applied to the first terminal for application of a power supply potential is (sufficiently low), the circuit is not powered.
As the back gate signal A# is in the high state, the transistor TP is blocked and has very low leakage current IOFF. The transistor TN, as for it, has very good conduction current and remains conducting insofar that the combination of the parameters tox, tBOX and TSi is such that the transistor then operates in a depletion mode. The OUT output of the circuit is then in the low state.
The truth table of the circuit of
It will be noted that the signals A and B respectively act on back control and front control gates for which the oxide thicknesses separating them from the channel of the transistor are not the same (the thickness of the buried insulating BOX layer being typically larger than the dielectric gate layer separating the front control gate from the channel). Consequently, the inputs A and B are not equivalent: A is a slow input while B is a relatively fast input.
A possible application of the NOR circuit of
In this application, a wordline driver circuit of a memory array is provided comprising at least one pair of circuits 4, 5 according to
The control of the driver circuit illustrated in
In an active mode, the back gate bias signal A# of the first circuit 4 of the pair of circuits is the complementary signal of the back gate signal A of the second circuit 5 of the pair of circuits.
In such a way that when the main wordline signal MWL# is in the high state, the first and second circuits 4, 5 both provide a low state at the output (LWLE=LWL0=L). On the other hand, when the main wordline signal MWL# is in the low state, the first circuit 4 provides a high state (LWLE=H), whereas the second circuit 5 provides a low state (LWL0=L).
In an inactive mode (standby mode), the first terminal for application of a power supply potential and the bias signals of back gates of each of the circuits of the pair are in the low state.
In the inactive mode, the main wordline signal MWL# is in the high state. The transistors TN of the circuits 4, 5 are conducting whereas the transistors TP of the circuits 4, 5 are blocked.
Insofar that the first terminal for application of a power supply potential and the bias signals of the back gates of each of the circuits of the pair are in the low state, the driver circuit is not powered and therefore no leakages are observed. The outputs (local wordlines LWLE and LWL0) are therefore both in the low state.
The truth table of the driver circuit of
The wordline driver circuit of
According to a second possible embodiment of the circuit according to the first aspect of the invention illustrated in
In
The operation of the circuit of
B=L and A=L
The transistor TP is conducting and has strong conduction current because the back gate signal is in the low state.
The transistor TN is blocked and has few leakages (a weak leakage current because of the back gate signal in the low state). In any case, it is not powered.
The output OUT is thus in the high state.
B=H and A=L
The transistor TN is blocked and has few leakages (a weak leakage current because of the back gate signal in the low state). In any case, it is not powered.
The transistor TP is conducting insofar that it then operates in a depletion mode under the action of the bias signal of the back gate in the low state.
The output OUT is thus in the high state.
B=L and A=H
The transistor TP is conducting (but not boosted because of the high state applied to the back gate signal).
The transistor TN is blocked (it is not in a depletion mode here)
The output OUT is thus in the high state.
B=H and A=H
The transistor TP is blocked (and not boosted because of the high state applied to the back gate signal).
The transistor TN is conducting (it is not in a depletion mode here)
The output OUT is thus in the low state.
The truth table of circuit of
Within the scope of the invention, the transistors TN and TP may be boosted (increase in their conduction current) when this is desired because of the bias of their back control gate.
Taking the example of the driver circuit of
Thus, the size of the transistor TP is of the order of one third of that of the transistor 303 of
Thus, the driver circuit has a size globally equal to the size (W303) of the transistor 303
The solution proposed by the invention is thus much denser (by a factor of the order of four taking into account limitations relating to metallization) than those of standard driver solutions.
As indicated earlier, consumption is also reduced.
The integration of such a circuit is further simpler to apply. It does not require resorting to stacking (staggering) and facilitates the introduction of 4F2 surface area memory cells by simplifying the peripheral components.
Further, an advantage of the invention is to make available a circuit which, depending on the inputs which are applied to it, may both provide logic INV, NOR and NAND functions, so that the whole of the standard library of CMOS cells may be described on the basis of the single circuit of the invention.
As mentioned earlier, the inputs are not equivalent, in terms of speed notably, but such a circuit may prove to be very interesting in identified contexts, such as for example for decoding circuits, or driver circuits.
Number | Date | Country | Kind |
---|---|---|---|
10 52543 | Apr 2010 | FR | national |
This application is a continuation of application Ser. No. 12/793,553 filed Jun. 3, 2010.
Number | Name | Date | Kind |
---|---|---|---|
4169233 | Haraszti | Sep 1979 | A |
5028810 | Castro et al. | Jul 1991 | A |
5306530 | Strongin et al. | Apr 1994 | A |
5325054 | Houston | Jun 1994 | A |
5455791 | Zaleski et al. | Oct 1995 | A |
5557231 | Yamaguchi et al. | Sep 1996 | A |
5608223 | Hirokawa et al. | Mar 1997 | A |
5646900 | Tsukude et al. | Jul 1997 | A |
5753923 | Mera et al. | May 1998 | A |
5844845 | Tahara | Dec 1998 | A |
5869872 | Asai et al. | Feb 1999 | A |
5889293 | Rutten et al. | Mar 1999 | A |
6043536 | Numata et al. | Mar 2000 | A |
6063686 | Masuda et al. | May 2000 | A |
6072217 | Burr | Jun 2000 | A |
6108264 | Takahashi et al. | Aug 2000 | A |
6141269 | Shiomi et al. | Oct 2000 | A |
6300218 | Cohen et al. | Oct 2001 | B1 |
6372600 | Desko et al. | Apr 2002 | B1 |
6476462 | Shimizu et al. | Nov 2002 | B2 |
6498057 | Christensen et al. | Dec 2002 | B1 |
6611023 | En et al. | Aug 2003 | B1 |
6825524 | Ikehashi et al. | Nov 2004 | B1 |
7020024 | Sim | Mar 2006 | B2 |
7109532 | Lee et al. | Sep 2006 | B1 |
7112997 | Liang et al. | Sep 2006 | B1 |
7447104 | Leung | Nov 2008 | B2 |
7449922 | Ricavy | Nov 2008 | B1 |
20010038299 | Afghahi et al. | Nov 2001 | A1 |
20010047506 | Houston | Nov 2001 | A1 |
20020105277 | Tomita et al. | Aug 2002 | A1 |
20020114191 | Iwata et al. | Aug 2002 | A1 |
20020185684 | Campbell et al. | Dec 2002 | A1 |
20030001658 | Matsumoto | Jan 2003 | A1 |
20040108532 | Forbes | Jun 2004 | A1 |
20040146701 | Taguchi | Jul 2004 | A1 |
20040197970 | Komatsu | Oct 2004 | A1 |
20050077566 | Zheng et al. | Apr 2005 | A1 |
20050110078 | Shino | May 2005 | A1 |
20050255666 | Yang | Nov 2005 | A1 |
20050276094 | Yamaoka et al. | Dec 2005 | A1 |
20060013028 | Sarin et al. | Jan 2006 | A1 |
20060013042 | Forbes et al. | Jan 2006 | A1 |
20060035450 | Frank et al. | Feb 2006 | A1 |
20060220085 | Huo et al. | Oct 2006 | A1 |
20060226463 | Forbes | Oct 2006 | A1 |
20060267064 | Rosner et al. | Nov 2006 | A1 |
20060291321 | Leung | Dec 2006 | A1 |
20070029596 | Hazama | Feb 2007 | A1 |
20070029620 | Nowak | Feb 2007 | A1 |
20070063284 | Kawahara et al. | Mar 2007 | A1 |
20070075366 | Hamamoto | Apr 2007 | A1 |
20070076467 | Yamaoka et al. | Apr 2007 | A1 |
20070109906 | Leung | May 2007 | A1 |
20070139072 | Yamaoka et al. | Jun 2007 | A1 |
20070152736 | Itoh et al. | Jul 2007 | A1 |
20070158583 | Cho | Jul 2007 | A1 |
20070171748 | Mukhopadhyay et al. | Jul 2007 | A1 |
20070241388 | Yamamoto et al. | Oct 2007 | A1 |
20070298549 | Jurczak et al. | Dec 2007 | A1 |
20080042187 | Hwang | Feb 2008 | A1 |
20080111199 | Kim et al. | May 2008 | A1 |
20080116939 | Takizawa | May 2008 | A1 |
20080144365 | Yamaoka et al. | Jun 2008 | A1 |
20080173916 | Nishihara | Jul 2008 | A1 |
20080203403 | Kawahara et al. | Aug 2008 | A1 |
20080251848 | Borot et al. | Oct 2008 | A1 |
20080253159 | Kajigaya | Oct 2008 | A1 |
20090003105 | Itoh et al. | Jan 2009 | A1 |
20090010056 | Kuo et al. | Jan 2009 | A1 |
20090086535 | Ferrant et al. | Apr 2009 | A1 |
20090096011 | Hong et al. | Apr 2009 | A1 |
20090096036 | Ishigaki et al. | Apr 2009 | A1 |
20090101940 | Barrows et al. | Apr 2009 | A1 |
20090111223 | Wiatr et al. | Apr 2009 | A1 |
20090121269 | Caillat et al. | May 2009 | A1 |
20090310431 | Saito | Dec 2009 | A1 |
20100032761 | Ding et al. | Feb 2010 | A1 |
20100035390 | Ding et al. | Feb 2010 | A1 |
20100079169 | Kim et al. | Apr 2010 | A1 |
20100117684 | Kim et al. | May 2010 | A1 |
Number | Date | Country |
---|---|---|
1 081 748 | Mar 2001 | EP |
1 095 407 | May 2001 | EP |
1 199 745 | Apr 2002 | EP |
1 233 454 | Aug 2002 | EP |
1 357 603 | Oct 2003 | EP |
1 744 364 | Jan 2007 | EP |
2 925 223 | Jun 2009 | FR |
4-345064 | Dec 1992 | JP |
8-255846 | Oct 1996 | JP |
9-232446 | Sep 1997 | JP |
10-125064 | May 1998 | JP |
2000-196089 | Jul 2000 | JP |
2003-152192 | May 2003 | JP |
2004-303499 | Oct 2004 | JP |
2006-165808 | Jun 2006 | JP |
WO 9966559 | Dec 1999 | WO |
WO 2007060145 | May 2007 | WO |
WO 2008134688 | Nov 2008 | WO |
WO 2009013422 | Jan 2009 | WO |
WO 2009028065 | Mar 2009 | WO |
WO 2009077538 | Jun 2009 | WO |
WO 2009085865 | Jul 2009 | WO |
WO 2009104060 | Aug 2009 | WO |
WO 2010007478 | Jan 2010 | WO |
Entry |
---|
Barth et al., “A 500MHz Random Cycle 1.5ns-Latency, SOI Embedded DRAM Macro Featuring a 3T Micro Sense Amplifier,” IEEE International Solid-State Circuits Conference, 2007. ISSCC 2007. Digest of Technical Papers, pp. 486, 487 and 617 (Feb. 15, 2007). |
Barth et al., “A 45nm SOI Embedded DRAM Macro for POWER7™ 32MB On-Chip L3 Cache,”ISSCC 2010/Session 19/High-Performance Embedded Memory/19.1, IEEE International Solid-State Circuits Conference, Digest of Technical Papers, pp. 342-344 (Feb. 10, 2010). |
Beckett, “Performance Characteristics of a Nanoscale Double-gate Reconfigurable Array,” Smart Structures, Devices, and Systems IV, Proceedings of SPIE, 7268:72680E-1-72680E-12 (Dec. 2008). |
Cheng et al., “Extremely Thin SOI (ETSOI) CMOS with Record Low Variability for Low Power System-on-Chip Applictions,” IEEE International Electron Devices Meeting pp. 3.2.1-3.2.4 (Dec. 2009). |
Choi et al., “Improved current drivability with back-gate bias for elevated source and drain structured FD-SOI SiGe MOSFET,” Microelectronic Engineering, 86(11): 2165-2169 (Nov. 2009). |
Hassoune et al., “Double-gate MOSFET based reconfigurable cells,” Electronics Letters, 43(23):1273-1274 (Nov. 2007). |
Ioannou et al., “Opposite-Channel-Based Injection of Hot-Carriers in SOI MOSFET's: Physics and Applications,” IEEE Transactions on Electron Devices, 45(5):1147-1154 (May 1998). |
Itoh et al., “Impact of FD-SOI on Deep-Sub-100-nm CMOS LSIs—A View of Memory Designers,” IEEE International SOI Conference, 2 pages (Oct. 2006). |
Klim et al., “A 1 MB Cache Subsystem Prototype With 1.8 ns. Embedded DRAMs in 45 nm SOI CMOS,” IEEE Journal of Solid-State Circuits, 44(4):1216-1226 (Apr. 2009). |
Kuhn, “Variation in 45nm and Implications for 32nm and Beyond,” Intel, 2009 2nd International CMOS Variability Conference—London, pp. 1-86. |
Mizukami et al., “Depletion-type Cell-Transistor of 23 nm Cell Size on Partial SOI Substrate for NAND Flash Memory,” Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials, Sendai, Miyagi, Japan, pp. 865-866 (Oct. 2009). |
Matsumiya et al., “A 15-ns 16-Mb CMOS SRAM With Interdigitated Bit-Line Architecture,” IEEE Journal of Solid-State Circuits, 27(11):1497-1503 (Nov. 1992). |
Mukhopadhyay et al., “A Novel High-Performance and Robust Sense Amplifier Using Independent Gate Control in Sub-50-nm Double-Gate MOSFET,” IEEE Transactions on Very Large Scale Integration (VLSI) Systems, 14(2):183-192 (Feb. 2006). |
Mukhopadhyay et al., “Design of High Performance Sense Amplifier Using Independent Gate Control in Sub-50nm Double-Gate MOSFET,” Sixth International Symposium on Quality Electronic Design (ISQED 2005), pp. 490-495 (Mar. 2005). |
Nasalski et al., “An Innovative sub-32nm SRAM Voltage Sense Amplifier in Double-Gate CMOD Insensitive to Process Variations and Transistor Mismatch,” 15th IEEE International Conference on Electronics, Circuits and Systems, pp. 554-557, (Aug.-Sep. 2008). |
Nasalski et al., “SRAM Voltage and Current Sense Amplifiers in sub-32nm Double-Gate CMOS Insensitive to Process Variations and Transistor Mismatch,” IEEE International Circuits and Systems, pp. 3170-3173 (May 2009). |
Ohtou et al., “Threshold-Voltage Control of AC Performance Degradation-Free FD SOI MOSFET With Extremely Thin BOX Using Variable Body-Factor Scheme,” IEEE Transactions on Electron Devices, 54(2):301-307 (Feb. 2007). |
Roy et al., “Double-Gate SOI Devices for Low-Power and High-Performance Applications,” Proceedings of the 2005 IEEE/ACM International Conference on Computer-Aided Design, pp. 217-224 (Nov. 2005). |
Tsuchiya et al., “Silicon on Thin BOX: A New Paradigm of the CMOSFET for Low-Power and High-Performance Application Featuring Wide-Range Back-Bias Control,” IEDM Technical Digest. IEEE International Electron Devices Meeting, pp. 631-634 (Dec. 2004). |
Tsuchiya et al., “Controllable Inverter Delay and Suppressing Vth Fluctuation Technology in Silicon on Thin BOX Featuring Dual Back-Gate Bias Architecture,” IEEE International Electron Devices Meeting, pp. 475-478 (Dec. 2007). |
Wilhelmus A. M. Van Noije, et al., “Advanced CMOS Gate Array Architecture Combining “Gate Isolation,” and Programmable Routing Channels,” IEEE Journal of Solid-State Circuits, 20(2):469-480 (Apr. 1985). |
Yamaoka, et al., “SRAM Circuit With Expanded Operating Margin and Reduced Stand-By Leakage Current Using Thin-Box FD-SOI Transistors,” IEEE Journal of Solid-State Circuits, 41(11):2366-2372 (Nov. 2006). |
Yamaoka et al., “Dynamic-Vt, Dual-Power-Supply SRAM Cell using D2G-SOI for Low-Power SoC Application,” IEEE International SOI Conference, pp. 109-111 (Oct. 2004). |
Ulicki et al., “De-Myth-tifying the SOI Floating Body Effect,” SOI Industry Consortium, pp. 2-7 (Sep. 2009). |
European Search Report , Application No. EP 10290217 dated Sep. 15, 2010. |
European Search Report, Application No. EP 10290181.6 dated Jan. 6, 2011. |
European Search Report, Application No. EP 09290838.3 dated Feb. 16, 2010. |
U.S. Appl. No. 12/789,100, filed May 27, 2010. |
U.S. Appl. No. 12/793,515, filed Jun. 3, 2010. |
U.S. Appl. No. 12/880,806, filed Sep. 13, 2010. |
U.S. Appl. No. 12/886,421, filed Sep. 20, 2010. |
U.S. Appl. No. 12/898,230, filed Oct. 5, 2010. |
U.S. Appl. No. 12/942,754, filed Nov. 9, 2010. |
U.S. Appl. No. 12/946,135, filed Nov. 15, 2010. |
U.S. Appl. No. 12/961,293, filed Dec. 6, 2010. |
U.S. Appl. No. 12/974,822, filed Dec. 21, 2010. |
U.S. Appl. No. 12/974,916, filed Dec. 21, 2010. |
U.S. Appl. No. 12/984,466, filed Jan. 4, 2011. |
U.S. Appl. No. 13/007,483, filed Jan. 14, 2011. |
U.S. Appl. No. 13/013,580, filed Jan. 25, 2011. |
U.S. Appl. No. 13/039,167, filed Mar. 2, 2011. |
Number | Date | Country | |
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20120250444 A1 | Oct 2012 | US |
Number | Date | Country | |
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Parent | 12793553 | Jun 2010 | US |
Child | 13495632 | US |