Claims
- 1. A process for the production of a pyrazole compound, the process comprising reacting a compound of the formula (II) ##STR268## wherein R.sup.1 is a C.sub.1 -C.sub.6 alkyl group, each of R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is independently hydrogen or a C.sub.1 -C.sub.4 alkyl group,
- X.sup.1 is a C.sub.1 -C.sub.4 alkyl group or a halogen atom,
- n is an integer of 1 to 3, and
- p.sup.1 is an integer of 0 to 2, with a compound of the formula (III) ##STR269## wherein R.sup.6 is a C.sub.1 -C.sub.4 alkyl group, and R.sup.7 is hydrogen or a C.sub.1 -C.sub.4 alkyl group, to form a pyrazole compound of the formula (Ia), ##STR270## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, X.sup.1, n and p.sup.1 are as defined above,
- and optionally reacting the pyrazole compound (Ia) with a sulfonic acid halide of the formula (IV).
- Q.sup.2 X.sup.2 (IV)
- wherein Q.sup.2 is --SO.sub.2 --R.sup.8 or ##STR271## in which R.sup.8 is a C.sub.1 -C.sub.6 alkyl group, Y is hydrogen, a C.sub.1 -C.sub.4 alkyl group or a halogen atom, and
- m.sup.1 is an integer of 1 to 3, and
- X.sup.2 is a halogen atom
- to obtain a pyrazole compound of the formula (Ib), ##STR272## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, X.sup.1, n, p.sup.1 Q.sup.2, R.sup.8, Y and m.sup.1 are as defined above.
- 2. A process for the production of a pyrazole compound, the process comprising reacting a compound of the formula (II) ##STR273## wherein R.sup.1 is a C.sub.1 -C.sub.6 alkyl group, each of R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is independently hydrogen or a C.sub.1 -C.sub.4 alkyl group,
- X.sup.1 is a C.sub.1 -C.sub.4 alkyl group or a halogen atom,
- n is an integer of 1 to 3, and
- p.sup.1 is an integer of 0 to 2,
- with a halogenation agent to form a compound of the formula (V) ##STR274## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, X.sup.1, n and p.sup.1 are as defined above and X.sup.3 is a halogen atom,
- then reacting the above compound (V) with a compound of the formula (III) ##STR275## wherein R.sup.6 is a C.sub.1 -C.sub.4 alkyl group, and R.sup.7 is hydrogen or a C.sub.1 -C.sub.4 alkyl group, to form a compound of the formula (VI) ##STR276## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, X.sup.1, n and p.sup.1 are as defined above,
- then heating the compound (VI) to form a pyrazole compound of the general formula (Ia) ##STR277## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, X.sup.1, n and p.sup.1 are as defined above,
- and optionally reacting the pyrazole compound (Ia) with a sulfonic acid halide of the formula (IV)
- Q.sup.2 X.sup.2 (IV)
- wherein Q.sup.2 is --SO.sub.2 --R.sup.8 or ##STR278## in which R.sup.8 is a C.sub.1 -C.sub.6 alkyl group, Y is hydrogen, a C.sub.1 -C.sub.4 alkyl group or a halogen atom, and
- m.sup.1 is an integer of 1 to 3, and
- X.sup.2 is a halogen atom, to obtain a pyrazole compound of the formula (Ib) ##STR279## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, X.sup.1, n, p.sup.1, Q.sup.2, R.sup.8, Y and m.sup.1 are as defined above.
- 3. A process for the production of a pyrazole compound of the general formula (Ic) ##STR280## wherein R.sup.1 is a C.sub.1 -C.sub.6 alkyl group, each of R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is independently hydrogen or a C.sub.1 -C.sub.4 alkyl group,
- R.sup.6 is a C.sub.1 -C.sub.4 alkyl group,
- R.sup.7 is hydrogen or a C.sub.1 -C.sub.4 alkyl group,
- X.sup.1 is a C.sub.1 -C.sub.4 alkyl group or a halogen atom,
- n is an integer of 1 to 3,
- p.sup.2 is 1 or 2, and
- Q.sup.1 is hydrogen, --SO.sub.2 -R.sup.8 or ##STR281## in which R.sup.8 is a C.sub.1 -C.sub.6 alkyl group, Y is hydrogen, a C.sub.1 -C.sub.4 alkyl group or a halogen atom, and
- m.sup.1 is an integer of 1 to 3,
- the process comprising oxidizing a pyrazole compound of the formula (Id) ##STR282## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, X.sup.1, n, Q.sup.1, R.sup.8, Y and m.sup.1 are as defined above.
- 4. The process of claim 1, wherein a molar ratio of the compound of formula (II) to the compound of formula (III) is 1:1 to 1:3.
- 5. The process of claim 4, wherein the reacting of the compound of the formula (II) and the compound (III) takes place in the presence of:
- (i) 1.0 to 1.5 moles of N,N'-dicyclohexylcarbodiimide per mole of the compound of the formula (II),
- (ii) 0.5 to 2.0 moles of a base per mole of the compound of the formula (II) and the compound of the formula (III), wherein the base is selected from the group consisting of potassium carbonate and sodium carbonate, and
- (iii) an inert solvent selected from the group consisting of tert-butyl alcohol, tert-amyl alcohol and i-propyl alcohol,
- and is carried out at a temperature of 50.degree. to 100.degree. C.
- 6. The process of claim 5, wherein a molar ratio of the compound of the formula (Ia) to the compound of the formula (IV) is 1:1 to 1:10.
- 7. The process of claim 6, wherein the reacting of the compound of the formula (Ia) and the compound of the formula (IV) takes place in the presence of:
- (i) an inert solvent selected from the group consisting of diethyl ether, tetrahydrofuran, dichloromethane and chloroform and
- (ii) a phase transfer catalyst selected from the group consisting of crown ether and benzyltriethylammonium chloride.
- 8. The process of claim 2, wherein the halogenating agent is selected from the group consisting of thionyl chloride and phosphorus oxychloride, and the halogenating agent being in an amount greater than an equimolar amount of the compound of the formula (II).
- 9. The process of claim 8, wherein a molar ratio of the compound of the formula (V) to the compound of the formula (III) is 1:1 to 1:3.
- 10. The process of claim 9, wherein the reacting of the compound of the formula (V) with the compound of the formula (III) is in the presence of:
- (i) a solvent selected from the group consisting of dioxane, acetonitrile, benzene, toluene, chloroform, methylene chloride and 1,2-dichloroethane, and
- (ii) a base selected from the group consisting of sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine and pyridine,
- and is carried out at a temperature of 0.degree. to 60.degree. C.
- 11. The process of claim 10, wherein the compound of the formula (VI) is heated at a temperature of 80.degree. to 150.degree. C. in the presence of a base selected from the group consisting of sodium carbonate, potassium carbonate and triethylamine, the base being in an amount of at least equimolar to the amount of the compound of the formula (VI).
- 12. The process of claim 10, wherein a molar ratio of the compound of the formula (Ia) to the compound of the formula (IV) is 1:1 to 1:10.
- 13. The process of claim 10, wherein the reacting of the compound of the formula (Ia) with the compound of the formula (Ib) is carried out in the presence of:
- (i) an inert solvent selected from the group consisting of diethyl ether, tetrahydrofuran, dichloromethane and chloroform,
- (ii) a base selected from the group consisting of sodium carbonate, potassium carbonate, triethylamine and pyridine, and
- (iii) a phase transfer catalyst selected from the group consisting of crown ether and benzyltriethylammonium chloride.
- 14. The process of claim 3, wherein the oxidizing agent is selected from the group consisting of hydrogen peroxide, peracetic acid and sodium metaperiodate.
- 15. The process of claim 14, wherein the oxidizing agent is hydrogen peroxide and the process is carried out in the presence of acetic acid.
- 16. A compound of the formula (II) ##STR283## wherein R.sup.1 is a C.sub.1 -C.sub.6 alkyl group, each of R.sup.2, R.sup.3, R.sup.4 and R.sup.5 is independently hydrogen or a C.sub.1 -C.sub.4 alkyl group,
- X.sup.1 is a C.sub.1 -C.sub.4 alkyl group or a halogen atom,
- n is an integer of 1 to 3, and
- p.sup.1 is an integer of 0 to 2.
- 17. The compound of the formula (II) which is selected from the group consisting of ##STR284##
Priority Claims (1)
Number |
Date |
Country |
Kind |
4-045821 |
Mar 1992 |
JPX |
|
Parent Case Info
This is a division of application Ser. No. 08/290,943 filed Aug. 23, 1994 now U.S. Pat. No. 5,468,722, which is the United States designated application of PCT/JP93/00274 filed Mar. 3, 1993.
US Referenced Citations (5)
Foreign Referenced Citations (3)
Number |
Date |
Country |
49-116071 |
Nov 1974 |
JPX |
2-173 |
Jan 1990 |
JPX |
2-288866 |
Nov 1990 |
JPX |
Divisions (1)
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Number |
Date |
Country |
Parent |
290943 |
Aug 1994 |
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