J. Electrochem. Soc.: Solid State Science, A Water-Amine-Complexing Agent System for Etching Silicon by R. M. Finne et al, Sep. 1967, pp. 965-970. |
J. Electrochem. Soc.: Solid State Science, Substrate Surface Preparation and its Effect on Epitaxial Silicon by P. Rai-Chondhury, Jul. 1971, pp. 1183-1189. |
IBM Technical Disclosure Bulletin, vol. 19, No. 9, Feb. 1977, Controlled Anisotropic Etching of Single Crystal Silicon by E. Bassous, pp. 3623-3624. |
SCP and Solid State Technology, Slip and Bowing Control by Advanced Etching Techniques by Charles Wenzel, Aug. 1967, pp. 40-44. |