The present disclosure relates to the technical field of semiconductors, in particular to a quantum dot material, a quantum dot light-emitting device, a display device and a manufacturing method.
Quantum dots (QDs), as a new light-emitting material, have the advantages of high light color purity, high luminous quantum efficiency, adjustable light-emitting color, and long service life. At present, QDs have become a research hotspot of new LED light-emitting materials. Therefore, quantum dot light emitting diodes (QLEDs) with a quantum dot material as a light-emitting layer have become the main research direction of new display devices at present.
Some embodiments of the present disclosure provide a quantum dot material, including: a quantum dot body, a linker, and a first ligand; wherein one end of the linker is connected with the quantum dot body, and the other end of the linker is connected with the first ligand; and the first ligand includes one or a combination of:
In one possible embodiment, each linker includes a first connection structure, and a second connection structure; one end of the first connection structure is connected with the quantum dot body, and the other end of the first connection structure is connected with one end of the second connection structure; and the other end of the second connection structure is connected with the first ligands.
In one possible embodiment, the first connection structure includes one of:
In one possible embodiment, the second connection structure includes an alkyl chain.
Some embodiments of the present disclosure also provide a quantum dot light-emitting device, including: a substrate, and a quantum dot film layer located at one side of the substrate and having a plurality of pattern portions; wherein each pattern portion includes the quantum dot material provided by above embodiments of the present disclosure.
In one possible embodiment, the first ligands of the pattern portions are crosslinked by different first ligands within the pattern portions when irradiated with light of a first wavelength band, and decrosslinked when irradiated with light of a second wavelength band.
In one possible embodiment, a functional layer is further arranged between the substrate and the quantum dot film layer; one side, facing the quantum dot film layer, of the functional layer is connected with siloxane bodies and second ligands connected with the siloxane bodies; and
In one possible embodiment, the first ligands of the pattern portions are crosslinked with the second ligands in the corresponding region when irradiated with light of a first wavelength band and decrosslinked when irradiated with light of a second wavelength band.
In one possible embodiment, the quantum dot light-emitting device includes at least two types of the pattern portions having different light emission colors, the first ligands of the pattern portions are identical with each other, and the second ligands of the functional layer are identical with each other.
In one possible embodiment, the quantum dot light-emitting device includes at least two types of the pattern portions having different light emission colors, the first ligands of the pattern portions having the same light emission color are identical with each other and the first ligands of the pattern portions having different light emission colors are different from each other.
In one possible embodiment, a first electrode layer is arranged between the substrate and the functional layer, and a second electrode layer is arranged at one side, deviating from the functional layer, of the quantum dot film layer.
Some embodiments of the present disclosure also provide a display device, including the quantum dot light-emitting device provided by above embodiments of the present disclosure.
Some embodiments of the present disclosure provide a manufacturing method for the quantum dot light-emitting device provided by above embodiments of the present disclosure, including:
In one possible embodiment, the forming the quantum dot film having at least one light emission color on one side of the substrate, and irradiating with the light of the first wavelength band to carry out crosslinking in the irradiated region, so as to form the plurality of the pattern portions includes:
In one possible embodiment, before the forming the quantum dot film having at least one light emission color on one side of the substrate, the manufacturing method further includes: forming a functional layer on one side of the substrate, wherein one side, deviating from the substrate, of the functional layer is connected with siloxane bodies and second ligands connected with the siloxane bodies; and
In one possible embodiment, the forming the functional layer on one side of the substrate includes: forming the functional layer on one side of the substrate so that the functional layer and the pattern portions having different light emission colors corresponds to same second ligands;
In one possible embodiment, the forming the functional layer on one side of the substrate includes: forming the functional layer on one side of the substrate so that the functional layer and the pattern portions having different light emission colors corresponds to different second ligands; and
In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, rather than all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without inventive effort fall within the scope of protection of the present disclosure.
Unless otherwise defined, the technical or scientific terms used in the present disclosure should have the general meanings understood by those of ordinary skill in the art to which the present disclosure belongs. “First”, “second” and similar terms used in the present disclosure do not mean any order, quantity or importance, but are only used to distinguish different components. Similar terms such as “including” or “comprising” mean that elements or objects appearing before the term encompass elements or objects listed after the term and equivalents thereof, without excluding other elements or objects. Similar terms such as “connection” or “connected” are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. “Upper”, “lower” “left”, “right” and the like are only used to indicate relative positional relationships, which may change accordingly when the absolute positions of the described objects change.
To keep the following description of the embodiments of the present disclosure clear and concise, the present disclosure omits detailed descriptions of known functions and known components.
In mass production, patterning of QDs mainly adopts an ink-jet printing process, but limited by equipment, its resolution is limited to 200 ppi or below, so a higher-resolution patterning method is required. The traditional patterning methods using a lithography process are divided into a direct method and an indirect method. The indirect method usually needs to use a photoresist to form a pixel groove, and then strip the photoresist after coating with quantum dots. This method generally has photoresist residue, which affects the electrical performance of the device. The direct method is to introduce a photocrosslinking group into quantum dot ligands to crosslink the ligands under certain conditions and change their solubility, so as to leave quantum dots in specific places.
In the process of forming the patterned quantum dot film layer by the indirect method, crosslinking of ligands together typically changes the ligand structure, i.e., the ligand structure is different before and after crosslinking, and the crosslinking system causes some hindrance to the transport of holes and electrons, thereby affecting the electrical performance of the device, while the earlier electrical optimization results are no longer applicable after crosslinking of the quantum dots, resulting in a decrease in the luminous efficiency of the quantum dot film layer.
In view of this, referring to
According to the quantum dot material provided by embodiments of the present disclosure, the first ligands form a reversible photoresponsive crosslinking system, and may be crosslinked when irradiated with the light of the first wavelength band, and decrosslinked when irradiated with the light of the second wavelength band, so that when the patterned quantum dot film layer is formed by the quantum dot material provided by the embodiments of the present disclosure, in the patterning process, crosslinking may be carried out in the irradiated region by irradiating with the light of the first wavelength band, so the quantum dot material is not easily removed during subsequent cleaning, while the quantum dot material in a region where crosslinking is not carried out can be removed during cleaning, thereby realizing patterning of the quantum dot film layer, after patterning, decrosslinking may be carried out in the region where crosslinking is carried out by irradiating with the light of the second wavelength band, thereby realizing the patterning of the quantum dot film layer, and while avoiding the influence of the crosslinked structure on the carrier transport performance, so as to improve the problems in the prior art that carrier transport is hindered, the electrical performance of the device is reduced, and the luminous efficiency is reduced after the quantum dot film layer is patterned.
In one possible embodiment, as shown in
In one possible embodiment, each first connection structure X may include one of:
In some embodiments of the present disclosure, each first connection structure X may include —SH, —COOH, or —NH2, which may enable connection to the quantum dot body QD.
In one possible embodiment, each second connection structure Z may include an alkyl chain. Alternatively, the second connection structure Z may also include other carbon skeletons.
Optionally, for example, when each first ligand Y includes
the crosslinking and decrosslinking of the first ligands Y may be:
Optionally, for example, when each first ligand Y includes
the crosslinking and decrosslinking of the first ligands Y may be:
Optionally for example, when each first ligand Y includes
the crosslinking and decrosslinking of the first ligands Y may be:
Based on the same inventive concept, referring to
In one possible implementation, the plurality of the pattern portions of the quantum dot light-emitting device may be pattern portions with the same light emission color, and the quantum dot light-emitting device is a quantum dot device emitting monochromatic light; the quantum dot light-emitting device may include at least two pattern portions having different light emission colors, for example, as shown in
In some embodiments, the pattern portions 20 may be formed by crosslinking different first ligands of the quantum dot body within the quantum dot film layer itself and then patterning, or by crosslinking first ligands of the quantum dot film layer with second ligands of the functional layer, and then patterning.
Optionally, in one possible embodiment, the first ligands Y of the pattern portions 20 are crosslinked with each other within the pattern portions 20 when irradiated with light of a first wavelength band, and decrosslinked when irradiated with light of a second wavelength band. In some embodiments of the present disclosure, patterning of the quantum dot film layer may be achieved by crosslinking different first ligands within the quantum dot film layer upon irradiation with the light of the first wavelength band.
Optionally, in one possible embodiment, as shown in
Optionally, the functional layer 3 may be a functional layer with —OH groups on the surface before being connected with the siloxane bodies A, for example, the functional layer 3 may be an electron transport layer, the material of the electron transport layer may be nanoparticles or a sputtered film, the material can be ZnO or ZnO doped with various metals (the doped metal can be Mg, Al, Li, Y, Zr, Sn, In, Ga, Cu, etc.), the surface of the electron transport layer can have the —OH groups, and the —OH groups can be bonded with siloxanyl chains (HO—Si—Y′) to which the second ligands Y′ are connected to form the siloxane bodies A; for another example, the functional layer 3 may also be a hole transport layer, the material of the hole transport layer may be inorganic nickel oxide, vanadium oxide, molybdenum oxide, tungsten oxide, graphene oxide and the like, the surface of the hole transport layer may have —OH groups, and the —OH groups may be bonded with siloxanyl chains (HO—Si—Y′) to which the second ligands Y′ are connected to form the siloxane bodies A.
In one possible embodiment, as shown in
In one possible embodiment, as shown in
In one possible embodiment, as shown in
Some embodiments of the present disclosure also provide a display device, including the quantum dot light-emitting device provided by embodiments of the present disclosure.
Based on the same inventive concept, some embodiments of the present disclosure provide a manufacturing method for the quantum dot light-emitting device provided by embodiments of the present disclosure, referring to
In one possible embodiment, patterning of the quantum dot film layer may be achieved by crosslinking between different ligands within the quantum dot film layer. Optionally, with respect to the step S200, forming the quantum dot film having at least one light emission color on one side of the substrate, and irradiating with the light of the first wavelength band to carry out crosslinking in the irradiated region, so as to form the plurality of the pattern portions includes:
In one possible embodiment, patterning of the quantum dot film layer can also be achieved by crosslinking the first ligands of the quantum dot film layer with the second ligands of the functional layer. Optionally, referring to
Correspondingly, with regard to the step S200, forming the quantum dot film having at least one light emission color on one side of the substrate, and irradiating with the light of the first wavelength band to carry out crosslinking in the irradiated region, so as to form the plurality of the pattern portions includes: forming the quantum dot film having at least one light emission color on one side of the substrate, and irradiating with the light of the first wavelength band to crosslink the ligands of the quantum dot film in the irradiated region with the second ligands of the functional layer in the corresponding region to form the plurality of the pattern portions.
In one possible embodiment, when the pattern portions having different light emission colors are formed, each time a quantum dot film having one light emitting color is formed, irradiating with the light of the first wavelength band is performed once to form the pattern portion of this light emission color. Optionally, with regard to the step S400, forming the functional layer on one side of the substrate includes: forming the functional layer having the same second ligands corresponding to the pattern portions having different light emission colors on one side of the substrate.
Correspondingly, with respect to the step S200, forming the quantum dot film having at least one light emission color on one side of the substrate, and irradiating with the light of the first wavelength band to crosslink the first ligands of the quantum dot film in the irradiated region with the second ligands of the functional layer in the corresponding region to form the plurality of the pattern portions includes: during forming the quantum dot film of each light emission color, irradiating with the light of the first wavelength band through shielding of a mask to crosslink the first ligands of the quantum dot film in the irradiated region with the second ligands of the functional layer in the corresponding region, and removing the quantum dot film where crosslinking is not carried out to form the plurality of the pattern portions having one light emission color; and
In one possible embodiment, when the pattern portions having different light emission colors are formed, the quantum dot film layer containing a plurality of light emission colors may be formed at one time, and one-time irradiation with the light of the first wavelength band is performed to form the plurality of the pattern portions having different light emission colors. Optionally, with regard to the step S400, forming the functional layer on one side of the substrate includes: forming the functional layer having different second ligands corresponding to the pattern portions having different light emission colors on one side of the substrate.
Forming the quantum dot film having at least one light emission color on one side of the substrate, and irradiating with the light of the first wavelength band to crosslink the first ligands of the quantum dot film in the irradiated region with the second ligands of the functional layer in the corresponding region to form the plurality of the pattern portions includes:
In order to more clearly understand the manufacturing method for the quantum dot light-emitting device provided by embodiments of the present disclosure, further details are described as follows.
Embodiment 1: as shown in
Embodiment 2, as shown in
Embodiment 3, as shown in
The beneficial effects of embodiments of the present disclosure are as follows: according to the quantum dot material provided by embodiments of the present disclosure, the first ligands form a reversible photoresponsive crosslinking system, and may be crosslinked when irradiated with the light of the first wavelength band, and decrosslinked when irradiated with the light of the second wavelength band, so that when the patterned quantum dot film layer is formed by the quantum dot material provided by embodiments of the present disclosure, in the patterning process, crosslinking may be carried out in the irradiated region by irradiating with the light of the first wavelength band, so the quantum dot material is not easily removed during subsequent cleaning, while the quantum dot material in a region where crosslinking is not carried out can be removed during cleaning, thereby realizing patterning of the quantum dot film layer, after patterning, decrosslinking may be carried out in the region where crosslinking is carried out by irradiating with the light of the second wavelength band, thereby realizing the patterning of the quantum dot film layer, and while avoiding the influence of the crosslinked structure on the carrier transport performance, so as to improve the problems in the prior art that carrier transport is hindered, the electrical performance of the device is reduced, and the luminous efficiency is reduced after the quantum dot film layer is patterned.
Obviously, those skilled in the art can make various changes and modifications to the present disclosure without departing from the spirit and scope of the present disclosure. Thus, if these changes and modifications of the present disclosure fall within the scope of the claims of the present disclosure and its equivalent technology, the present disclosure is also intended to include these changes and modifications.
Number | Date | Country | Kind |
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202110328528.1 | Mar 2021 | CN | national |
This application is based on and claims priority under 35 U.S.C. 119 to Chinese Patent Application No. 202110328528.1, filed on Mar. 26, 2021, in the China National Intellectual Property Administration. The entire disclosure of the above application is incorporated herein by reference.