Claims
- 1. A curable coating composition comprising:
- (A) a siloxane compound having the general formula: ##STR9## wherein R is a monovalent hydrocarbon radical or halohydrocarbon radical having from 1 to 20 carbon atoms, R.sup.1 is selected from the group consisting of monovalent hydrocarbon or halohydrocarbon radicals having from 1 to 8 carbon atoms and a group having its formula selected from the group consisting of (i) --R.sup.2 OCH.dbd.CH.sub.2 and (ii) --R.sup.2 Si(OR.sup.2 OCH.dbd.CH.sub.2).sub.3-c R.sub.c wherein R.sup.2 is a divalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms, c has a value of 0 to 2, R is as defined above, w has a mole percent of from greater than 0 to 100, x has a mole percent of from 0 to less than 100, y has a mole percent of from 0 to less than 100, z has a mole percent of from 0 to less than 100, a is an integer of from 0 to 3, b is an integer of from 0 to 2, the sum of w+x+y+z being equal to 100 mole percent, with the proviso that at least one .tbd.SiOR.sup.2 OCH.dbd.CH.sub.2 group or .tbd.SiOR.sup.2 Si(OR.sup.2 OCH.dbd.CH.sub.2).sub.3-c R.sub.c group exists in each compound; and
- (B) a photoinitiator having its general formula selected from:
- R.sup.i.sub.a ArI.sup.+ ArR.sup.ii.sub.b X.sup.- or
- R.sup.iii.sub.a Ar--I.sup.+ --Ar--R.sup.iv.sub.b --O.sub.3 S--Ar--R.sup.iii.sub.a Y.sup.-
- wherein R.sup.i is selected from monovalent hydrocarbon or halohydrocarbon radicals free of aliphatic unsaturation having from 1 to 40 carbon atoms, halogen atoms, a radical selected from NO.sub.2, CN, COOH, SO.sub.3 H, or alkoxy radicals, hydrocarbon groups substituted with nitro groups, nitrile groups, carboxylic acid groups, sulfonic acid groups, or alkoxy groups, R.sup.ii is selected from monovalent hydrocarbon radicals free of aliphatic unsaturation and having from 1 to 40 carbon atoms, hydrocarbon groups substituted with alkoxy groups, arylalkoxy radicals, aryloxy radicals, or halogen atoms, each R.sup.iii is independently selected from monovalent hydrocarbon or halohydrocarbon radicals free of aliphatic unsaturation and having from 1 to 20 carbon atoms, halogen atoms, a radical selected from NO.sub.2, CN, COOH, SO.sub.3 H, or alkoxy radicals, hydrocarbon groups substituted with nitro groups, nitrile groups, carboxylic acid groups, sulfonic acid groups, or alkoxy groups, R.sup.iv is selected from alkoxy radicals or aryloxy radicals, Ar denotes arene radicals having from 6 to 40 carbon atoms, a has a value of from 0 to 10, b has value of from 0 to 10, X.sup.- is an anion selected from the group consisting of perfluoroalkylsulfonic acid anions, tetrahaloboronic acid anions, tetrakis(perfluoroaryl)boronic acid anions, and tetrakisperfluoroalkylsulfonatoboronic acid anions, and Y.sup.- is an aryl sulfonate anion.
- 2. A composition according to claim 1, wherein R is selected from methyl or phenyl.
- 3. A composition according to claim 1, wherein R.sup.1 is selected from methyl or a group having its formula selected from --R.sup.2 OCH.dbd.CH.sub.2 or --R.sup.2 Si(OR.sup.2 OCH.dbd.CH.sub.2).sub.3 wherein R.sup.2 is selected from methylene, ethylene, propylene, butylene, hexylene, or cyclohexyldimethylene.
- 4. A composition according to claim 1, wherein Ar is selected from phenyl, naphthyl, anthracenyl, phenanthracenyl, pyrenyl, napthacenyl, 9,10-benzophenanthrenyl, chrysenyl, 1,2-benzanthracenyl, 3,4-benzophenanthrenyl, 3,4-benzopyrene, perylenyl, 1,2,3,4-dibenzanthracenyl, 1,2,5,6-dibenzanthracenyl, 1,2,6,7-dibenzoanthracenyl, 1,2,7,8-dibenzanthracenyl, 1,2,6,7-dibenzophenanthracenyl, 1,2,7,8-dibenzophenanthracenyl, pentacenyl, picenyl, coronenyl, 1,2,4,5-dibenzopyrene, hexacenyl, phenylhexadecenyl, or anthracenylhexacenyl.
- 5. A composition according to claim 1, wherein the monovalent hydrocarbon or halohydrocarbon radicals free of aliphatic unsaturation having from 1 to 40 carbon atoms of R.sup.i and R.sup.ii are each selected from methyl, ethyl, propyl, butyl, hexyl, octyl, decyl, cyclohexyl, phenyl, tolyl, xylyl, benzyl, phenylethyl, naphthyl, anthracenyl, phenanthracenyl, pyrenyl, napthacenyl, 9,10-benzophenanthrenyl, chrysenyl, 1,2-benzanthracenyl, 3,4-benzophenanthrenyl, 3,4-benzopyrene, perylenyl, 1,2,3,4-dibenzanthracenyl, 1,2,5,6-dibenzanthracenyl, 1,2,6,7-dibenzoanthracenyl, 1,2,7,8-dibenzanthracenyl, 1,2,6,7-dibenzophenanthracenyl, 1,2,7,8-dibenzophenanthracenyl, pentacenyl, picenyl, coronenyl, 1,2,4,5-dibenzopyrene, hexacenyl, phenylhexadecenyl, or anthracenylhexacenyl.
- 6. A composition according to claim 1, wherein the monovalent hydrocarbon or halohydrocarbon radicals free of aliphatic unsaturation having from 1 to 20 carbon atoms of R.sup.iii are independently selected from methyl, ethyl, propyl, butyl, hexyl, octyl, decyl, cyclohexyl, phenyl, tolyl, xylyl, benzyl, phenylethyl, naphthyl, anthracenyl, phenanthracenyl, pyrenyl, napthacenyl, 9,10-benzophenanthrenyl, chrysenyl, 1,2-benzanthracenyl, 3,4-benzophenanthrenyl, 3,4-benzopyrene, or perylenyl.
- 7. A composition according to claim 1, wherein the halogen atoms are selected from fluorine, chlorine, or bromine.
- 8. A composition according to claim 1, wherein the alkoxy radicals are selected from methoxy, ethoxy, propoxy, or butoxy.
- 9. A composition according to claim 1, wherein the hydrocarbon groups substituted with nitro groups are selected from 3--O.sub.2 N--C.sub.6 H.sub.4 or 4--Cl,3--O.sub.2 N--C.sub.6 H.sub.3.
- 10. A composition according to claim 1, wherein the hydrocarbon groups substituted with nitrile groups are selected from 4--NC--C.sub.6 H.sub.4, 1--NC--C.sub.10 H.sub.7, or 2--NC--C.sub.10 H.sub.7.
- 11. A composition according to claim 1, wherein the hydrocarbon groups substituted with carboxylic acid groups are selected from 4--HOOC--C.sub.6 H.sub.4 or 3--HOOC--C.sub.6 H.sub.4.
- 12. A composition according to claim 1, wherein the hydrocarbon groups substituted with sulfonic acid groups are selected from 4--HO.sub.3 S--C.sub.6 H.sub.4 or 3--HO.sub.3 S--C.sub.6 H.sub.4.
- 13. A composition according to claim 1, wherein the hydrocarbon groups substituted with alkoxy groups are selected from 4--CH.sub.3 O--C.sub.6 H.sub.4, 4--C.sub.2 H.sub.5 O--C.sub.6 H.sub.4, 2--CH.sub.3 O--C.sub.6 H.sub.4, or 2--C.sub.2 H.sub.5 O--C.sub.6 H.sub.4.
- 14. A composition according to claim 1, wherein the arylalkoxy radicals are selected from benzyloxy and phenylethyloxy.
- 15. A composition according to claim 1, wherein the aryloxy radicals are selected from phenoxy or napthoxy.
- 16. A composition according to claim 1, wherein X.sup.- is selected from perfluorobutanesulfonic acid anions, perfluoroethanesulfonic acid anions, perfluoro-octanesulfonic acid anions, trifluoromethanesulfonic acid anions, BF.sub.4.sup.-, BCl.sub.4.sup.-, BBr.sub.4.sup.-, B(C.sub.6 F.sub.5).sub.4.sup.-, B(C.sub.10 F.sub.7).sub.4.sup.-, B(O.sub.3 SCF.sub.3).sub.4.sup.-, B(O.sub.3 SC.sub.2 F.sub.5).sub.4.sup.-, or B(O.sub.3 SC.sub.4 F.sub.9).sub.4.sup.-.
- 17. A composition according to claim 1, wherein X.sup.- is trifluoromethanesulfonate.
- 18. A composition according to claim 1, wherein Y.sup.- is selected from p-toluenesulfonate, 4-methylphenylsulfonate, benzenesulfonate, dodecylbenzenesulfonate, or 3-nitrobenzenesulfonate.
- 19. A composition according to claim 1, wherein x has a value of zero.
- 20. A composition according to claim 19, wherein the composition further comprises an organopolysiloxane having the general formula: ##STR10## wherein R.sup.8 is a monovalent hydrocarbon radical having from 1 to 20 carbon atoms, R.sup.9 is R.sup.8 or is a group having its formula selected from the group consisting of (i) --OR.sup.10 OCH.dbd.CH.sub.2 and (ii) --R.sup.10 Si(OR.sup.10 OCH.dbd.CH.sub.2).sub.3-h R.sup.11.sub.h wherein R.sup.10 is a divalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms, h has a value of 0 to 2, R.sup.11 is a monovalent hydrocarbon radical having from 1 to 20 carbon atoms, f has a value of 0 to 5000, g has a value of 0 to 800, with the proviso that at least one .tbd.SiOR.sup.10 OCH.dbd.CH.sub.2 or .tbd.SiR.sup.10 Si(OR.sup.10 OCH.dbd.CH.sub.2).sub.3-h R.sup.11.sub.h group exists in each compound.
- 21. A composition according to claim 20, wherein R.sup.8 is methyl, R.sup.9 is a group having the formula --R.sup.10 Si(OR.sup.10 OCH.dbd.CH.sub.2).sub.3 wherein each R.sup.10 is independently selected from the group consisting of methylene, ethylene, propylene, butylene, hexylene, and cyclohexyldimethylene.
- 22. A composition according to claim 21, wherein y has a value of zero and R.sup.1 is selected from methyl or a group having the formula --R.sup.2 OCH.dbd.CH.sub.2 wherein R.sup.2 is selected from methylene, ethylene, propylene, butylene, hexylene, or cyclohexyldimethylene.
- 23. A composition according to claim 20, wherein y has a value of zero and R.sup.1 is selected from methyl or a group having the formula --R.sup.2 OCH.dbd.CH.sub.2 wherein R.sup.2 is selected from methylene, ethylene, propylene, butylene, hexylene, or cyclohexyldimethylene.
- 24. A composition according to claim 20, wherein the composition further comprises an organic vinyl ether compound having the general formula:
- (CH.dbd.CHOR.sup.3).sub.d CR.sup.4.sub.4-d
- wherein R.sup.3 is a divalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms, R.sup.4 is a monovalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms or hydrogen, and d has a value of 1 to 3.
- 25. A composition according to claim 1, wherein the composition further comprises an organic vinyl ether compound having the general formula:
- (CH.dbd.CHOR.sup.3).sub.d CR.sup.4.sub.4-d
- wherein R.sup.3 is a divalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms, R.sup.4 is a monovalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms or hydrogen, and d has a value of 1 to 3.
Parent Case Info
This application is a Continuation-In-Part of application Ser. No. 08/063,206, filed May 18, 1993.
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4108747 |
Crivello |
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4617238 |
Crivello et al. |
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Hamada et al. |
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5270423 |
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Number |
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Continuation in Parts (1)
|
Number |
Date |
Country |
Parent |
63206 |
May 1993 |
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