Claims
- 1. A radiation-resistant polypropylene resin composition suitable for the preparation of molded articles in which physical properties scarcely deteriorate during sterilization by radiation, which comprises a propylene homopolymer having a syndiotactic pentad fraction of 0.7 or more, or a copolymer of propylene and an .alpha.-olefin other than propylene having 2 to 25 carbon atoms in which in the absorption spectrum of .sup.13 C-NMR measured in a 1,2,4-trichlorobenzene solution, a peak intensity at about 20.2 ppm on the basis of tetramethylsilane occupies 0.5 or more of the total intensity of peaks attributed to methyl groups of propylene units, and at least one additive selected from the group consisting of a phosphorus-containing antioxidant, an amine-containing antioxidant and a nucleating agent.
- 2. The radiation-resistant polypropylene resin composition according to claim 1 wherein the amount of said antioxidant is in the range of from 0.01 to 1% by weight.
- 3. The resin composition according to claim 2, wherein the phosphorous-containing antioxidant is at least one member selected from the group consisting of trialkyl phosphites wherein the alkyl group is isodecyl or tridecyl, phenyldialkyl phosphites wherein the alkyl group is isodecyl or isooctyl, diphenylalkyl phosphites wherein the alkyl group is isooctyl or isodecyl, triphenyl phosphite, substituted triphenyl phosphites, phosphorous acid (1,1-biphenyl-4,4'-diylbistetrakis (2,4-bis(1,1'-dimethylethyl)phenyl) ester, 3,5-di-tert-butyl-4-hydroxybenzyl phosphate-diethyl ester, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, sodium bis(4-tert-butylphenyl) phosphate, sodium 2,2'-methylene-bis(4,6-di-tert-butylphenyl) phosphate and 1,3-bis(diphenoxyphosphonyloxy)benzene.
- 4. The resin composition according to claim 2, wherein the amine-containing antioxidant is at least one member selected from the group consisting of alkyl-substituted diphenylamines, unsubstituted and N-substituted diallyl-p-phenylenediamines, 6-ethoxy-2,2'4-trimethyl-1,2-dihydroquinoline and 2,2',6 6'-tetraalkylpiperidine.
- 5. The radiation-resistant polypropylene resin composition according to claim 1 wherein the amount of said nucleating agent is in the range of from 0.001 to 1% by weight.
- 6. The resin composition according to claim 5, wherein the nucleating agent is at least one member selected from the group consisting of a metallic salt of benzoic acid, toluic acid or p-tert-butylbenzoic acid, 1,3.2,4-di(benzylidene) sorbitol, 1,3.2,4-di(p-methylbenzylidene) sorbitol, 1,3.2,4-di(p-ethylbenzylidene) sorbitol, sodium bis(4-tertbutylphenyl) phosphate, sodium methylene-bis(2,4-di-tertbutylphenol) phosphate; polyvinylcyclohexane, poly-3-methylbutene, crystalline polystyrene, polytrimethylvinylsilane, 2,3-quinacridone, dihydroxyquinacridone, acetylated quinacridone, talc, kaolin and mica.
- 7. The resin composition according to claim 1, wherein the propylene homopolymer has a syndiotactic pentad fraction of 0.8 or more and contains 10% by weight or less of an n-hexane soluble portion at 20.degree. C., and the propylene copolymer comprises propylene and .alpha.-olefins having the formula CH.sub.2 =CHR wherein R is an alkyl group having 2 to 18 carbon atoms, the content of .alpha.-olefin units in the copolymer being 20% by weight or less.
- 8. The resin composition according to claim 1, wherein the .alpha.-olefin has 4 to 25 carbon atoms.
Priority Claims (2)
Number |
Date |
Country |
Kind |
315141 |
Dec 1989 |
JPX |
|
036178 |
Feb 1990 |
JPX |
|
Parent Case Info
This application is a continuation of application Ser. No. 08/215,251, filed Mar. 21, 1994, now abandoned, which is a divisional of application Ser. No. 08/074,161, filed on Jun. 9, 1993, now U.S. Pat. No. 5,340,848, which is a continuation of application Ser. No. 07/617,154, filed on Nov. 23, 1990, now abandoned.
US Referenced Citations (6)
Foreign Referenced Citations (2)
Number |
Date |
Country |
0068555 |
Jan 1983 |
EPX |
0248545 |
Dec 1987 |
EPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
74161 |
Jun 1993 |
|
Continuations (2)
|
Number |
Date |
Country |
Parent |
215251 |
Mar 1994 |
|
Parent |
617154 |
Nov 1990 |
|