(1) Technical Field
This invention generally relates to electronic signal switching devices, and more specifically to electronic radio frequency signal switching devices.
(2) Background
Electronic signal switches are used in a wide variety of applications. One type of signal switch in common use is a field effect transistor (FET) that is actively controlled through a gate terminal to block or pass an electrical signal connected in series with source and drain terminals of the FET (in another mode of operation, a FET also may be used to modulate an electrical signal in response to a varying signal on the gate terminal).
Field effect transistors may be fabricated in various technologies (e.g., standard bulk silicon, silicon-on-insulator, silicon-on-sapphire, GaN HEMT, GaAs pHEMT, and MESFET processes) and are commonly represented in schematic diagrams as an idealized device. However, in many applications, particularly in radio frequency (RF) circuits, the structure and materials of a FET switch may have significant effects on its own operation (e.g., with respect to bandwidth, isolation, and power handling) and the presence of a FET switch may have significant effects on other components in a circuit. Such effects arise in part because a “CLOSED”/“ON” (low impedance) FET has a non-zero resistance, and an “OPEN”/“OFF” (high impedance) FET behaves as a capacitor due to parasitic capacitances arising from the proximity of various semiconductor structures, particularly within the close confines of an integrated circuit (IC). Large signal behaviors affecting power handling may also arise from other characteristics of a FET, such as avalanche breakdown, current leakage, accumulated charges, etc. Accordingly, the actual in-circuit behavior of a FET must be taken into account when designing FET based circuitry.
One use of FET switches is within RF frequency signal switching devices. For example,
In operation, when terminal port 102A is to be coupled to the common port 104, series switch 106A is set to a low impedance ON state by means of control circuitry (not shown) coupled to the gate of the FET series switch 106A. Concurrently, shunt switch 108A is set to a high impedance OFF state. In this state, signals can pass between terminal port 102A and the common port 104.
For the other terminal port 102B, the series switch 106B is set to a high impedance OFF state to decouple the terminal port 102B from the common port 104, and the corresponding shunt switch 108B is set to a low impedance ON state. One purpose of setting the shunt switch 108B to ON—thus coupling the associated terminal port 102B to circuit ground—is to improve the isolation of the associated terminal port 102B (and coupled circuit elements, such as antennas) through the corresponding series switch 106B. For switching devices with more than two terminal ports, the series switch and shunt switch settings for the “unused” (decoupled) terminal port to common port signal paths typically would be set to similar states.
The simplified equivalent circuit model 130 can be used to evaluate the insertion loss (IL) bandwidth of the circuit model 130. In this example, the 3 dB IL bandwidth is proportional to 1/(Rport*(Coff+Cshunt)) [where Rport is the load resistance at the RF1 and RFC ports], which is typically limited to below 13 GHz in current silicon IC technology.
The bandwidth of conventional radio frequency switching devices of the type shown in
Embodiments of the invention use distributed shunt switches distributed along transmission lines (or may include other inductive impedance compensating components) to improve RF bandwidth with respect to insertion loss, and to improve isolation. In addition, the shunt switches may be physically positioned on both sides of the transmission lines to keep an integrated circuit (IC) design essentially symmetrical so as to provide predictable and reliable operational characteristics. Some embodiments include stacked FET shunt switches and series switches to tolerate high voltages. In some embodiments, the gate resistor for each FET shunt switch is divided into two or more portions to save IC area near the transmission lines, or to optimize a performance parameter, such as power handling, isolation, or low frequency behavior.
The details of one or more embodiments of the invention are set forth in the accompanying drawings and the description below. Other features, objects, and advantages of the invention will be apparent from the description and drawings, and from the claims.
Like reference numbers and designations in the various drawings indicate like elements.
The bandwidth of conventional radio frequency (RF) switching devices of the type shown in
Distributed Shunt Switches
Between the common port 104 and each terminal port 102A, 102b are respective FET series switches 201A, 201B that operate in essentially the same fashion as the corresponding series switches 106A, 106B in
An important aspect of the disclosed embodiments is that inductive tuning components are included to compensate for the OFF state capacitance Cshunt of the shunt switch units 204 described below. One way to provide such inductive tuning components is to use a transmission line that includes at least one series inductive component coupled to at least one shunt capacitive component. In the embodiment illustrated in
In the illustrated embodiment, the conduction (source-drain) channel of each FET shunt switch unit 204 is coupled to circuit ground and between a corresponding pair of inductive tuning components 203, thereby forming an elemental length of a transmission line 206, examples of which are shown bounded by dotted boxes. In some embodiments, an inductive tuning component 203 may be shared between adjacent shunt switch units 204, thus constituting part of two elemental lengths of a transmission line. However, for purposes of circuit analysis, it may be easier to model a shared inductive tuning component 203 as being “split” between adjacent shunt switch units 204.
As more fully explained below, the series switches 201A, 201B and the shunt switch units 204 may be replaced by multiple series-coupled FET switches to tolerate higher voltages than a single FET switch. Such “stacking” of FET switches helps decrease the effective Cshunt while permitting higher power handling.
Additional supplemental inductive tuning components 207 (also labeled La and Lb) may be added at either end or both ends of the transmission lines 202A, 202B to enable fine tuning of parasitics unrelated to the transmission lines 202A, 202B, such as the series switch device parasitic capacitances and pad capacitance for I/O interconnects. The values for the supplemental inductive tuning components 207 (La, Lb) of one transmission line may be the same or different with respect to each other, and with respect to the supplemental inductive tuning components 207 (La, Lb) of other transmissions lines.
In operation, when terminal port 102A is to be coupled to the common port 104, series switch 201A is set to a low impedance ON state by means of control circuitry (not shown) coupled to the gate of the FET series switch 201A. Concurrently, the set of n shunt switch units 204 coupled to transmission line 202A is set to a high impedance OFF state. In this state, signals can pass between terminal port 102A and the common port 104 along transmission line 202A.
For the other terminal port 102B in this example, the series switch 201B is set to a high impedance OFF state to decouple transmission line 202B and the terminal port 102B from the common port 104, and the set of n corresponding shunt switch units 204 coupled to transmission line 202B is set to a low impedance ON state, thus coupling the associated terminal port 102B to circuit ground.
As in
Benefits of the embodiment illustrated in
(1) Tuning out the effect of Coff
For the configuration shown in
Zoff=jω(La+L1)+1/jωCoff+Zoffa [Eq. 1]
where Zoffa comprises the impedance of the OFF path after the first L1 inductive tuning component through load RF2 (as indicated by the dotted “Zoffa” line in
The resonant frequency of the Zoff impedance is
When Zoff is below its resonant frequency (i.e.,
achieved by selection of the values for the inductive tuning components 203 for a particular application, then the loading effect of the Coff capacitance on the ON path (i.e., all of the elements from series switch 201A through load RF1) is appreciably reduced, thus improving the bandwidth of the switching device 200 compared with conventional designs. This characteristic can be used to improve the design trade-off between bandwidth, insertion loss, and isolation for all such switching devices.
(2) Tuning Out the Effect of Cshunt
For the configuration shown in
The cutoff frequency (half power point), fc, is given by the following formula:
Accordingly, the half power point (3 dB) bandwidth of Zon is related to L1, n, and Cshunt, and can be adjusted by adding additional tuning network stages 206 (i.e., increasing n). The corresponding value of L1 is then determined by Eq. 2 to maintain a constant Zon. As deduced from Eq. 2, as n is increased, the corresponding value of L1 is decreased proportional to 1/n. In particular, the higher the number n of tuning networks 206, the higher the cutoff frequency. For example,
Further, working with equations Eq. 2 and Eq. 3, the value of Cshunt can be expressed in terms of the desired Zon, fc, and number of networks n as follows:
Therefore, the maximum Cshunt can be calculated for a set of targeted parameters. As an example, for a Zon of 50 Ohms, a cutoff frequency of 60 GHz, and n=6 for the number of tuning networks 206, results in Cshunt=318 fF, Cshunt/n=53 fF, and L1=66 pH.
(3) Improving Isolation of OFF Paths
For the configuration shown in
Stacked Switch Structures
As mentioned above, each of the shunt switch units 204 and the series switches 201A, 201B may be replaced by multiple series-coupled FET switches. This type of “stacked” architecture allows a circuit to tolerate higher voltages than a single FET switch. For example,
For some embodiments that may not require distributed shunt switches, a lumped design with stacked shunt switches may be used. For example,
The series switches 201A, 201B shown in
Symmetrical Layout
The switching device architecture shown in
For example,
Coupled to the transmission lines 202A, 202B are sets of n shunt switches 604, each of which may be configured as shown in
Importantly, in the configuration shown in
As noted above, in other configurations, more than two terminal ports (a 1×N switch) and more than one common port may be included (an M×N switch). Accordingly, additional transmission lines may be arrayed on an IC layout in a substantially symmetrical manner as needed to accommodate additional ports, with associated sets of shunt switches 604 physically placed on both sides of the added transmission lines.
Gate Resistance Area Reduction
In general, FET switches require a gate resistor to limit the instantaneous current that is drawn when the FET is turned on, to control the switch ON and OFF times, and in general to maintain electromagnetic integrity. In conventional IC FET designs, a gate resistor is physically located in close proximity to the gate of the transistor. However, when implementing a distributed shunt switch of the type shown in
To reduce the total size of the needed gate resistance, in some embodiments a FET gate resistor can be split into two sections. Referring again to
Methods
Another aspect of the invention includes a method for configuring a radio frequency switching device, including the steps of:
STEP 1: providing at least one common port;
STEP 2: providing a plurality of field effect transistor (FET) series switches, each coupled to at least one common port;
STEP 3: providing a plurality of transmission lines, each coupled to a respective one of the plurality of FET series switches, each transmission line including at least one series-coupled inductive tuning component;
STEP 4: providing a plurality of terminal ports, each coupled to a respective one of the plurality of transmission lines; and
STEP 5: providing, for each transmission line, at least one FET shunt switch unit coupled to circuit ground and to such transmission line in a tuning network configuration.
A further aspect of the invention includes a method for configuring a radio frequency switching device, including the steps of:
STEP 1: providing at least one common port;
STEP 2: coupling a plurality of field effect transistor (FET) series switches to at least one common port;
STEP 3: coupling a plurality of transmission lines to a respective one of the plurality of FET series switches, each transmission line including at least one series-coupled inductive tuning component;
STEP 4: coupling a plurality of terminal ports to a respective one of the plurality of transmission lines; and
STEP 5: coupling at least one FET shunt switch unit to circuit ground and to each such transmission line in a tuning network configuration.
The described method can be extended to include physically positioning pairs of the FET shunt switch units on both sides of each of the plurality of transmission lines; arraying the plurality of transmission lines on an integrated circuit layout in a substantially symmetrical manner; configuring at least one FET shunt unit as a series-coupled stack of FET switches; configuring at least one FET series switch as a series-coupled stack of FET switches; coupling at least one primary resistor to a gate of each FET in the FET shunt unit in close proximity to such gate, and providing a plurality of secondary resistors each series coupled to the primary resistors of two or more FETs but located farther away from the gate of each such FET than the primary resistors coupled to each such gate; and fabricating the described circuitry as an integrated circuit.
As should be readily apparent to one of ordinary skill in the art, various embodiments of the invention can be implemented to meet a wide variety of specifications. Thus, selection of suitable component values are a matter of design choice. The switching and passive elements may be implemented in any suitable integrated circuit (IC) technology, including but not limited to MOSFET and IGFET structures. Integrated circuit embodiments may be fabricated using any suitable substrates and processes, including but not limited to standard bulk silicon, silicon-on-insulator (SOI), silicon-on-sapphire (SOS), GaAs pHEMT, and MESFET processes. Voltage levels may be adjusted or voltage polarities reversed depending on a particular specification and/or implementing technology (e.g., NMOS, PMOS, or CMOS). Component voltage, current, and power handling capabilities may be adapted as needed, for example, by adjusting device sizes, “stacking” components to tolerate greater voltages (including as described above), and/or using multiple components in parallel to tolerate greater currents. Additional circuit components may be added to enhance the capabilities of the disclosed circuits and/or to provide additional functional without significantly altering the functionality of the disclosed circuits.
A number of embodiments of the invention have been described. It is to be understood that various modifications may be made without departing from the spirit and scope of the invention. For example, some of the steps described above may be order independent, and thus can be performed in an order different from that described. Various activities described with respect to the methods identified above can be executed in repetitive, serial, or parallel fashion. It is to be understood that the foregoing description is intended to illustrate and not to limit the scope of the invention, which is defined by the scope of the following claims, and that other embodiments are within the scope of the claims.
Number | Name | Date | Kind |
---|---|---|---|
4939485 | Eisenberg | Jul 1990 | A |
4978932 | Gupta et al. | Dec 1990 | A |
5023494 | Tsukii | Jun 1991 | A |
5061911 | Weidman | Oct 1991 | A |
5159297 | Tateno | Oct 1992 | A |
5166640 | Fathimulla | Nov 1992 | A |
5180998 | Willems | Jan 1993 | A |
5202657 | Stopper | Apr 1993 | A |
5412347 | Minnis | May 1995 | A |
5990580 | Weigan | Nov 1999 | A |
6801108 | Wang et al. | Oct 2004 | B2 |
7106146 | Tsukahara et al. | Sep 2006 | B2 |
7167687 | Kemmochi | Jan 2007 | B2 |
7280006 | Hase | Oct 2007 | B2 |
7411471 | Tsukahara | Aug 2008 | B2 |
7424634 | Greeff | Sep 2008 | B2 |
7482892 | Tsai | Jan 2009 | B2 |
7612633 | Hangai et al. | Nov 2009 | B2 |
7675382 | Deng | Mar 2010 | B2 |
7804357 | Shigematsu | Sep 2010 | B2 |
7893791 | Ma | Feb 2011 | B2 |
7944330 | Yamao | May 2011 | B2 |
8103221 | Ta | Jan 2012 | B2 |
8482360 | Chang | Jul 2013 | B2 |
8570025 | Heaney | Oct 2013 | B2 |
8575992 | Tanji et al. | Nov 2013 | B2 |
9048898 | Han | Jun 2015 | B2 |
9197194 | Reedy | Nov 2015 | B2 |
9209800 | Kunishi et al. | Dec 2015 | B2 |
20040070455 | Hong | Apr 2004 | A1 |
20070024389 | Mizutani | Feb 2007 | A1 |
20070030101 | Mizutani | Feb 2007 | A1 |
20100225378 | Nakatsuka | Sep 2010 | A1 |
20160226484 | Lu et al. | Aug 2016 | A1 |
Number | Date | Country |
---|---|---|
0424113 | Apr 1991 | EP |
2016122886 | Aug 2016 | WO |
Entry |
---|
Dubret, Francoise, International Search Report and Written Opinion received from the EPO dated May 3, 2016 for appln. No. PCT/US2016/013278, 10 pgs. |
Hiltunen, THomas J., Office Action received from the USPTO dated May 19, 2016 for U.S. Appl. No. 14/995,023, 15 pgs. |
Lu, et al., Response filed in the USPTO on Aug. 18, 2016 for U.S. Appl. No. 14/995,023, 12 pgs. |
Hiltunen, Thomas J., Final Office Action received from the USPTO dated Nov. 25, 2016 for U.S. Appl. No. 14/995,023, 31 pgs. |
Lu, et al., Response filed in the USPTO dated Jan. 17, 2017 for U.S. Appl. No. 14/995,023, 16 pgs. |
Hiltunen, Thomas J., Notice of Allowance received from the USPTO dated Feb. 14, 2017 for U.S. Appl. No. 14/995,023, 23 pgs. |
Number | Date | Country | |
---|---|---|---|
20160226481 A1 | Aug 2016 | US |