The present application relates to optics, and more specifically, to techniques for forming metasurfaces. A metasurface includes a two-dimensional array of optical antennas or elements used to direct light. A geometric metasurface is a type of metasurface in which the elements thereof are copies of a single antenna at various rotation angles. Metasurfaces may be used for three-dimensional imaging, holographic displays and various other use cases.
Embodiments of the invention provide techniques for forming reconfigurable geometric metasurfaces comprising optically tunable materials.
In one embodiment, an apparatus comprises two or more groups of antennas, each group of antennas comprising two or more patches of optically tunable material providing two or more antennas. The tunable geometric metasurface also comprises a control circuit comprising a plurality of switches providing current sources and a ground voltage. The plurality of switches are coupled to respective ones of the two or more patches of optically tunable material in each of the two or more groups of antennas via first electrodes. The ground voltage is coupled to respective ones of the two or more patches of optically tunable material in each of the two or more groups of antennas via second electrodes. The control circuit is configured to modify states of the two or more antennas in each of the two or more groups of antennas utilizing the first electrodes and the second electrodes to adjust reflectivity of the patches of optically tunable material to provide a tunable geometric metasurface.
In another embodiment, a semiconductor structure comprises a substrate, a patch of optically tunable material disposed over the substrate, a first electrode coupled to the patch of optically tunable material and a switch providing a current source, and a second electrode coupled to the patch of optically tunable material and a ground voltage. The first electrode and the second electrode are configured to modify a state of the patch of optically tunable material to adjust a reflectivity of the patch of optically tunable material.
In another embodiment, a method comprises determining a desired interference effect for a plurality of groups of antennas, each group of antennas comprising two or more patches of optically tunable material providing two or more antennas, the two or more patches of optically tunable material being coupled via first electrodes to switches providing current sources and via a second electrode to a ground voltage. The method also comprises utilizing a control circuit to modify states of the antennas in each of the two or more groups of antennas to provide the desired interference effect. The control circuit comprises a plurality of switches providing current sources and a ground voltage, each of the two or more patches of optically tunable material in each of the plurality of groups of antennas being coupled to the ground voltage via first electrodes and to one of the plurality of switches via second electrodes. The control circuit modifies the states of the antennas in each of the two or more groups of antennas utilizing the first electrodes and the second electrodes to adjust reflectivity of the patches of optically tunable material.
Illustrative embodiments of the invention may be described herein in the context of illustrative methods for forming reconfigurable geometric metasurfaces comprising optically tunable materials. However, it is to be understood that embodiments of the invention are not limited to the illustrative methods, apparatus, systems and devices but instead are more broadly applicable to other suitable methods, apparatus, systems and devices.
Metasurfaces are two-dimensional arrays of microwave, infrared or optical antennas. When light is incident on a metasurface, each antenna provides a unique intentional delay to the light that is incident on it before. Each antenna may also absorb some of the light that is incident on it before radiating it. Thus, when a light beam is reflected or transmitted by a metasurface, it has a two-dimensionally varying phase and/or amplitude imprinted on it by the metasurface. Through optical interference and diffraction, this spatially varying phase and/or amplitude response then allows the metasurface to direct light fields into complex patterns.
Technologically, metasurfaces enable a wide variety of optical elements to be fabricated in a planar, subwavelength-thick chip or circuit. Examples of such optical elements include but are not limited to planar lenses, waveplates, filters, and polarizers. More sophisticated diffractive optical elements and devices, such as computer-generated holograms (CGHs), can also be generated by metasurfaces. For CGHs, a laser or light beam incident on the metasurface can be controllably reflected or transmitted to produce a three-dimensional (3D) image, without the need for specialized 3D glasses. Diffractive optical elements and devices may also be used in 3D imaging applications, solid-state Light Detection and Ranging (LIDAR) applications, etc.
There exists a need for “dynamic” (e.g., tunable or reconfigurable) metasurfaces for these and other applications. In some embodiments, phase-change materials are configured to be electronically switched to change optical properties of antennas in an array of antennas of a metasurface.
Metasurfaces are an evolution of phased arrays of microwave-frequency metal antennas. Increasingly sophisticated micro-fabrication and material technologies enable the miniaturization of these antennas into the infrared and visible domains. Antennas of a metasurface may be metallic or dielectric. Metal antennas can take advantage of plasmonic effects and be especially small (e.g., on the range of 5 to 200 nm), whereas dielectric antennas form photonic cavities that typically have lower loss. One particularly effective technique is to have antennas fabricated on top of a dielectric-mirror stack. An example of an antenna fabricated on top of a dielectric-mirror stack is shown in
In a geometric metasurface, circularly polarized light is incident on the metasurface and the antennas radiate light whose circular polarization is reversed from that of a flat surface. Geometric metasurfaces can be transmissive metasurfaces or reflective metasurfaces. If right-handed circularly polarized (RCP) light is incident on the geometric metasurface, the reflect light from a reflective metasurface would also be RCP, and the transmitted light from a transmissive metasurface would be left-handed circularly polarized (LCP).
Although each antenna in a geometric metasurface reverses the circular polarization of light, if the antennas are fabricated such that the shape of each antenna is identical but the in-plane rotation angle (denoted ϕ) of each antenna is different, then the transmitted or reflected light from neighboring antennas will display an interference effect that causes the light to diffract non-orthogonally to the plane of the metasurface.
This interference effect is based on the geometric phase, otherwise known as the Pancharatnam-Berry phase, of the light radiated by the antennas. The geometric phase of light may be visualized on a Poincaré sphere 175 shown in
Compared to conventional phase metasurfaces, which comprise a 2D array of antennas whose shape is spatially varied across the array, geometric phase metasurfaces in which the shape is held constant while the orientation is varied have several advantages. For example, geometric phase metasurfaces typically have higher diffraction efficiencies (e.g., the fraction of incident light that is diffracted into the desired optical mode) than ordinary metasurfaces. Geometric phase metasurfaces are also immune to design and fabrication errors. The geometric phase, which is set by the geometric rotation angle of the antenna, can be designed with greater precision than conventional phase metasurfaces. Geometric phase metasurfaces can also be readily designed to be broadband (e.g., to work at a broad span of optical wavelengths).
A need exists, however, for a design of dynamically tunable geometric metasurfaces. One of the key challenges facing the production of tunable geometric metasurfaces is that it is typically difficult to change an antenna's orientation. Illustrative embodiments provide dynamically tunable geometric metasurfaces enabling change in the orientation of antennas.
In some embodiments, a structure is provided that functions as a tunable geometric metasurface. The structure is based on a super-array of antennas that comprises several (e.g., two to six) interpenetrating sub-arrays of antennas. Each sub-array is itself an array of antennas with a fixed orientation. Each antenna in the sub-array incorporates a tunable optical material that allows its resonant frequency to be shifted. This tuning can thus allow each antenna to interact more or less strongly with an incident light beam.
A group or sub-array of several antennas of different orientations form what is referred to herein as a “pixel.” If one of the antennas in the pixel is tuned to interact strongly with the incoming light and the other antennas in the pixel are tuned to interact weakly with the incident light, then the strongly interacting antenna will dominate. Thus, by changing which antenna in the pixel strongly interacts with the incoming light, it is possible to effectively “rotate” the dominant antenna. In turn, by rotating the dominant antenna, the geometric phase that the pixel induces on the incident light beam can be varied.
The mirror 104 may be a metal mirror formed of aluminum (Al), silver (Ag), gold (Au), platinum (Pt), titanium nitride (TiN) or another suitable material. The mirror 104 may have a vertical thickness or height (in direction Y-Y′) in the range of 50 nm to 500 nm.
The dielectric layer 106 may be formed of magnesium fluoride (MgF2), silicon dioxide (SiO2), silicon nitride (SiN), titanium oxide (TiO) or another suitable material. The dielectric layer 106 may have a vertical thickness or height (in direction Y-Y′), denoted t in
The antenna includes, in this embodiment, a thin film of phase-change material (PCM) 108 and a dielectric layer 110. The PCM 108 may be formed of a chalcogenide PCM such as germanium antimony telluride (GexSbyTez), germanium telluride (GexTey), antimony telluride (SbxTey), silver antimony telluride (AgxSbyTez), silver indium antimony telluride (AgwInxSbyTez), etc. In some embodiments, Ge2Sb2Te5 is used for the PCM 108. In other embodiments, Ge3Sb2Te2, GeTe, SbTe, or AgInSbTe may be used.
In these chalcogenide PCMs, the chalcogenide can be thermally switched between a crystalline phase and an amorphous phase. For example, a current pulse may be used to Joule-heat an amorphous phase chalcogenide PCM (e.g., GexSbyTez) to a temperature of about 300 degrees Celsius (° C.), which causes the amorphous phase chalcogenide PCM to crystallize. A higher power but slower current pulse may be used to Joule-heat the crystalline phase chalcogenide PCM to a temperature of about 600° C. which causes the crystalline phase chalcogenide PCM to melt-quench into the amorphous phase. In these two different phases, the chalcogenide has different optical properties. Thus, the resonant frequency of the antennas can be switched.
In other embodiments, however, the PCM 108 may be replaced with a different tunable optical material, such as an electrically tunable plasmonic material (e.g., graphene, carbon nanotubes, a metal oxide, a metal nitride such as titanium nitride (TiN), etc.), a metal-insulator transition material (e.g., vanadium dioxide (VO2), etc.), an ion-drive electrochromic material such as tungsten oxide (WO3), etc. While various embodiments are described below in the context of using a PCM as the tunable optical material, it should be appreciated that the PCM may be replaced with these alternatives as desired for a particular implementation. The PCM 108 may have a vertical thickness or height (in direction Y-Y′) in the range of 3 nm to 300 nm.
The dielectric layer 110 may be formed of MgF2, SiO2, SiN, TiO or another suitable material. The dielectric layer 110 may have a vertical thickness or height (in direction Y-Y′) in the range of 3 nm to 300 nm.
The antenna formed from the stack of layers 108 and 110 may have a length (denoted L in
The substrate 202 may be formed of silicon (Si) or another suitable material such as glass, calcium fluoride (CaF2), zinc selenide (ZnSe) or another suitable material. The substrate 202 may have a vertical thickness or height (in direction Y-Y′) in the range of 50 micrometers (m) to 1000 m.
The mirror 204, dielectric layer 206, PCM 208 and dielectric layer 210 may be formed of similar materials and with similar sizing as that described above with respect to mirror 104, dielectric layer 106, PCM 108 and dielectric layer 110, respectively.
The transparent conductor 212 may be formed of indium tin oxide (ITO) or another suitable material such as TiN, an AZO compound, etc. The transparent conductor 212 may have a vertical thickness or height (in direction Y-Y′) in the range of 5 nm to 200 nm.
The electrodes 214-1 and 214-2 (collectively, electrodes 214) may be formed of platinum (Pt) or another suitable refractory material such as TiN, tantalum nitride (TaN), tungsten (W), etc. The electrodes 214 may have a vertical thickness or height (in direction Y-Y′) in the range of 50 nm to 500 nm. Each of the electrodes 214 may have a horizontal thickness or width (in direction X-X′) in the range of 100 nm to 500 nm.
In the pixel shown in
The substrate 302, mirror 304, PCM 308 and electrode 314 may be formed of similar materials and with similar sizing as that described above with respect to the substrate 202, mirror 104, PCM 108 and electrode 214, respectively. The transparent conductors 312-1 and 312-2 (collectively, transparent conductors 312) may be formed of similar materials as that described above with respect to the transparent conductor 212. Each of the transparent conductors 312 may have a vertical thickness or height (in direction Y-Y′) in the range of 5 nm to 200 nm. The insulator layers 310-1 and 310-2 (collectively, insulator layers 310) may be formed of MgF2, SiO2, SiN, TiO or another suitable material.
The substrate 402, PCM 408, insulator layers 410 and transparent conductors 412 may be formed of similar materials and with similar sizing as that described above with respect to substrate 202, PCM 108, insulator layers 310 and transparent conductors 312. The electrodes 414 may be formed of similar materials as those described above with respect to the electrodes 212. Each of the electrodes 414 may have a vertical thickness or height (in direction Y-Y′) in the range of 50 nm to 500 nm.
In the pixel structures shown in
It should be appreciated that the pixels of
It should be appreciated that although
The hexagonal lattice of pixels shown in
The advantage of the
While
In some embodiments, an apparatus comprises two or more groups of antennas, each group of antennas comprising two or more patches of optically tunable material providing two or more antennas. The tunable geometric metasurface also comprises a control circuit comprising a plurality of switches providing current sources and a ground voltage. The plurality of switches are coupled to respective ones of the two or more patches of optically tunable material in each of the two or more groups of antennas via first electrodes. The ground voltage is coupled to respective ones of the two or more patches of optically tunable material in each of the two or more groups of antennas via second electrodes. The control circuit is configured to modify states of the two or more antennas in each of the two or more groups of antennas utilizing the first electrodes and the second electrodes to adjust reflectivity of the patches of optically tunable material to provide a tunable geometric metasurface.
Each of the two or more groups of antennas may comprise three or more patches of optically tunable material providing three or more antennas.
The control circuit may be configured to modify the states of the two or more patches of optically tunable material in each of the two or more groups of antennas such that a single one of the antennas in each of the two or more groups of antennas has higher reflectively than other ones of the antennas in that group of antennas.
The two or more patches of optically tunable material of each of the two or more groups of antennas may have a same orientation over a top surface of a substrate.
The two or more patches of optically tunable material of a first one of the two or more groups of antennas may have a first orientation over a top surface of a substrate and the two or more patches of the optically tunable material of a second one of the two or more groups of antennas may have a second orientation over the top surface of the substrate different than the first orientation.
A given one of the two or more patches of optically tunable material in a given one of the plurality of groups of antennas may comprise chalcogenide phase change material. The control circuit may be configured to modify the state of the given antenna provided by the given patch of optically tunable material by providing a current from the first electrode coupled to the given patch of optically tunable material to the second electrode coupled to the given patch of optically tunable material to heat the chalcogenide phase change material to change a phase of the chalcogenide phase change material from one of crystalline and amorphous to the other one of crystalline and amorphous.
In some embodiments, a semiconductor structure comprises a substrate, a patch of optically tunable material disposed over the substrate, a first electrode coupled to the patch of optically tunable material and a switch providing a current source, and a second electrode coupled to the patch of optically tunable material and a ground voltage. The first electrode and the second electrode are configured to modify a state of the patch of optically tunable material to adjust a reflectivity of the patch of optically tunable material.
The patch of optically tunable material may comprise a chalcogenide phase-change material, and the first electrode and the second electrode may be configured to modify the state of the chalcogenide phase-change material via heating to change the chalcogenide phase-change material between an amorphous and a crystalline phase. The chalcogenide phase-change material may comprise at least one of GexSbyTez, GexTey, SbxTey and AgxSbyTez.
The optically tunable material may comprise an electrically tunable plasmonic material. The electrically tunable plasmonic material may comprise at least one of graphene, carbon nanotubes, a metal oxide and a metal nitride.
The optically tunable material may comprise a metal-insulator transition material. The metal-insulator transition material may comprise VO2.
The semiconductor structure may further comprise a first dielectric layer disposed between the substrate and the patch of optically tunable material, a second dielectric layer disposed over the patch of optically tunable material, and a transparent conductor disposed over the second dielectric layer. The first electrode and the second electrode are disposed over the transparent conductor at opposite ends of the patch of optically tunable material. The semiconductor structure may further comprise a metal mirror disposed between the substrate and the first dielectric layer.
The semiconductor structure may further comprise a first transparent conductor disposed between the substrate and the patch of optically tunable material, a second transparent conductor disposed over the patch of optically tunable material, a first insulator layer disposed over the substrate adjacent a first end of the patch of optically tunable material, and a second insulator layer disposed over the substrate adjacent a second end of the patch of optically tunable material. The first electrode is disposed over the first insulator layer and the second electrode is disposed between the substrate and the second insulator layer. The semiconductor structure may further comprise a metal mirror disposed between the substrate and the first insulator layer, the first transparent conductor and the second insulator layer, the metal mirror providing the second electrode.
The semiconductor structure may further comprise one or more additional patches of optically tunable material and one or more additional electrodes coupled to respective ones of the one or more additional patches of optically tunable material and one or more additional switches providing one or more additional current sources. Each of the one or more additional patches of optically tunable material is coupled to the second electrode providing the ground voltage. The second electrode and the one or more additional electrodes are configured to modify states of the one or more additional patches of optically tunable material to adjust reflectivity of the one or more additional patches of optically tunable material.
In some embodiments, a method comprises determining a desired interference effect for a plurality of groups of antennas, each group of antennas comprising two or more patches of optically tunable material providing two or more antennas, the two or more patches of optically tunable material being coupled via first electrodes to switches providing current sources and via a second electrode to a ground voltage. The method also comprises utilizing a control circuit to modify states of the antennas in each of the two or more groups of antennas to provide the desired interference effect. The control circuit comprises a plurality of switches providing current sources and a ground voltage, each of the two or more patches of optically tunable material in each of the plurality of groups of antennas being coupled to the ground voltage via first electrodes and to one of the plurality of switches via second electrodes. The control circuit modifies the states of the antennas in each of the two or more groups of antennas utilizing the first electrodes and the second electrodes to adjust reflectivity of the patches of optically tunable material.
A given one of the two or more patches of optically tunable material in a given one of the plurality of groups of antennas may comprise chalcogenide phase change material. Utilizing the control circuit to modify the state of the given antenna provided by the given patch of optically tunable material may comprise providing a current from the first electrode coupled to the given patch of optically tunable material to the second electrode coupled to the given patch of optically tunable material to heat the chalcogenide phase change material to change a phase of the chalcogenide phase change material from one of crystalline and amorphous to the other one of crystalline and amorphous.
It should be understood that the various layers, structures, and regions shown in the figures are schematic illustrations that are not drawn to scale. In addition, for ease of explanation, one or more layers, structures, and regions of a type commonly used to form semiconductor devices or structures may not be explicitly shown in a given figure. This does not imply that any layers, structures, and regions not explicitly shown are omitted from the actual semiconductor structures. Furthermore, it is to be understood that the embodiments discussed herein are not limited to the particular materials, features, and processing steps shown and described herein. In particular, with respect to semiconductor processing steps, it is to be emphasized that the descriptions provided herein are not intended to encompass all of the processing steps that may be required to form a functional semiconductor integrated circuit device. Rather, certain processing steps that are commonly used in forming semiconductor devices, such as, for example, wet cleaning and annealing steps, are purposefully not described herein for economy of description.
Moreover, the same or similar reference numbers are used throughout the figures to denote the same or similar features, elements, or structures, and thus, a detailed explanation of the same or similar features, elements, or structures are not repeated for each of the figures. It is to be understood that the terms “about” or “substantially” as used herein with regard to thicknesses, widths, percentages, ranges, etc., are meant to denote being close or approximate to, but not exactly. For example, the term “about” or “substantially” as used herein implies that a small margin of error is present, such as ±5%, preferably less than 2% or 1% or less than the stated amount.
In the description above, various materials and dimensions for different elements are provided. Unless otherwise noted, such materials are given by way of example only and embodiments are not limited solely to the specific examples given. Similarly, unless otherwise noted, all dimensions are given by way of example and embodiments are not limited solely to the specific dimensions or ranges given.
Semiconductor devices and methods for forming the same in accordance with the above-described techniques can be employed in various applications, hardware, and/or electronic systems. Suitable hardware and systems for implementing embodiments of the invention may include, but are not limited to, personal computers, communication networks, electronic commerce systems, portable communications devices (e.g., cell and smart phones), solid-state media storage devices, functional circuitry, etc. Systems and hardware incorporating the semiconductor devices are contemplated embodiments of the invention. Given the teachings provided herein, one of ordinary skill in the art will be able to contemplate other implementations and applications of embodiments of the invention.
In some embodiments, the above-described techniques are used in connection with semiconductor devices that may require or otherwise utilize, for example, complementary metal-oxide-semiconductors (CMOSs), metal-oxide-semiconductor field-effect transistors (MOSFETs), and/or fin field-effect transistors (FinFETs). By way of non-limiting example, the semiconductor devices can include, but are not limited to CMOS, MOSFET, and FinFET devices, and/or semiconductor devices that use CMOS, MOSFET, and/or FinFET technology.
Various structures described above may be implemented in integrated circuits. The resulting integrated circuit chips can be distributed by the fabricator in raw wafer form (that is, as a single wafer that has multiple unpackaged chips), as a bare die, or in a packaged form. In the latter case the chip is mounted in a single chip package (such as a plastic carrier, with leads that are affixed to a motherboard or other higher level carrier) or in a multichip package (such as a ceramic carrier that has either or both surface interconnections or buried interconnections). In any case the chip is then integrated with other chips, discrete circuit elements, and/or other signal processing devices as part of either: (a) an intermediate product, such as a motherboard, or (b) an end product. The end product can be any product that includes integrated circuit chips, ranging from toys and other low-end applications to advanced computer products having a display, a keyboard or other input device, and a central processor.
The descriptions of the various embodiments of the present invention have been presented for purposes of illustration, but are not intended to be exhaustive or limited to the embodiments disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments. The terminology used herein was chosen to best explain the principles of the embodiments, the practical application or technical improvement over technologies found in the marketplace, or to enable others of ordinary skill in the art to understand the embodiments disclosed herein.
Number | Name | Date | Kind |
---|---|---|---|
9923267 | Pala et al. | Mar 2018 | B1 |
20130093641 | Ng | Apr 2013 | A1 |
20140085693 | Mosallaei et al. | Mar 2014 | A1 |
20160013549 | Schaffner et al. | Jan 2016 | A1 |
20160025914 | Brongersma et al. | Jan 2016 | A1 |
20170212285 | Arbabi et al. | Jun 2017 | A1 |
20180351092 | Giessen et al. | Dec 2018 | A1 |
20190018299 | Park | Jan 2019 | A1 |
20190064551 | Gooth et al. | Feb 2019 | A1 |
20190285798 | Akselrod | Sep 2019 | A1 |
Entry |
---|
N. Yu et al., “Light Propagation with Phase Discontinuities: Generalized Laws of Reflection and Refraction,” Science, Oct. 21, 2011, pp. 333-337, vol. 334, No. 6054. |
D.E. Anagnostou et al., “Integration of Resistive Heaters for Phase-Change Reconfigurabie Antennas,” 11th European Conference on Antennas and Propagation (EUCAP), 2017, pp. 2349-2350. |
G. Kaplan et al., “Dynamically Controlled Plasmonic Nano-antenna Phased Array Utilizing Vanadium Dioxide,” Optical Materials Express, Nov. 24, 2015, pp. 2513-2524, vol. 5, No. 11. |
C.H. Chu et al., “Active Dielectric Metasurface Based on Phase-change Medium,” Laser Photonics Rev., 2016, pp. 986-994, vol. 10, No. 6. |
Y.Y. Au et al., “Phase-change Devices for Simultaneous Optical-electrical Applications,” Science Reports, Aug. 29, 2017, pp. 1-7, vol. 7. |
T. Cao et al., “Ultrafast Beam Steering Using Gradient Au—Ge_2Sb_2Te_5 -Au Plasmonic Resonators,” Optics Express, Jul. 13, 2015, p. 18029, vol. 23, No. 14. |
S.Y. Lee et al., Holographic Image Generation with a Thin-film Resonance Caused by Chalcogenide Phase-change Material, Scientific Reports, Jan. 24, 2017, pp. 1-8; vol. 7. |
A. Karvounis et al., “All-dielectric Phase-change Reconfigurable Metasurface,” Applied Physics Letters, 2016, pp. 051103-1-051103-5, vol. 109. |
P. Hosseini et al., “An Optoelectronic Framework Enabled by Low-dimensional Phase-change Films,” Nature, Jul. 10, 2014, pp. 206-211, vol. 511. |
Number | Date | Country | |
---|---|---|---|
20210028547 A1 | Jan 2021 | US |