The present disclosure relates to a recording element board, to a liquid ejection apparatus and also to a method of manufacturing such a recording element board.
A liquid ejection apparatus is known as a type of information output apparatus for recording information in the form of characters, images and the like on recording mediums such as paper sheets and films. Liquid ejection apparatuses operate for information recording by causing the liquid ejected from the liquid ejection head thereof to land on a recording medium.
In recent years, in response to the technological advancement of realizing liquid ejection apparatuses that are capable of producing higher quality images at faster recording speed than ever, there has been a stronger demand for production of highly micronized liquid droplets to be ejected and for densely arranged heat-generating resistor elements, which are components of liquid ejection heads, than ever before.
As the number of heat-generating resistor elements 103 to be arranged in a recording element board that has the above-described configuration is increased, the substrate may inevitably need to be upsized. For the purpose of suppressing such an upsizing tendency, Japanese Patent Application Laid-Open No. 2015-202644 discloses an arrangement of providing each of the heat-generating resistor elements with a plurality of electrodes. With the arrangement disclosed in Japanese Patent Application Laid-Open No. 2015-202644, the heat-generating region forming area of each of the heat-generating resistor elements can be made variable such that the corresponding ejection orifice can eject a variable amount of liquid. Additionally, heat-generating resistor elements of different types are put together to reduce the total number of heat-generating resistor elements so as to prevent the recording element board from being upsized.
A recording element board according to the present disclosure has a plurality of heat-generating resistor elements arranged in a row, each of the plurality of heat-generating resistor elements comprising a heat-generating resistor layer to be electrically powered for generating heat to energize liquid contained in a pressure chamber to be arranged beside the heat-generating resistor layer in order to cause the pressure chamber to eject the liquid therefrom; at least a pair of first electrodes formed as vias connected to a surface of the heat-generating resistor layer at a side opposite to the pressure chamber, the pair of first electrodes feeding electrical power to a first part of the heat-generating resistor layer to form a first heat-generating region between the pair of first electrodes; and at least a pair of second electrodes connected to the surface of the heat-generating resistor layer at a side facing the pressure chamber, the pair of second electrodes feeding electrical power to a second part of the heat-generating resistor layer to form a second heat-generating region between the pair of second electrodes, the surfaces of the pair of second electrodes located at the side facing the pressure chamber being inclined so as to gradually reduce the thickness thereof toward respective ends thereof.
Further features of the present disclosure will become apparent from the following description of exemplary embodiments with reference to the attached drawings.
Thus, the heat-generating regions forming domains are defined in the above-described manner in the liquid ejection apparatus that is designed on the basis of the disclosure of Japanese Patent Application Laid-Open No. 2015-202644. When a plurality of heat-generating resistor elements 103c are to be highly densely arranged, for instance at a density of 1,200 dpi, a clear space needs to be provided between two adjacently located heat-generating resistor elements 103c, between each of the heat-generating resistor elements 103c and the related wiring layers 110 and also between each of the heat-generating resistor elements 103c and the related wiring layers 111. Then, for this reason, if a plurality of wiring layers 110, 111 is to be laid out on a single plane, the laying out operation is inevitably subject to spatial restrictions.
In other words, when a plurality of heat-generating resistor elements 103c is to be highly densely arranged in such a liquid ejection apparatus, a plurality of electrodes (more specifically a plurality of vias 140a and a plurality of vias 140b) need to be connected to wiring layers 110 and wiring layers 111 that are arranged on respective planes of different heights. In other words, to realize a liquid ejection apparatus having the above-described configuration, a planarization process is required in order to form a plurality of vias 140a that are to be connected to the wiring layers 111 and also to form a plurality of vias 140b that are to be connected to the wiring layers 110. Then, the planarization process inevitably pushes up the manufacturing cost accordingly.
In view of the above-described circumstances, therefore, the present disclosure provides a recording element board that can be manufactured at low cost even when heat-generating resistor elements are to be highly densely arranged in it.
[First Embodiment]
Now, the first embodiment of recording element board according to the present invention will be described by referring to the related drawings. Firstly, the configuration of a recording element board 400 of this embodiment will be described.
In this embodiment, a plurality of (1,024) heat-generating resistor elements 103 is linearly arranged at one of the opposite sides of a long and continuous liquid supply path 102 as viewed in the transverse direction typically at a pitch of 21.0 μm or 21.5 μm so as to realize a resolution of 1,200 dpi. The heat-generating resistor elements 103 are arranged such that the electrodes of each of the heat-generating resistor elements 103 are connected to a heat-generating resistor layer 122 in a manner as described below. As power is supplied by way of the electrodes, the heat-generating resistor layer 122 becomes heated and liquid is ejected by the generated heat.
Each of the heat-generating resistor elements 103 has a width of 10 μm and a length of 30 μm in plan view. A pair of electrode regions 130, which will be described in greater detail hereinafter, is disposed at positions located outside relative to oppositely disposed ends of the heat-generating resistor element 103. The electrode regions 130 are respectively connected to wiring layers 110. The wiring layer 110 that is arranged at the side of drive circuits 104 extends toward the drive circuits 104 with a width that is equal to the width of the heat-generating resistor element 103. On the other hand, the wiring layer 110 that is arranged at the side opposite to the drive circuits 104 extends once to the front of the liquid supply path 102 and then folds back to the side of the drive circuits 104 typically with a width of 4.0 μm (see
A pair of electrode regions 131a is arranged in the domain (at the inside of oppositely disposed ends) of each of the heat-generating resistor elements 103. The electrode regions 131a are respectively electrically connected to wiring layers 111, which are arranged below the heat-generating resistor layer 122, by way of vias 140 (which typically operates as so many electrodes, although there are many other electrodes in the recording element board). The wiring layers 111 are respectively arranged below the corresponding wiring layers 110 as viewed in the thickness direction so as to make the layout of the wiring layers 111 to be substantially the same as the layout of the wiring layer 110 as viewed in the surface direction of the wiring layers 111. The pair of electrode regions 131a is arranged at positions that are equally separated from the center position of the heat-generating resistor element 103 by 10 μm.
In this embodiment, BPSG (Boron Phospho Silicate Glass) and an interlayer insulation film are formed on a substrate 120 having a thermal oxide layer and drive elements formed thereon by means of CVD (Chemical Vapor Deposition) or the like. The BPSG 121a and the interlayer insulation film 121b are formed by using a silicon compound. The interlayer insulation film 121b is formed typically by using SiO, SiON, SiOC or some other insulating material.
The wiring layers 110 and the heat-generating resistor layer 122 are formed on the substrate 120 so as to produce a pair of electrode regions 130 there, and then a passivation layer 123 and an anti-cavitation layer 124 are formed thereon to cover the wiring layers 110 and the heat-generating resistor layer 122. The pair of electrode regions 131a are formed by the wiring layers 111, the pair of vias 140 and the heat-generating resistor layer 122. The wiring layers 110 and the wiring layers 111 are typically made of an aluminum compound such as Al—Si or Al—Cu.
Each of the wiring layers 110 has a tapered part in terms of thickness. More specifically, the paired wiring layers 110 have parts that are tapered in terms of thickness until they get to the respective ends thereof that face each other. The surfaces of the parts are inclined at the side of the pressure chamber 150. As far as this specification is concerned, these ends are referred to as wiring ends 110a, and the vias 140 are also referred to as the first electrodes, while the wiring ends 110a are also referred to as the second electrodes. The wiring ends 110a are typically formed by etching the wiring layers 110. In plan view of the recording element board 400, the pair of wiring ends 110a is located outside the pair of vias 140. The pair of electrode regions 131a and the pair of electrode regions 130 are electrically connected to the drive circuits 104. The vias 140 are typically made of a metal such as W, Al or Cu.
The wiring layers 111 are formed on the substrate 120 by way of the BPSG 121a. More specifically, the wiring layers 111 are formed by forming an Al—Si film by means of sputtering and then by being subjected to a lithography process or a dry etching process. Thus, the recording element board 400 of this embodiment has the above-described configuration.
Now, the manufacturing process of the recording element board 400 of this embodiment will be described below by referring to the related drawings.
Then, the interlayer insulation film 121b is formed by means of CVD (S110). More specifically, the substrate in which the wiring layers 110 have been buried in the inside of the interlayer insulation film 121b is now prepared by way of S100 and S110. Thereafter, the interlayer insulation film 121b is planarized by means of CMP (chemical mechanical polishing) (S120).
Then, a pattern to be used for the vias 140 is formed on the interlayer insulation film 121b by means of lithography and dry etching. More specifically, through holes that connect the surface of the planarized interlayer insulation film 121b and the surface of the wiring layers 111 are formed (S130).
Subsequently, a TiN film (a material of electrodes) is formed by sputtering and then a W (tungsten) film (another material of electrodes) is formed by CVD. Thereafter, the insides of the through holes are filled by the material of the vias (S140). The excessive W and the excessive TiN, if any, are removed by CMP and the surface of the interlayer insulation layer 121b is planarized. As a result, vias 140 that are filled with W are produced (S150).
Now, the process part that comes after the formation of the vias 140 of the manufacturing process of the recording element board 400 of this embodiment will be described below.
In this process part, the heat-generating resistor layer 122 is formed typically by means of TaSiN on the vias 140 that have been formed by the steps down to S150 (S160) and then a wiring layer 110 is formed thereon by using an Al—Cu film (S170). The wiring layers 110 and the heat-generating resistor layer 122 are collectively subjected to a patterning operation, using lithography and dry etching (S180).
Thereafter, the wiring layer 110 in the region of the heat-generating resistor element 103 is removed by etching the wiring layer 110 that has been formed by using an Al—Cu film to divide the wiring layer 100 into two separate wiring layers 110. At this time, the parts of the wiring layers 110 that are tapered toward the front ends thereof in terms of thickness are also formed (S190). In this embodiment, the tapered parts become so many electrode regions 130.
Subsequently, in this process, the passivation layer 123 that is made of an insulating material, which is a silicon compound such as SiN or SiC, is formed and then the anti-cavitation layer 124 that is typically made of Ta is formed thereon (S200). As the heat-generating resistor element 103 is covered by protection layers including the passivation layer 123 and the anti-cavitation layer 124, the insulation between the heat-generating resistor element 103 and the ink (or some other liquid, not shown) in the recording element board 400 and the anti-cavitation effect at the time of ink ejection are secured. The liquid to be used for the recording element board of this embodiment may not necessarily be ink.
Then, in this process, the flow path forming member 300b and the ejection orifice forming member 300a are laid on the anti-cavitation layer 124. Thereafter, the ejection orifices 301 are produced by boring holes through the ejection orifice forming member 300a. Then, as a result, the pressure chamber 150 that is surrounded by the heat-generating resistor element 103, the flow path forming member 300b and the ejection orifice forming member 300a is produced (S210). Thus, the manufacturing process of this embodiment of recording element board 400 is described above.
Note that, if the recording element board 400 is employed for an ink ejection head, ink is contained in the pressure chamber 150 and then the contained ink is ejected from the ejection orifice 301 as the heat-generating resistor element 103 is heated to apply ejection energy to the ink contained in the inside of the pressure chamber 150.
Now, some of the effects and advantages of this embodiment will be described below by referring to the related drawings. More specifically, some of the effects and advantages of the present disclosure will be described below by comparing this embodiment with the first comparative embodiment shown in
The configuration of the recording element board 400a of the first comparative embodiment is described above. The vias 140a are connected to the wiring layers 111 and the vias 140b are connected to the wiring layers 110, the wiring layers 111 and the wiring layers 110 being formed at the side of the heat-generating resistor layer 122 (at the lower side) that is opposite to the side where the pressure chamber 150 is arranged. In the instance of the first comparative embodiment, particularly when a plurality of heat-generating resistor elements 103c is highly densely arranged to realize a density of 1,200 dpi, for example, the operation of laying out a plurality of wiring layers 110, 111 on a same plane is subject to restrictions as described above. For this reason, a planarization process is required to be executed to form a plurality of vias 140a, 140b that are to be respectively connected to the wiring layers 111, 110 in order to arrange the wiring layers 111, 110 one above the other. Then, the manufacturing cost is raised accordingly.
In the instance of this embodiment, on the other hand, some of the electrodes that are connected to the heat-generating resistor layer 122 are arranged at the side of the pressure chamber 150 of the heat-generating resistor layer 122 (see
Additionally, a liquid ejection apparatus 170 (see
Unlike the recording element board 400a of the first comparative embodiment, some of the electrodes of the recording element board 400 of this embodiment are arranged as part of the wiring layers 110 (as wiring ends 110a) (see
Additionally, the planarization process of the recording element board 400 of this embodiment is reduced from the planarization process of the first comparative embodiment by the operation of planarizing a pair of wiring layers. Thus, manufacturing this embodiment requires less time if compared with manufacturing the first comparative embodiment. Then, as a result, the manufacturing cost of the recording element board 400 of this embodiment can be reduced if compared with the manufacturing cost of the recording element board 400a of the first comparative embodiment.
In the instance of the recording element board 400 of this embodiment, some of the plurality of electrodes that are connected to the heat-generating resistor layer 122 are arranged as part of the wiring layer 110 (wiring ends 110a). Additionally, the wiring ends 100a are tapered in terms of thickness (see
[Second Embodiment]
Now, the second embodiment of recording element board 400b according to the present invention will be described below by referring to the related drawings. In the following description and in
This embodiment differs from the above-described first embodiment in a manner as described below. Namely, this embodiment differs from the first embodiment in that two liquid supply paths 102 are provided in the recording element board 400b of this embodiment as shown in
The electrode region 132a that is added to the center of each of the heat-generating resistor elements 103 is electrically connected to the wiring layer 112. The heat-generating resistor elements 103 of this embodiment can selectively cause either the heat-generating region 103a that is located between the electrode region 132a at the center and the pair of electrode regions 130 or the heat-generating region 103b that is located between the electrode region 132a and the pair of electrode regions 131a (see
The wiring layers 110 that are connected to the wiring ends 110a and the wiring layers 111 that are connected to the electrode regions 131a are mutually short-circuited to produce an equivalent circuit as shown in
Now, some of the effects and advantages of this embodiment will be described below by referring to the related drawings. More specifically, some of the effects and advantages of the present invention will be described below by comparing this embodiment with the second comparative embodiment (not shown). The second comparative embodiment is formed by using a recording element board similar to the recording element board 400a (see
By comparing the recording element board 400b of this Embodiment with the recording-element board of the second comparative embodiment, it will be seen that the member of processes of this embodiment is raised to cover the step of forming the wiring layers 110 and the wiring ends 110a of the wiring layers 110 on the heat-generating resistor layer 122 if compared with the second comparative embodiment. However, on the other hand, the substrate of this embodiment can be downsized (and hence the dimensions of the recording element board of this embodiment can be reduced) if compared with the second comparative embodiment. In instances of arranging a plurality of heat-generating resistor elements 103 in rows, the cost reduction realized by downsizing the substrate has more effect than compensating for the cost increase of adding the etching step of forming the wiring ends 110a of the wiring layers 110. In other words, the cost of manufacturing the recording element board 400b of this embodiment is lower than the cost of manufacturing the recording element board of the second comparative embodiment.
In the instance of the recording element board 400b of this embodiment, the electrode region 132a operates as one of the electrodes for applying a voltage to cause the two different heat-generating regions 103a and 103b to individually generate heat and hence as the common electrode for selectively causing the heat-generating regions to generate heat. Thus, while the heat-generating regions respectively require two drive circuits 104a and 104b in the second comparative embodiment, the heat-generating regions requires only a single drive circuit in this embodiment (see
While the present invention is described above by way of the first and second embodiments, the technological scope of the present invention is by no means limited by the above-described embodiments.
For example, each of the via-related electrode regions is formed by using a plurality of vias 140 in the first and second embodiments. However, an electrode region may alternatively be formed by using a single via whose planar layout is rectangular, more specifically a single via that extends in the direction in which a plurality of vias 140 is linearly arranged. Such a modified arrangement provides effects and advantages similar to those of the above-described embodiments.
While two types of heat-generating region are provided for each of the heat-generating resistor elements 103 (and hence for each of the pressure chambers 150) in each of the above-described first and second embodiments, three or more types of heat-generating region may alternatively be provided. Such an arrangement can be made feasible by simply adding electrodes. Such a modified arrangement also provides effects and advantages similar to those of the above-described embodiments.
Furthermore, two groups of a plurality of heat-generating resistor elements 103 that are linearly arranged are provided so as to sandwich each of the two liquid supply paths in the second embodiment. However, conversely, a single group of a plurality of heat-generating resistor elements 103 may linearly be arranged so as to be sandwiched between two liquid supply paths 102. Again, such a modified arrangement also provides effects and advantages similar to those of the above-described embodiments.
While the present disclosure has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. The scope of the following claims is to be accorded the broadest interpretation so as to encompass all such modifications and equivalent structures and functions.
This application claims the benefit of Japanese Patent Application No. 2018-131489, filed Jul. 11, 2018, which is thereby incorporated by reference herein in its entirety.
Number | Date | Country | Kind |
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2018-131489 | Jul 2018 | JP | national |