Claims
- 1. An aqueous, all temperature hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner consisting essentially of:
- (a) about 1-50% of at least one water soluble or water-miscible organic solvent with a vapor pressure of at least 0.001 mm Hg at 25.degree. C., and mixtures of such solvents;
- (b) about 0.001-10% of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR9## wherein R.sup.1 is C.sub.5-20 alkyl, R.sup.2 and R.sup.3 are both C.sub.1-4 alkyl or --(CH.sub.2).sub.p --OH, although R.sup.2 and R.sup.3 do not have to be equal, and p is 1-6;
- (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5, said buffer selected from the group consisting of monoethanolamine, ammonitan bicarbonate, ammonium carbonate and ammonium hydroxide, in the absence of inorganic builders, such as silicates and phosphates, which leave a residue; and
- (d) the remainder as substantially all water.
- 2. An aqueous hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking in challenging environmental conditions (high and low temperature), said cleaner consisting essentially of:
- (a) about 1-50% of at least one water soluble or water-miscible organic solvent with a vapor pressure of at least 0.001 mm Hg at 25.degree. C., and mixtures of such solvents;
- (b) about 0.001-10% of at least one semi-polar nonionic surfactant, said surfactant having the structure: ##STR10## wherein R.sup.1 is C.sub.5-20 alkyl, R.sup.2 and R.sup.3 are both C.sub.1-4 alkyl, or --(CH.sub.2).sub.p --OH, although R.sup.2 and R.sup.3 do not have to be equal, and p is 1-6;
- (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5, said buffer selected from the group consisting of ammonium carbamate, monoethanolamine, ammonium bicarbonate, ammonium carbonate and ammonium hydroxide, in the absence of inorganic builders, such as silicates and phosphates, which leave a residue; and
- (d) the remainder as substantially all water.
- 3. The hard surface cleaner of claim 1 wherein said solvent is an alkanol which is selected from the group consisting of methanol, ethanol, n-propanol, isopropanol, butanol, pentanol, hexanol, their various positional isomers, and mixtures of the foregoing.
- 4. The hard surface cleaner of claim 1 wherein said solvent is an alkylene glycol ether which is selected from the group consisting of ethylene glycol monobutyl ether, ethylene glycol monopropyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, and mixtures thereof.
- 5. The hard surface cleaner of claim 4 wherein said solvent is ethylene glycol monobutyl ether.
- 6. The hard surface cleaner of claim 4 wherein said solvent is propylene glycol n-butyl ether.
- 7. The hard surface cleaner of claim 4 wherein said solvent is propylene glycol t-butyl ether.
- 8. The hard surface cleaner of claim 1 wherein said buffer is ammonium hydroxide.
- 9. The hard surface cleaner of claim 1 wherein said buffer is monoethanolamine.
- 10. The hard surface cleaner of claim 1 wherein said buffer is ammonium carbonate.
- 11. The hard surface cleaner of claim 1 wherein said buffer is ammonium bicarbonate.
- 12. A method of cleaning soil, without substantial residue remaining, from a hard surface comprising applying the cleaner of claim 1 to said soil and removing said soil and said cleaner.
- 13. The method of claim 12 wherein said applying step further comprises the metered delivery of said cleaner from a trigger sprayer.
- 14. The method of claim 12 wherein said applying step further comprises the metered delivery of said cleaner from a pump sprayer.
RELATED APPLICATIONS
This is a continuation-in-part of application Ser. No. 08/518,384, filed Aug. 23, 1995, now U.S. Pat. No. 6,523,024 itself a continuation-in-part of Ser. No. 134,348, filed Oct. 8, 1993, now U.S. Pat. No. 5,468,423, itself a continuation-in-part of 07/832,275, filed Feb. 7, 1992, now U.S. Pat. No. 5,252,245; and application Ser. No. 08/410,470, filed Mar. 24, 1995, now U.S. Pat. No. 5,585,342.
US Referenced Citations (59)
Foreign Referenced Citations (3)
Number |
Date |
Country |
714521 |
Jul 1965 |
CAX |
288856 |
Nov 1985 |
EPX |
344847 |
Dec 1989 |
EPX |
Continuation in Parts (3)
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Number |
Date |
Country |
Parent |
518384 |
Aug 1995 |
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Parent |
134348 |
Oct 1993 |
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Parent |
832275 |
Feb 1992 |
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