Patent Application
20100224257
The present invention relates to an apparatus and method for reducing foam formation thus reducing oxidation of the developer liquid, inside the plate developing machinery for the printing industry.
During the filling of the developer liquid into the developer tank of a plate developer device, penetrated air often causes foam formation of the developer liquid. The generated foam, due to its large surface area increases the contact of developer liquid with the air in the system, and thus intensifies the chemical oxidation of the developer liquid. The above reaction results in degraded performance of the plate developing process.
The intention of this invention is to prevent, or at least substantially reduce, the foam formation of the developer liquid inside the plate developing machinery for lithographic digital printing plates.
Briefly, according to one aspect of the present invention an apparatus for reducing foam formation in a plate processor device is presented. The apparatus includes pumping means to pump the developer liquid into a developer liquid reservoir, splitting means for splitting the flow of developer liquid into the developer liquid reservoir by filling the developer liquid reservoir through a first reservoir opening and through a second reservoir opening in parallel.
These and other objects, features, and advantages of the present invention will become apparent to those skilled in the art upon a reading of the following detailed description when taken in conjunction with the drawings wherein there is shown and described an illustrative embodiment of the invention.
The present invention describes a developer liquid circulation system in a plate developer system, which reduces substantially the foam formation caused during the filing of the developer liquid into the developer liquid reservoir. The created foam due its inherent large surface area exposed to air contact, increases the oxidation process of the developer liquid.
Main filling pipeline 10 is split into two pipeline sections. The first pipeline section 21 is used to flow the developer liquid into the circulation system 128. The circulation system comprises a developer circulation inlet 14, a circulation pump 123, a filter 124, and a spray bar 15. The developer circulation pump 123 pumps the developer liquid 19 from developer liquid reservoir 17 via developer circulation inlet 14 into the circulation system 128 in order to purify the developer by passing it through filter 124 and back into the developer liquid reservoir 17.
The spray bar 15 is positioned in the developer liquid reservoir 17, and is equipped with plurality of spray bar openings 18, for letting the developer liquid 19 to flow into the developer liquid reservoir 17.
During the filling of developer the pressure is being applied by filling pump 12 on the liquid that flows through the circulation system 128 via first pipeline section 21 to fill the developer liquid reservoir 17 with developer liquid 19. The applied pressure helps to get rid of the trapped air inside the circulation system 128, thus reducing the likelihood of foam formation causing oxidation of the developer liquid by the air.
In parallel to the described liquid flow via the first pipeline section 21, additional developer liquid flows via the second pipeline section 22. This liquid will also fill the developer liquid reservoir 17 with developer liquid 19, through a bottom opening 27 in the developer liquid reservoir 17.
This method reduces the foam formation by causing the flow of developer liquid to enter the developer liquid reservoir 17 through two distinct openings. First opening is through the circulation system 128 via the spray bar openings 18, which are situated inside the developer liquid reservoir 17. The second opening is the bottom opening 27 in developer liquid reservoir 17 additionally using a V shaped developer liquid reservoir 17 coupled with a bottom opening 27 will further minimize foam formation and air contact with the developer liquid.
The usage of two distinct openings to fill developer liquid 19 into developer liquid reservoir 17 will thus, minimize foam formation and the air contact with the developer liquid; hence oxidation of developer liquid is reduced.
The invention has been described in detail with particular reference to certain preferred embodiments thereof, but it will be understood that variations and modifications can be effected within the scope of the invention.
