Claims
- 1. A reflection-type photocathode, comprising:
- a substrate made of nickel;
- a reflection layer of aluminum formed on an upper surface of the substrate; and
- a photosensitive layer formed directly on the reflection layer and formed of antimony activated with at least one kind of alkali metal.
- 2. A reflection-type photocathode according to claim 1, wherein the photosensitive layer is formed by depositing an antimony layer directly on the reflection layer, and activating the antimony layer by introducing at least one kind of alkali metal.
- 3. A reflection-type photocathode according to claim 1, wherein
- the alkali metal includes cesium.
- 4. A reflection-type photo-electric surface according to claim 1, wherein
- the alkali metal includes potassium.
- 5. A reflection-type photocathode according to claim 1, wherein
- the alkali metal includes sodium.
- 6. A reflection-type photocathode according to claim 1, wherein
- the alkali metal includes rubidium.
- 7. A photomultiplier comprising a vacuum vessel accommodating a reflection-type photocathode according to claim 1; photomultiplying means for multiplying photoelectrons emitted from the reflection-type photocathode; and an anode for receiving multiplied photoelectrons.
- 8. A method for fabricating a reflection-type photocathode, comprising:
- the step of depositing a reflection layer of aluminium on the upper surface of a substrate made of nickel; and
- the step of forming a photosensitive layer by depositing an antimony layer directly on the reflection layer and subsequently activating the antimony layer with an alkali metal.
- 9. A method for fabricating a photocathode according to claim 8, wherein
- the photosensitive layer is formed by depositing directly on the reflection layer the antimony layer in a thickness of 15 .mu.g/cm.sup.2 to 45 .mu.g/cm.sup.2, and then activating the antimony layer with the alkali metal.
- 10. A method for fabricating a photocathode according to claim 8, wherein
- the photosensitive layer is formed by activating with the alkali metal the antimony layer deposited directly on the reflection layer, and then annealing the activated antimony layer.
Priority Claims (1)
Number |
Date |
Country |
Kind |
4-102945 |
Apr 1992 |
JPX |
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Parent Case Info
This is a continuation of application Ser. No. 08/046,958, filed on Apr. 16, 1993, which was abandoned upon the filing hereof.
US Referenced Citations (13)
Foreign Referenced Citations (2)
Number |
Date |
Country |
5074406 |
Mar 1993 |
JPX |
0532358 |
Mar 1993 |
JPX |
Continuations (1)
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Number |
Date |
Country |
Parent |
46958 |
Apr 1993 |
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