Information
-
Patent Grant
-
6621539
-
Patent Number
6,621,539
-
Date Filed
Tuesday, April 17, 200123 years ago
-
Date Issued
Tuesday, September 16, 200321 years ago
-
Inventors
-
Original Assignees
-
Examiners
- Niebling; John F.
- Simkovic; Viktor
Agents
- Beyer Weaver & Thomas, LLP
-
CPC
-
US Classifications
Field of Search
US
- 349 106
- 349 107
- 349 108
- 349 109
- 349 110
- 349 111
- 349 113
- 438 70
-
International Classifications
-
Abstract
A method of manufacturing a reflective type LCD includes the steps of forming one color layer on an approximately overall surface of a display region of a substrate, forming a reflective layer on an approximately overall surface of the one color layer, and partly removing the reflective layer and exposing a pattern of the one color layer through the remaining reflective layer, whereby a reflective type LCD having high display quality can be provided.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a reflective type LCD, for example, a STN (super twisted nematic) type LCD, a TFT (thin film transistor) type LCD, and the like, and more specifically, to a reflective type LCD relating a construction of a reflective layer and a color layer thereof and to a method of manufacturing the same.
2. Description of the Related Art
A color filter with a reflective layer is used in a color reflective STN type LCD, and a reflection plate is used in a black and white STN type LCD, respectively.
FIG. 6
is a view explaining a manufacturing process of a conventional color filter with a reflective layer. First, as shown in
FIG. 6A
, after a hill and valley forming resist layer
52
is formed on a glass substrate
51
by coating photosensitive resin thereon and fine hills and valleys are formed on a surface of the resist layer
52
(FIG.
6
B), exposure L is executed to the resist layer
52
with a mask
53
placed thereon (FIG.
6
C), and a hard resin layer
54
is formed by developing and post baking the resist layer
52
(FIG.
6
D).
Next, as shown in
FIG. 6E
, a reflective layer
55
composed of aluminum or the like is formed on the hard resin layer
54
, a black mask resist
56
is coated on the reflective layer
55
(FIG.
6
F), thereafter a black mask
57
having a predetermined pattern is formed on the reflective layer
55
by exposing and developing the black mask resist
56
(FIG.
6
G). A blue filter
58
, a green filter
59
, and a red filter
60
are sequentially formed by the same manner, that is, by repeatedly coating, exposing and developing resists. (FIG.
6
H).
Thereafter, the thus obtained substrate is entirely covered with an overcoat layer
61
(FIG.
6
I), and then a protective layer
62
composed of SiO
2
and a transparent electrode
63
composed of ITO are sequentially formed on the overcoat layer
61
(FIG.
6
J), whereby the color filter with the reflective layer is constructed.
FIG. 7
is a partly enlarged sectional view of the color filter, wherein color filters such as the blue filter
58
, the green filter
59
, the red filter
60
and the like are formed with edges
64
thereof overlapping the black mask
57
in order to prevent leakage of light. The black mask
57
is formed to improve characteristics by improving contrast.
As shown in
FIG. 7
, in the conventional color filter with the reflective layer, since the edges
64
of the color filters overlap the black mask
57
, the edges
64
project upward and have a step Δt
1
of about 1 μm which approximately corresponds to a thickness of the black mask
57
.
While a surface of the color filter with the reflective layer is flattened by coating the overcoat layer
61
, a sufficient surface flattening effect cannot be obtained by the overcoat layer
61
because projections formed by the overlapped edges
64
have an area smaller than that of the portions of only the color filters. Thus, even if the overcoat layer
61
is formed, a step Δt
2
of about 0.5 to 1 μm remains on a surface of the overcoat layer
61
. Thus, there is a drawback that the step adversely affects display quality of a LCD.
Since very strict gap accuracy is required particularly to the STN type LCD, flatness having a higher degree of precision is indispensable to the STN type LCD.
SUMMARY OF THE INVENTION
Accordingly, an object of the present invention is to overcome the above drawbacks of the conventional art and to provide a reflective type LCD having high display quality and a method of manufacturing the same.
To achieve the above object, the present invention is characterized by including a substrate, for example, a glass substrate or the like, one color layer, for example, a black mask or the like formed on an approximately overall surface of a display region of the substrate, and a reflective layer composed of, for example, aluminum or the like and covering the other portion of the color layer excluding a desired pattern portion thereof, wherein the pattern of the one color layer is exposed through the reflective layer.
The above invention is characterized in that the one color layer is a black and white type black mask.
The above invention is characterized in that the one color layer is a color type black mask, a color filter having a blue filter, a green filter, and a red filter is disposed on the reflective layer, and edges of the color filter partly overlap the black mask.
The above invention is characterized in that fine hills and valleys are formed on a surface of the one color layer.
The above invention is characterized in that the LCD is a STN (super twisted nematic) type LCD.
Further, the present invention is characterized by including the steps of forming one color layer, for example, a black mask or the like on an approximately overall surface of a display region of a substrate, for example, a glass substrate or the like, forming a reflective layer composed of, for example, aluminum or the like on an approximately overall surface of the one color layer and partly removing the reflective layer and exposing a pattern of the one color layer through the remaining reflective layer.
The above invention is characterized in that the one color layer is a white and black type black mask.
The above invention is characterized in that the one color layer is a black mask and the invention includes the step of patterning a color filter having a blue filter, a green filter, and a red filter on the remaining reflective layer and partly overlapping edges of the color filter on the black mask.
The above invention is characterized by including the step of forming fine hills and valleys on a surface of the one color layer.
The above invention is characterized in that the LCD is a STN (super twisted nematic type) LCD.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1
is a sectional view of a STN type LCD according to an embodiment of the present invention;
FIG. 2
is an enlarged view of a main portion of a color filer with a reflective layer according to a first embodiment using to the LCD;
FIG. 3
is a view explaining a manufacturing process of the color filter with the reflective layer;
FIG. 4
is a view explaining a manufacturing process of a color filter with a reflective layer according to a second embodiment of the present invention;
FIG. 5
is a view explaining a manufacturing process of a black and white reflection plate according to a third embodiment of the present invention;
FIG. 6
is a view explaining a manufacturing process of a conventional color filter with a reflective layer; and
FIG. 7
is an enlarged sectional view of the conventional color filter with the reflective layer.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Next, embodiments of the present invention will be described with reference to the drawings.
FIG. 1
is a sectional view of a STN type LCD,
FIG. 2
is an enlarged sectional view of a main portion of a color filter according to a first embodiment, and
FIG. 3
is a view explaining a manufacturing process of the color filter.
As shown in
FIG. 1
, the STN type LCD is arranged such that a liquid crystal layer
3
, which is twisted at least 180°, is interposed between a first substrate
1
, which has a color filter with a reflective layer, and a second transparent substrate
2
, spacer particles
4
are disposed in the liquid crystal layer
3
to keep a gap between the substrates
1
and
2
to a predetermined value (for example, 6 μm±0.1 to 0.2 μm), and outer peripheries of the substrates
1
and
2
are hermetically sealed liquid-tightly by a sealing agent
5
.
Next, a manufacturing process of the color filter with the reflective layer used in the LCD will be described with reference to FIG.
3
.
As shown in
FIG. 3A
, a black mask resist layer
7
is formed on a glass substrate
6
by coating photosensitive resin such as acrylic resin or the like containing black pigment thereon in a predetermined thickness, minute hills and valleys
8
are formed on a surface of the resist layer
7
to provide it with a light diffusing property (FIG.
3
B), exposure
10
is executed to the resist layer
7
with a mask
9
placed thereon (FIG.
3
C), and a black mask
11
is formed on an approximately overall surface of a display region of the resist layer
7
by developing and post-baking it (FIG.
3
D).
Next, as shown in
FIG. 3E
, a reflective layer
12
composed of aluminum, silver or the like is formed on an overall surface of the black mask
11
by sputtering, vapor deposition or the like. A blue filter
13
having a predetermined pattern is formed on the reflective layer
12
by coating a blue filter resist composed of photosensitive resin, for example, acrylic resin or the like containing blue pigment on the reflective layer
12
and exposing, developing, and post baking the resist. Then, a green filter
14
and a red filter
15
are sequentially formed by the same manner (FIG.
3
F).
The thus formed color filters
13
to
15
are masked and an exposed portion of the reflective layer
12
is removed by etching so as to expose the black mask
11
thereunder, which permits a pattern of the black mask
11
to appear through the reflective layer
12
and the color filters
13
to
15
(FIG.
3
G).
Subsequently, as shown in
FIG. 3H
, the thus obtained substrate is entirely covered with a transparent overcoat layer
16
composed of acrylic resin or the like, and then a protective layer
17
composed of SiO
2
and a transparent electrode
18
composed of ITO are sequentially formed on the overcoat layer
16
(FIG.
31
), whereby the color filter with the reflective layer is constructed.
FIG. 2
is an enlarged sectional view of the color filter obtained by this manufacturing process, wherein the black mask
11
is formed on the approximately overall display region on the glass substrate
6
, the reflective layer
12
is formed on the other portion of the black mask
11
excluding a desired pattern portion thereof, and the black mask
11
is exposed through the reflective layer
12
. Further, the desired color filters
13
to
15
are formed on the reflective layer
12
, and edges
19
of the color filters
13
to
15
overlap a part of a surface of the black mask
11
across the reflective layer
12
to prevent leakage of light. Since the edges
19
of the color filters
13
to
15
step down to the black mask
11
side, when the overcoat layer
16
is formed, slight recesses
20
are formed thereon at positions corresponding to the stepped-down portions of the edges
19
.
After the color filters
13
to
15
are formed, a stepΔt
3
between them and the black mask
11
is about 0.7 μm which is a sum of a thickness of the reflective layer
12
and a thickness of each of the color filters
13
to
15
. Further, when the overcoat layer
16
is formed and a surface thereof is flattened, a surface stepΔt
4
of the overcoat layer
16
is reduced to about 0.15 μm which corresponds to a depth of each recess
20
because a large flattening effect can be obtained due to the stepped portion having a narrow width.
FIG. 4
is a view explaining a manufacturing process of a color filter with a reflective layer according to a second embodiment of the present invention.
Since steps A to E of
FIG. 4
are similar to those of the manufacturing process of the above first embodiment, description thereof is omitted. As shown in
FIG. 4F
, a reflective layer patterning resist
21
is coated on a reflective layer
12
and exposed and developed at step shown in
FIG. 4G
, and an exposed portion of the reflective layer
12
is removed by etching at step shown in
FIG. 4G
so as to expose a black mask
11
thereunder, whereby a pattern of the black mask
11
appears through the reflective layer
12
. Thereafter, the resist layer on the reflective layer
12
is exfoliated.
Subsequently, as shown in
FIG. 4I
, a blue filter
13
having a predetermined pattern is formed on the reflective layer
12
by coating a blue filter resist composed of photosensitive resin, for example, acrylic resin or the like containing blue pigment on the reflective layer
12
, and by exposing, developing and post-baking the resist. Then, a green filter
14
and a red filter
15
are sequentially formed by the same manner.
Subsequently, as shown in
FIG. 4J
, a thus obtained substrate is entirely covered with an overcoat layer
16
, and then a protective layer
17
composed of SiO
2
and a transparent electrode
18
composed of ITO are sequentially formed on the overcoat layer
16
(FIG.
4
K), whereby the color filter with the reflective layer is constructed.
FIG. 5
is a view explaining a manufacturing process of a black and white reflection plate according to a third embodiment of the present invention.
Since steps of
FIGS. 5A
to
5
H are similar to those of the manufacturing process of the above second embodiment, description thereof is omitted. As shown in
FIG. 5H
, A black mask
11
as an underlayer is exposed by removing an exposed portion of a reflective layer
12
by etching, whereby a pattern of the black mask
11
appears through the reflective layer
12
.
Next, as shown in
FIG. 5I
, a thus obtained substrate is entirely covered with an overcoat layer
16
, and then a protective layer
17
composed of SiO
2
and a transparent electrode
18
composed of ITO are sequentially formed on the overcoat layer
16
(FIG.
5
J), whereby a black/white reflection plate is constructed.
While the STN type LCD has been described in the above embodiments, the present invention also is applicable to other types of LCDs such as a TFT type LCD and the like.
Since the present invention is constructed as described above, a reflective type LCD, which has a reduced step on a surface, improved surface flatness and high display quality, and a manufacturing method of the same can be provided.
Since the present invention is constructed as described above, characteristics of a black and white type LCD can be enhanced by improving contrast.
Since the present invention is constructed as described above, characteristics of a color type LCD can be enhanced by improving contrast.
While a step for forming a hard resin layer for carrying a reflective layer is necessary in a conventional manufacturing method, the black mask of the present invention also acts as a layer for carrying the reflective layer. Accordingly, the manufacturing process of the present invention can be simplified and a manufacturing cost can be reduced.
Further, since the conventional manufacturing method has a problem that a dimensional pitch of a black mask and a color filter becomes misaligned, it is difficult to set a width of the black mask to about 20 μm or less. However, since the color filters are masked in the present invention, the black mask can be processed to a thickness of about 10 μm or less, which improves an open area ratio of a color display portion of the LCD.
Further, since the present invention is constructed as described above, a light diffusing property can be provided by the minute hills and the valleys.
Furthermore, since the present invention is constructed as described above, it has such a feature that it can provide a STN type LCD which includes substrates having surface flatness of pinpoint accuracy, can secure high gap accuracy between the substrates, and has excellent display quality.
Claims
- 1. A reflective type LCD, comprising:a substrate; one color layer formed on an approximately overall surface of a display region of said substrate; and a reflective layer covering the other portion of said color layer excluding a desired pattern portion thereof, characterized in that the pattern of said one color layer is exposed through said reflective layer.
- 2. A black and white reflective type LCD, characterized in that, in a reflective type LCD according to claim 1, said one color layer is a black mask.
- 3. A color reflective type LCD, characterized in that, in a reflective type LCD according to claim 1, said one color layer is a black mask, a color filter having a blue filter, a green filter, and a red filter is disposed on said reflective layer, and edges of said color filter partly overlap said black mask.
- 4. A reflective type LCD, characterized in that, in a reflective type LCD according to claim 1, fine hills and valleys are formed on a surface of said one color layer.
- 5. A reflective type LCD, characterized in that, in a reflective type LCD according to claim 1, said LCD is a super twisted nematic type LCD.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2000-146864 |
May 2000 |
JP |
|
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Number |
Name |
Date |
Kind |
5220444 |
Mitsui et al. |
Jun 1993 |
A |
5990992 |
Hamanaka et al. |
Nov 1999 |
A |
6476890 |
Funahata et al. |
Nov 2002 |
B1 |