Moonsuk Yi et al., “Characterization of EUVL Mask Defects By Actinic Detection of Far-Field Scattering Patterns”, 1999, Proc. the 44th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN 2000) Palm Springs, CA, May 30-Jun. 2, 2000, pp. 91-92. |
Tsuneyuki Haga et al., “At-Wavelenght EUVL Mask Inspection Using Mirau Interferometric Microscope”, Proc. the 44th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN 2000) Palm Springs, CA, May 30-Jun. 2, 2000 pp. 293-294. |
Seongtae Jeong et al., “At-wavelength Detection of Extreme Ultraviolet Lithography Mask Blank Defects”, J. Vac. Sci. Technol. B 16(6), Nov./Dec. 1998, pp. 3430-3434. |