Claims
- 1. An antireflection film comprising:
a substrate having a first surface and a second surface; an inorganic layer deposited on the first surface of the substrate; an optically active polymer layer formed by curing a curable composition in situ on the inorganic layer, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 nm to 700 nm and a thickness of from about 20 nm to about 200 nm; and an adhesive layer deposited on the second surface of the substrate.
- 2. The antireflection film of claim 1 wherein the inorganic layer comprises a metal oxide, a nitride, nickel, chromium, silica or any combination thereof.
- 3. The antireflection film of claim 2 wherein the metal oxide is indium oxide, titanium dioxide, nickel oxide, chromium oxide, cadmium oxide, gallium indium oxide, niobium pentoxide, indium tin oxide, tin dioxide, or any combination thereof.
- 4. The antireflection film of claim 3 wherein the metal oxide layer has a thickness of from about 10 to about 30 nm and the polymer layer has a thickness of from about 80 m to about 150 nm.
- 5. The antireflection film of claim 4 wherein the metal oxide layer has a thickness of from about 17 nm to about 23 nm and the polymer layer has a thickness of from about 110 nm to about 130 nm.
- 6. The antireflection film of claim 2 wherein the nitride is silicon nitride, titanium nitride, or a combination thereof.
- 7. The antireflection film of claim 2 wherein the inorganic layer comprises a first metal oxide layer, a silica layer, and a second metal oxide layer, wherein the silica layer is disposed between the first metal oxide layer and the second metal oxide layer and wherein the first metal oxide layer is deposited on the first surface of the substrate.
- 8. The antireflection film of claim 7 wherein the first metal oxide layer has a thickness of from about 20 nm to about 35 nm, the silica layer has a thickness of from about 10 nm to about 25 nm, the second metal oxide layer has a thickness of from about 50 nm to about 100 nm and the polymer layer has a thickness of from about 70 nm to about 120 nm.
- 9. The antireflection film of claim 8 wherein the first metal oxide layer has a thickness of from about 25 nm to about 30 nm, the silica layer has a thickness of from about 15 nm to about 20 nm, the second metal oxide layer has a thickness of from about 65 nm to about 80 nm and the polymer layer has a thickness of from about 85 nm to about 100 nm.
- 10. The antireflection film of claim 2 wherein the inorganic layer comprises a metal oxide layer and a silica layer, wherein the metal oxide layer is deposited on the first surface of the substrate and the silica layer is deposited on the metal oxide layer.
- 11. The antireflection film of claim 10 wherein the metal oxide layer has a thickness of from about 10 nm to about 30 nm, the silica layer has a thickness of from about 10 nm to about 120 nm, and the polymer layer has a thickness of from about 50 nm to about 130 nm.
- 12. The antireflection film of claim 11 wherein the metal oxide layer has a thickness of from about 10 nm to about 20 nm, the silica layer has a thickness of from about 10 nm to about 50 nm, and the polymer layer has a thickness of from about 60 nm to about 100 nm.
- 13. The antireflection film of claim 1 wherein the polymer layer has a refractive index not greater than about 1.50 over the wavelength range of 400 nm to 700 nm.
- 14. The antireflection film of claim 1 wherein the polymer layer comprises repeating units derived from a fluoroalkene, an acrylate with silicone, a methacrylate, a polyfunctional acrylate monomer, or any combination thereof.
- 15. The antireflection film of claim 1 wherein the polymer layer comprises repeating units derived from a fluoroalkene and repeating units derived from an acrylate with silicone and wherein the polymer layer has an outer portion enriched in the acrylate with silicone and an inner portion enriched in the fluoroalkene.
- 16. The antireflection film of claim 1 wherein the polymer layer comprises repeating units derived from a fluoroalkene and repeating units derived from a methacrylate and wherein the polymer layer has an outer portion enriched in the methacrylate and an inner portion enriched in the fluoroalkene.
- 17. The antireflection film of claim 1 wherein the polymer layer further comprises an antistatic agent.
- 18. The antireflection film of claim 1 further comprising an antistatic coating disposed on the polymer layer.
- 19. The antireflection film of claim 1 further comprising a hardcoat layer disposed between the first surface of the substrate and the inorganic layer.
- 20. The antireflection film of claim 19 wherein the hardcoat layer is microtextured.
- 21. The antireflection film of claim 19 wherein the hardcoat layer has a thickness of from about 1 μm to about 15 μm.
- 22. The antireflection film of claim 19 wherein the hardcoat layer comprises colloidal inorganic oxide particles dispersed in a free-radically cured binder.
- 23. The antireflection film of claim 22 wherein the colloidal inorganic oxide particles comprise colloidal silica particles.
- 24. The antireflection film of claim 22 wherein the binder is derived from one or more copolymerizable free-radically curable monomers, oligomers, polymers or any combination thereof.
- 25. The antireflection film of claim 22 wherein the binder comprises a conductive polymer.
- 26. The antireflection film of claim 1 wherein the substrate is a thermosetting polymer, a thermoplastic polymer, or a combination thereof.
- 27. The antireflection film of claim 26 wherein the substrate is polyethylene terephthalate.
- 28. The antireflection film of claim 1 wherein the substrate is a louvered plastic film.
- 29. The antireflection film of claim 1 further comprising a louvered plastic layer disposed between the second surface of the substrate and the adhesive layer.
- 30. The antireflection film of claim 1 wherein the substrate is a circular polarizer comprising a linear polarizer and a quarter-wavelength retarder, wherein the inorganic layer is deposited on the linear polarizer and the adhesive layer is deposited on the quarter-wavelength retarder.
- 31. The antireflection film of claim 1 further comprising a circular polarizer disposed between the second surface of the substrate and the adhesive layer, wherein the circular polarizer comprises a linear polarizer and a quarter-wavelength retarder and wherein the linear polarizer is adjacent to the second surface of the substrate and the quarter-wavelength retarder is adjacent to the adhesive layer.
- 32. The antireflection film of claim 1 further comprising a protective liner deposited on the adhesive layer.
- 33. The antireflection film of claim 1 wherein the adhesive layer is microtextured.
- 34. The antireflection film of claim 1 wherein the adhesive layer comprises a non-pressure sensitive adhesive.
- 35. The antireflection film of claim 34 wherein the non-pressure sensitive adhesive is a thermoplastic block copolymer elastomer.
- 36. An antireflection film comprising:
a substrate having a first surface and a second surface; an inorganic layer deposited on the first surface of the substrate; an optically active polymer layer formed by curing on the inorganic layer; and an adhesive layer deposited on the second surface of the substrate.
- 37. An optical system comprising:
a display device; and an antireflection film disposed on the display device, wherein the antireflection film comprises a substrate having a first surface and a second surface, an inorganic layer deposited on the first surface of the substrate, an optically active polymer layer formed by curing a curable composition in situ on the inorganic layer, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 nm to 700 nm and a thickness of from about 20 nm to about 200 nm, and an adhesive layer deposited on the second surface of the substrate.
- 38. The optical system of claim 37 wherein the display device is a personal digital assistant, cell phone, touch-sensitive screen, wrist watch, car navigation system, global positioning system, depth finder, calculator, handheld electronic game player, electronic book, CD player, DVD player, projection television screen, computer monitor, notebook computer display, instrument gauge, tablet personal computer, or LCD television.
- 39. The optical system of claim 37 wherein the antireflection film is located on a display screen of the display device.
- 40. The optical system of claim 37 comprising a plurality of antireflection films disposed on the display device.
- 41. The optical system of claim 40 wherein the plurality of antireflection films are located on a display screen of the display device, a cover of the display device or a back of the display device.
- 42. The optical system of claim 37 wherein the substrate is a circular polarizer comprising a linear polarizer and a quarter-wavelength retarder, wherein the inorganic layer is deposited on the linear polarizer and the adhesive layer is deposited on the quarter-wavelength retarder.
- 43. The optical system of claim 37 wherein the antireflection film further comprises a circular polarizer disposed between the second surface of the substrate and the adhesive layer, wherein the circular polarizer comprises a linear polarizer and a quarter-wavelength retarder and wherein the linear polarizer is adjacent to the second surface of the substrate and the quarter-wavelength retarder is adjacent to the adhesive layer.
- 44. An optical system comprising:
a display device; and an antireflection film disposed on the display device, wherein the antireflection film comprises a substrate having a first surface and a second surface, an inorganic layer deposited on the first surface of the substrate, an optically active polymer layer formed by curing on the inorganic layer, and an adhesive layer deposited on the second surface of the substrate.
- 45. A method for producing an antireflection film comprising:
providing a substrate having a first surface and a second surface; depositing an inorganic layer on the first surface of the substrate; depositing a layer of a curable composition on the inorganic layer; curing the deposited curable composition to form an optically active polymer layer having a thickness of from about 20 nm to about 200 nm and a refractive index not greater than about 1.53 over the wavelength range of 400 nm to 700 nm; and depositing an adhesive layer on the second surface of the substrate.
- 46. The method of claim 45 wherein the inorganic layer is formed from a metal oxide, a nitride, nickel, chromium, silica or any combination thereof.
- 47. The method of claim 46 wherein the metal oxide is indium oxide, titanium dioxide, nickel oxide, chromium oxide, cadmium oxide, gallium indium oxide, niobium pentoxide, indium tin oxide, tin dioxide, or any combination thereof.
- 48. The method of claim 46 wherein the metal oxide layer has a thickness of from about 10 to about 30 nm and the polymer layer has a thickness of from about 80 nm to about 150 m.
- 49. The method of claim 48 wherein the metal oxide layer has a thickness of from about 17 nm to about 23 nm and the polymer layer has a thickness of from about 110 nm to about 130 nm.
- 50. The method of claim 46 wherein the nitride is silicon nitride, titanium nitride, or a combination thereof.
- 51. The method of claim 46 wherein the inorganic layer comprises a first metal oxide layer, a silica layer, and a second metal oxide layer, the method further comprising
depositing the first metal oxide layer on the first surface of the substrate; depositing the silica layer on the first metal oxide layer; and depositing the second metal oxide layer on the silica layer.
- 52. The method of claim 51 wherein the first metal oxide layer has a thickness of from about 20 nm to about 35 nm, the silica layer has a thickness of from about 10 nm to about 25 nm, the second metal oxide layer has a thickness of from about 50 nm to about 100 nm and the polymer layer has a thickness of from about 70 nm to about 120 nm.
- 53. The method of claim 52 wherein the first metal oxide layer has a thickness of from about 25 nm to about 30 nm, the silica layer has a thickness of from about 15 nm to about 20 nm, the second metal oxide layer has a thickness of from about 65 nm to about 80 nm and the polymer layer has a thickness of from about 85 nm to about 100 nm.
- 54. The method of claim 46 wherein the inorganic layer comprises a metal oxide layer and a silica layer, the method further comprising
depositing the metal oxide layer on the first surface of the substrate; and depositing the silica layer on the metal oxide layer.
- 55. The method of claim 54 wherein the metal oxide layer has a thickness of from about 10 nm to about 30 nm, the silica layer has a thickness of from about 10 nm to about 120 nm and the polymer layer has a thickness of from about 50 nm to about 130 nm.
- 56. The method of claim 55 wherein the metal oxide layer has a thickness of from about 10 nm to about 20 nm, the silica layer has a thickness of from about 10 nm to about 50 nm and the polymer layer has a thickness of from about 60 nm to about 100 nm.
- 57. The method of claim 45 wherein the polymer layer has a refractive index not greater than about 1.50 over the wavelength range of 400 nm to 700 nm.
- 58. The method of claim 45 wherein the curable composition comprises a fluoroalkene polymer, an acrylate with silicone polymer, a methacrylate polymer, a polyfunctional acrylate monomer, or any combination thereof.
- 59. The method of claim 45 wherein the curable composition comprises a fluoroalkene polymer and an acrylate with silicone polymer, wherein the curing causes segregation of material within the polymer layer producing an outer portion enriched in the acrylate with silicone and an inner portion enriched in the fluoroalkene.
- 60. The method of claim 45 wherein the curable composition comprises a fluoroalkene polymer and a methacrylate polymer, wherein the curing causes segregation of material within the polymer layer producing an outer portion enriched in the methacrylate and an inner portion enriched in the fluoroalkene.
- 61. The method of claim 45 further comprising
depositing a hardcoat on the first surface of the substrate before the inorganic layer is deposited thereon.
- 62. The method of claim 45 wherein the curing of the curable composition is conducted in air or nitrogen.
- 63. The method of claim 45 wherein the curing of the curable composition is effected by free radical curing.
- 64. The method of claim 45 wherein the substrate is a louvered plastic film.
- 65. The method of claim 45 further comprising
depositing a louvered plastic layer on the second surface of the substrate before the adhesive layer is deposited thereon.
- 66. The method of claim 45 wherein the substrate is a circular polarizer comprising a linear polarizer and a quarter-wavelength retarder, wherein the inorganic layer is deposited on the linear polarizer and the adhesive layer is deposited on the quarter-wavelength retarder.
- 67. The method of claim 45 further comprising
adhering a circular polarizer to the second surface of the substrate before the adhesive layer is deposited thereon, wherein the circular polarizer comprises a linear polarizer and a quarter-wavelength retarder and wherein the linear polarizer is adjacent to the second surface of the substrate and the quarter-wavelength retarder is adjacent to the adhesive layer.
- 68. The method of claim 45 further comprising
depositing a protective liner on the adhesive layer.
- 69. A method for producing an antireflection film comprising:
providing a substrate having a first surface and a second surface; depositing an inorganic layer on the first surface of the substrate; forming an optically active polymer layer on the inorganic layer; and depositing an adhesive layer on the second surface of the substrate.
- 70. A method for producing an optical system comprising:
providing a display device; and disposing an antireflection film on at least a portion of the display device, wherein the antireflection film comprises a substrate having a first surface and a second surface, an inorganic layer deposited on the first surface of the substrate, an optically active polymer layer formed by curing a curable composition in situ on the inorganic layer, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 nm to 700 nm and a thickness of from about 20 nm to about 200 nm, and an adhesive layer deposited on the second surface of the substrate.
- 71. The method of claim 70 wherein the display device is a personal digital assistant, cell phone, touch-sensitive screen, wrist watch, car navigation system, global positioning system, depth finder, calculator, handheld electronic game player, electronic book, CD player, DVD player, projection television screen, computer monitor, notebook computer display, instrument gauge, tablet personal computer, or LCD television.
- 72. The method of claim 70 wherein the antireflection film is located on a display screen of the display device.
- 73. The method of claim 70 wherein the antireflection film further comprises a hardcoat layer disposed between the first surface of the substrate and the inorganic layer.
- 74. The method of claim 70 wherein the substrate is a circular polarizer comprising a linear polarizer and a quarter-wavelength retarder, wherein the inorganic layer is deposited on the linear polarizer and the adhesive layer is deposited on the quarter-wavelength retarder.
- 75. The method of claim 70 wherein the antireflection film further comprises a circular polarizer disposed between the second surface of the substrate and the adhesive layer, wherein the circular polarizer comprises a linear polarizer and a quarter-wavelength retarder and wherein the linear polarizer is adjacent to the second surface of the substrate and the quarter-wavelength retarder is adjacent to the adhesive layer.
- 76. The method of claim 70 further comprising
disposing a plurality of antireflection films on the display device.
- 77. The method of claim 70 wherein the plurality of antireflection films are located on a display screen of the display device, a cover of the display device or a back of the display device.
- 78. A method for producing a stack of removable antireflection films comprising:
forming a plurality of antireflection films according to the method of claim 45; and placing the plurality of antireflection films adjacent to one another, wherein the adhesive layer of one antireflection film is adjacent to the polymer layer of another antireflection film.
- 79. The method of claim 78 further comprising
depositing a protective liner on the adhesive layer of one antireflection film.
- 80. The method of claim 78 wherein each of the plurality of antireflection films further comprises a hardcoat layer disposed between the first surface of the substrate and the inorganic layer.
- 81. A method for producing a stack of removable antireflection films comprising:
forming a plurality of antireflection films according to the method of claim 69; and placing the plurality of antireflection films adjacent to one another, wherein the adhesive layer of one antireflection film is adjacent to the polymer layer of another antireflection film.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation-in-part of pending application Ser. No. 09/026,271, filed Feb. 19, 1998, entitled “ANTIREFLECTION FILM”, and a continuation-in-part of pending application Ser. No. 09/924,127, filed Aug. 7, 2001, entitled “INFORMATION DISPLAY PROTECTORS”, which is a continuation-in-part of application Ser. No. 09/633,835, filed Aug. 7, 2000, entitled “MICROSCOPE COVER SLIDE MATERIALS”, the disclosures of which are incorporated by reference herein.
Continuation in Parts (3)
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Number |
Date |
Country |
Parent |
09026271 |
Feb 1998 |
US |
Child |
10134150 |
Apr 2002 |
US |
Parent |
09924127 |
Aug 2001 |
US |
Child |
10134150 |
Apr 2002 |
US |
Parent |
09633835 |
Aug 2000 |
US |
Child |
09924127 |
Aug 2001 |
US |