Patent Application
20140187674
This application claims the benefit of Korean Patent Application No. 10-2012-0157259, filed Dec. 28, 2012, entitled “Resin composition with enhanced heat-releasing property, heat-releasing film, insulating film, and prepreg,” which is hereby incorporated by reference in its entirety into this application.
1. Technical Field
The present invention relates to a resin composition having enhanced heat-releasing properties, a heat-releasing film, an insulating film, and a prepreg.
2. Description of the Related Art
With the recent advancement of electronic devices and the increased demand for complicated functions thereof, printed circuit boards are being manufactured so as to be lighter, slimmer, and smaller. In order to fulfill such requirements, printed circuit wiring has become more complicated and even denser, and its functionality has increased.
As electronic devices are being manufactured so as to be small and to have high functionality, as mentioned above, a multilayer printed circuit board is required, which has high density and high functionality, as well as being small and slim. In particular, a multilayer printed circuit board is required that incorporates wiring that is fine and dense. Accordingly, thermal, mechanical and electrical properties of an insulating layer of the multilayer printed circuit board are considered important. Particularly, in order to minimize warpage due to reflow in the course of mounting an electronic/electrical device, the device has to have a low coefficient of thermal expansion (CTE), a high glass transition temperature (Tg), and high modulus.
An insulating substrate for a printed circuit board is typically exemplified by a copper clad laminate (CCL) obtained by adding a binder to reinforced glass fibers, drying it, thus obtaining a prepreg, laminating a predetermined number of prepregs, and layering a copper foil thereon. The prepreg is formed by impregnating glass fibers with a cross-linkable resin such as epoxy. However, in the case of the prepreg manufactured by the above method using general glass fibers, it is common to encounter problems such as deformation and disconnection due to high CTE, making it impossible to develop a high value-added prepreg.
Although a printed circuit board typically functions to connect a variety of electronic parts to a printed-circuit base board, depending on the circuit design of electrical wiring thereof, or to support the parts, power consumption of the parts is increased and a large quantity of heat is generated in proportion to an increase in the number of mounted passive parts and packages, and thus heat-releasing performance is regarded as important in terms of reliability of products and consumers' product preferences.
Conventionally, a heat-releasing substrate or a heat-releasing film formed by placing an epoxy resin on a core made of a ceramic material or a metal material is mainly used. As such, thermal properties of the heat-releasing film (or substrate) are determined depending on the amount of a filler having high thermal conductivity which is dispersed in an epoxy resin matrix and on the extent of dispersion of the filler. Currently useful as the filler are ceramic nanoparticles, such as AlN, alumina, and/or BN, as disclosed in Patent Literature 1. However, such a filler makes it difficult to produce nanoparticles having high purity, and is expensive, and thus a novel filler is required.
Patent Literature 1: Korean Patent No. 10-1021627
Culminating in the present invention, intensive and thorough research with the aim of solving the problems occurring in the related art resulted in the finding that the use of a carbon material, in particular, graphene oxide (GO), may increase heat-releasing properties without decreasing thermal and mechanical properties of an insulating material.
Accordingly, a first aspect of the present invention is to provide a resin composition, which may have enhanced heat-releasing properties, as well as superior heat resistance and mechanical strength, because of high dispersibility thereof.
A second aspect of the present invention is to provide a heat-releasing film, which may be manufactured using the resin composition so as to exhibit low CTE and enhanced heat-releasing properties.
A third aspect of the present invention is to provide an insulating film for a printed circuit board, which may be manufactured using the resin composition so as to exhibit low CTE and enhanced heat-releasing properties.
A fourth aspect of the present invention is to provide a prepreg for a printed circuit board, which may be manufactured by impregnating a base material such as woven glass fibers with the resin composition so as to exhibit low CTE and enhanced heat-releasing properties.
In order to accomplish the above first aspect of the present invention, a resin composition having enhanced heat-releasing properties (hereinafter, referred to as “the first invention”) is provided, which includes a liquid crystal oligomer, an epoxy resin, or a resin mixture thereof; and a filler comprising graphene oxide.
In the first invention, the liquid crystal oligomer may be represented by Chemical Formula 1, 2, 3, or 4 below.
wherein a is an integer of 13˜26, b is an integer of 13˜26, c is an integer of 9˜21, d is an integer of 10˜30, and e is an integer of 10˜30.
In the first invention, the epoxy resin may be represented by Chemical Formula 5 or 6 below.
wherein R is an alkyl group having 1˜20 carbons, and n is an integer of 0˜20.
In the first invention, the resin composition may include 10˜90 wt % of the liquid crystal oligomer, 10˜90 wt % of the epoxy resin, or 10˜90 wt % of the resin mixture comprising 0.5˜50 wt % of the liquid crystal oligomer and 5˜50 wt % of the epoxy resin, and 10˜90 wt % of the filler.
In the first invention, the liquid crystal oligomer may have a number average molecular weight of 2,500˜6,500.
In the first invention, the epoxy resin may include one or more selected from the group consisting of a naphthalenic epoxy resin, a bisphenol A type epoxy resin, a phenol novolac epoxy resin, a cresol novolac epoxy resin, a rubber modified epoxy resin, and a phosphorous epoxy resin.
In the first invention, the filler may further include a component comprising one or more selected from the group consisting of silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, barium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, and calcium zirconate.
In the first invention, the resin composition may further include a thermoplastic resin comprising one or more selected from the group consisting of a phenoxy resin, a polyimide resin, a polyamideimide (PAI) resin, a polyetherimide (PEI) resin, a polysulfone (PS) resin, a polyethersulfone (PES) resin, a polyphenyleneether (PPE) resin, a polycarbonate (PC) resin, a polyetheretherketone (PEEK) resin, and a polyester resin.
In order to accomplish the above second aspect of the present invention, a heat-releasing film for an electronic device is provided, which is manufactured using the resin composition according to the first invention.
In order to accomplish the above third aspect of the present invention, an insulating film for a printed circuit board is provided, which is manufactured using the resin composition according to the first invention.
In order to accomplish the above fourth aspect of the present invention, a prepreg for a printed circuit board is provided, which is manufactured by impregnating a base material with the resin composition according to the first invention.
The above and other aspects, features and other advantages of the present invention will be more clearly understood from the following detailed description when taken in conjunction with the accompanying drawings, in which:
Before the present invention is described in more detail, the terms and words used in the present specification and claims should not be interpreted as being limited to typical meanings or dictionary definitions, but should be interpreted as having meanings and concepts relevant to the technical scope of the present invention based on the rule according to which an inventor can appropriately define the concept implied by the term to best describe the method he or she knows for carrying out the invention. It is noted that, the embodiments of the present invention are merely illustrative, and are not construed to limit the scope of the present invention, and thus there may be a variety of equivalents and modifications able to substitute for them at the point of time of the present application.
In the following description, it is to be noted that embodiments of the present invention are described in detail so that the present invention may be easily performed by those skilled in the art, and also that, when known techniques related with the present invention may make the gist of the present invention unclear, a detailed description thereof will be omitted.
An example of the electronic part 120 may include an active device such as a semiconductor device. Also, the printed circuit board 100 may further include one or more additional electronic parts, for example, a capacitor 140, a resistor 150, etc., in addition to the single electronic part 120. In embodiments of the present invention, the kind or number of the electronic parts is not limited. As such, the insulator or prepreg 110 and the insulating layers 131 play a role in imparting insulating properties between the circuit layers or between the electronic parts, and also function as a support for maintaining rigidity of a package.
In the case where the wiring density of the printed circuit board 100 is increased, to decrease noise between the circuit layers and also to reduce parasitic capacitance, the insulator or prepreg 110 and the insulating layers 131 should have low dielectric properties. Furthermore, the insulator or prepreg 110 and the insulating layers 131 should have low dielectric loss to increase insulating properties.
At least any one of the insulator or prepreg 110 and the insulating layers 131 is particularly useful so long as it is superior in terms of heat resistance, such as CTE, and mechanical strength, and has enhanced heat-releasing properties, due to high dispersibility of a filler.
In the present invention, in order to reduce CTE of the insulating layers and increase Tg to ensure rigidity and improve heat-releasing properties (e.g. thermal conductivity), the insulating layers or the prepreg may be formed from a resin composition including a liquid crystal oligomer, an epoxy resin or resin mixtures thereof, and graphene oxide as a filler.
Liquid Crystal Oligomer
In the present invention, a liquid crystal oligomer, and particularly, a liquid crystal oligomer represented by Chemical Formulas 1 to 4 below may include an ester group at both terminals of the main chain thereof to improve dielectric tangent and dielectric constant, and a naphthalene group to ensure desired crystallinity, and may contain a phosphorus component for imparting fire retardancy as shown in Chemical Formula 2 or 4. More specifically, the liquid crystal oligomer includes a hydroxyl group or a nadimide group at the terminals thereof, so that it may be subjected to a thermosetting reaction with an epoxy resin or graphene oxide.
In Chemical Formulas 1 to 4, a is an integer of 13˜26, b is an integer of 13˜26, c is an integer of 9˜21, d is an integer of 10˜30, and e is an integer of 10˜30.
The number average molecular weight of the liquid crystal oligomer is 2,500˜6,500 g/mol, preferably 3,000˜6,000 g/mol, and more preferably 4,500˜5,500 g/mol. If the number average molecular weight of the liquid crystal oligomer is less than 2,500 g/mol, mechanical properties may deteriorate. In contrast, if the number average molecular weight thereof exceeds 6,500 g/mol, solubility may decrease.
The liquid crystal oligomer may be used in an amount of 10˜90 wt %, and the amount thereof may be set to 0.5˜50 wt % when used together with the epoxy resin. If the amount of the liquid crystal oligomer is less than 0.5 wt %, CTE may decrease and an increase in Tg may become insignificant. In contrast, if the amount thereof exceeds 90 wt %, thermal properties, such as CTE, and mechanical properties may deteriorate.
Epoxy Resin
According to the present invention, the resin composition includes the epoxy resin in order to increase handleability of the dried resin composition as an adhesive film. The epoxy resin is not particularly limited, but indicates a resin including one or more epoxy groups, preferably two or more epoxy groups, and more preferably four or more epoxy groups, in the molecule thereof.
The epoxy resin used in the present invention may be a compound containing a naphthalene group as represented by Chemical Formula 5 below, or an aromatic amine as represented by
Chemical Formula 6 below.
In Chemical Formula 5, R is an alkyl group having 1˜20 carbons, and n is an integer of 0˜20.
However, the epoxy resin used in the present invention is not particularly limited to the epoxy resin represented by Chemical Formula 5 or 6, and may include, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, phenol novolac epoxy resin, alkylphenol novolac epoxy resin, biphenyl type epoxy resin, aralkyl type epoxy resin, dicyclopentadiene type epoxy resin, naphthalenic epoxy resin, naphthol type epoxy resin, epoxy resin including a condensate of phenol and aromatic aldehyde having a phenolic hydroxyl group, biphenylaralkyl type epoxy resin, fluorene type epoxy resin, xantene type epoxy resin, triglycidyl isocyanurate, rubber modified epoxy resin and phosphorous epoxy resin. Particularly useful is naphthalenic epoxy resin, bisphenol A type epoxy resin, phenol novolac epoxy resin, cresol novolac epoxy resin, rubber modified epoxy resin, or phosphorous epoxy resin. These epoxy resins may be used alone or in combination of two or more.
The epoxy resin may be used in an amount of 10˜90 wt %, and the amount thereof is set to 5˜50 wt % when used together with the liquid crystal oligomer. If the amount of the epoxy resin is less than 5 wt %, handleability may decrease. In contrast, if the amount thereof exceeds 90 wt %, the amounts of the other components may be comparatively decreased, undesirably lowering dielectric tangent, dielectric constant, and CTE.
Filler
The resin composition according to the present invention includes a filler to decrease CTE of the epoxy resin and to improve heat-releasing properties. The amount of the filler in the resin composition may be set to 10˜90 wt %, depending on the required properties taking into consideration the end uses of the resin composition. If the amount of the filler is less than 10 wt %, dielectric tangent may decrease and CTE may increase, and there is almost no improvement in heat-releasing properties. In contrast, if the amount thereof exceeds 90 wt %, adhesive strength and mechanical properties may deteriorate. In the present invention, the filler may include a carbon material, in particular, graphene oxide.
Graphene oxide (GO) is an intermediate product formed in the course of synthesizing graphene from graphite, and may be obtained using a widely known process such as a Hummers method. GO is a potential precursor to graphene upon thermal de-oxidation or chemical reduction. Although GO itself has been studied for over a century, its structure and properties remain elusive, and significant progress towards dispersibility, as the first step for applications, has been made only recently.
Graphite may be converted into graphite oxide in an aqueous medium (e.g. Hummers et al., Preparation of graphitic oxide. J. Am. Chem. Soc., 80, 1339(1958) and Schniepp, H. C. et al., Functionalized single graphene sheets derived from splitting graphite oxide, J. Phys. Chem. B, 110, 8535-8539(2006)). The prerequisites that enable the preparation of so called bulk graphene are complete oxidation of graphite and very rapid heating of the resulting GO. The complete oxidation of graphite produces stoichiometric GO. This well-known process adds oxygen-based chemical groups, for example, selected from epoxy, hydroxyl and carboxylic acid groups, to the surface of graphite, and results in the bulk graphite being completely separated into single sheets.
In the present invention, rather than the conventional ceramic nano-filler, GO is dispersed in the resin matrix so as to improve heat-releasing properties of a product (e.g. a film). In the case of graphene as a novel filler, which is called a dream material with high thermal conductivity and mechanical strength, it has high electrical conductivity despite its drastically high thermal conductivity (˜5000 W/mK), and thus cannot be used in a heat-releasing substrate or film requiring electrical insulating properties. Although GO which is the oxide of graphene (or graphite) has lower thermal conductivity than that of the graphene (or graphite), it is an electrical nonconductor and may thus be used as a heat-releasing filler.
In the present invention, when GO is used as the filler, thermal conductivity of a product such as a film may be improved while maintaining the resin as an electrical nonconductor. Furthermore, because GO has an epoxy group which is chemically reactive, it may easily form a covalent bond with the epoxy resin and/or the liquid crystal oligomer, which are a matrix, thus facilitating dispersion of the composition. The functional group of GO may be easily modified via ring-opening reaction.
On the other hand, the filler according to the present invention may further include an inorganic filler comprising one or more selected from the group consisting of silica, alumina, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, boron nitride, aluminum borate, barium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, barium zirconate, and calcium zirconate.
In this case, although the amount of the inorganic filler in the resin composition may vary depending on the required properties in consideration of the end uses of the resin composition, the inorganic filler may be used in an amount of 1˜80 wt % or more in the addition range (i.e. 10˜90 wt %) of GO, with the remainder being GO.
Furthermore, in the case where the average particle size of the inorganic filler exceeds 5 μm, it is difficult to stably form a fine pattern upon forming a circuit pattern on a conductor layer. Hence, the average particle size thereof is set to 5 μm or less. In order to increase moisture resistance, the filler may be surface-treated with a surface treating agent, such as a silane coupling agent, etc. Particularly useful is silica having a diameter of 0.2˜2 μm.
Curing Agent
In the present invention, a curing agent may be optionally used, and any one may be used without particular limitation so long as it enables thermosetting of an epoxy resin.
Specific examples of the curing agent may include an amide-based curing agent such as dicyandiamide; a polyamine-based curing agent, including diethylenetriamine, triethylenetetramine, N-aminoethylpiperazine, diaminodiphenylmethane, adipic acid dihydrazide, etc.; an acid anhydride curing agent, including pyromellitic anhydride, benzophenone tetracarboxylic anhydride, ethylene glycol bis trimellitic anhydride, glycerol tris trimellitic anhydride, maleic methylcyclohexene tetracarboxylic anhydride, etc.; a phenol novolac type curing agent; a polymercaptan curing agent, such as trioxane trimethylene mercaptan, etc.; a tertiary amine curing agent, including benzyldimethylamine, 2,4,6-tris(dimethylaminomethyl)phenol, etc.; and an imidazole curing agent, including 2-ethyl-4-methyl imidazole, 2-methyl imidazole, 1-benzyl-2-methyl imidazole, 2-heptadecyl imidazole, 2-undecyl imidazole, 2-phenyl-4-methyl-5-hydroxymethyl imidazole, 2-phenyl imidazole, 2-phenyl-4-methyl imidazole, 1-benzyl-2-phenyl imidazole, 1,2-dimethyl imidazole, 1-cyanoethyl-2-phenyl imidazole, and 2-phenyl-4,5-dihydroxymethyl imidazole. These curing agents may be used alone or in combination of two or more. In order to obtain desired properties, the use of dicyandiamide is preferable. The amount of the curing agent may be appropriately determined in the range known well to those skilled in the art, for example, in the range of 0.1˜1 parts by weight, based on 100 parts by weight of the mixture of liquid crystal oligomer and epoxy resin, taking into consideration the curing rate without deteriorating inherent properties of the epoxy resin.
Curing Accelerator
The resin composition of the present invention may optionally include a curing accelerator, and thereby may be efficiently cured. The curing accelerator used in the present invention may include a metallic curing accelerator, an imidazole-based curing accelerator, an amine-based curing accelerator, etc., which may be used alone or in combination of two or more in an amount typically used in the art.
Examples of the metallic curing accelerator include, but are not particularly to, organic metal complexes or organic metal salts of metal such as cobalt, copper, zinc, iron, nickel, manganese, tin, etc. Specific examples of the organic metal complex include an organic cobalt complex, including cobalt (II) acetylacetonate, cobalt (III) acetylacetonate, etc., an organic copper complex, such as copper (II) acetylacetonate, etc., an organic zinc complex, such as zinc (II) acetylacetonate or the like, an organic iron complex, such as iron (III) acetylacetonate or the like, an organic nickel complex, such as nickel (II) acetylacetonate or the like, an organic manganese complex, such as manganese (II) acetylacetonate, etc. Examples of the organic metal salt include zinc octylate, tin octylate, zinc naphthenate, cobalt naphthenate, tin sterate, zinc stearate, etc. From the point of view of curability and solubility in solvent, cobalt (II) acetylacetonate, cobalt (III) acetylacetonate, zinc (II) acetylacetonate, zinc naphthenate, or iron (III) acetylacetonate may be used as the metallic curing accelerator. Particularly useful is cobalt (II) acetylacetonate or zinc naphthenate. These metallic curing accelerators may be used alone or in combination of two or more.
The imidazole-based curing accelerator is not particularly limited, but examples thereof may include imidazole compounds, including 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[2′-methylimidazolyl-(1′)]-ethyl-s-triazine, 2,4-diamino-6-[2′-undecylimidazolyl-(1)]-ethyl-s-triazine, 2,4-diamino-6-[2′-ethyl-4′-methylimidazolyl-(1′)]-ethyl-s-triazine, 2,4-diamino-6-[2′-methylimidazolyl-(1′)]-ethyl-s-tiazine isocyanurate adducts, 2-phenylimidazole isocyanurate adducts, 2-phenyl-4,5-dihydroxy-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydroxy-1H-pyro[1,2-a]benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline, 2-phenylimidazoline, etc., and adducts of imidazole compound and epoxy resin. These imidazole curing accelerators may be used alone or in combination of two or more.
The amine-based curing accelerator is not particularly limited, but examples thereof may include trialkylamines, including triethylamine, tributylamine, etc., and amine compounds, including 4-dimethylaminopyridine, benzyldimethylamine, 2,4,6-tris(dimethylaminomethyl)phenol, 1,8-diazabicyclo(5,4,0)-undecene (DBU), etc. The amine-based curing accelerators may be used alone or in combination of two or more.
Thermoplastic Resin
The resin composition of the present invention may optically include a thermoplastic resin to improve film properties of a resin composition or to improve mechanical properties of a cured product. Examples of the thermoplastic resin include phenoxy resin, polyimide resin, polyamideimide (PAI) resin, polyetherimide (PEI) resin, polysulfone (PS) resin, polyethersulfone (PES) resin, polyphenyleneether (PPE) resin, polycarbonate (PC) resin, polyetheretherketone (PEEK) resin, polyester resin, etc. These thermoplastic resins may be used alone or in combination of two or more. The weight average molecular weight of the thermoplastic resin falls in the range of 5,000˜200,000. If the weight average molecular weight thereof is less than 5,000, improvements in film formability or mechanical strength become insignificant. In contrast, if the weight average molecular weight thereof exceeds 200,000, compatibility with the liquid crystal oligomer and the epoxy resin becomes poor, and surface roughness may increase after a curing process, making it difficult to form a high-density fine pattern. The weight average molecular weight was calculated based on the calibration curve of standard polystyrene at a column temperature of 40° C. using LC-9A/RID-6A as a measuring device available from Shimadzu Corporation, Shodex K-800P/K-804L/K-804L as a column available from Showa Denko, and chloroform (CHCl3) as a mobile phase.
In the case where the thermoplastic resin is added to the resin composition, the amount of the thermoplastic resin in the resin composition is not particularly limited but may be set to 0.1˜10 wt %, and preferably 1˜5 wt %, based on 100 wt % of nonvolatile content of the resin composition. If the amount of the thermoplastic resin is less than 0.1 wt %, there is no improvement in film formability or mechanical strength. In contrast, if the amount thereof exceeds 10 wt %, melting viscosity may increase and the surface roughness of the insulating layer after a wet roughening process may increase.
The insulating resin composition according to the present invention is prepared in the presence of an organic solvent. Taking into consideration solubility and miscibility of the resin and other additives used in the present invention, examples of the organic solvent may include, but are not particularly limited to, 2-methoxy ethanol, acetone, methylethylketone, cyclohexanone, ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, ethylene glycol monobutyl ether acetate, cellosolve, butyl cellosolve, carbitol, butyl carbitol, xylene, dimethylformamide, and dimethylacetamide.
The viscosity of the resin composition according to the present invention is 700˜1500 cps which is adapted to manufacture a heat-releasing film for electronic devices or an insulating film for printed circuit boards, and this viscosity corresponds to the extent to which appropriate stickiness may be maintained at room temperature. The viscosity of the resin composition may be adjusted by changing the amount of the solvent. The nonvolatile content (solid content) of the resin composition, excluding the solvent, may be 30˜70 wt %. If the viscosity of the resin composition falls outside of the above range, it is difficult to form a heat-releasing film or an insulating film. Even when such a film is formed, it is difficult to form a predetermined member thereon.
Also, peel strength may be 1.0 kN/m or more when a copper foil 12 μm thick is used on the heat-releasing film or the insulating film. The heat-releasing film or the insulating film, manufactured using the resin composition according to the present invention, has a CTE of 20 ppm/° C. or less. Furthermore, Tg may be 200˜300° C., and preferably 250˜270° C.
In addition, the resin composition according to the present invention may further include a leveling agent and/or a fire retardant, as necessary, provided by those skilled in the art within the scope of the present invention.
The insulating resin composition according to the present invention may be manufactured in the form of a dry film in a semi-solid phase using any process typically known in the art. For example, the resin composition may be formed into a film using a roll coater or a curtain coater and then dried, after which the resulting film is used as an insulating layer (or an insulating film) or a prepreg upon manufacturing a multilayer printed circuit board using a building-up process on a substrate. Such an insulating film or prepreg has a low CTE of 50 ppm/° C. or less.
A base such as glass fibers is impregnated with the resin composition according to the present invention and then cured, thus preparing a prepreg on which a copper foil is then laminated, thereby obtaining CCL (Copper Clad Laminate). Also, the insulating film prepared from the above resin composition may be laminated on the CCL used as an inner layer upon manufacturing a multilayer printed circuit board. For example, an insulating film made of the insulating resin composition may be laminated on an inner circuit board having a processed pattern, cured at 80˜110° C. for 20˜30 min, and subjected to desmearing, followed by performing an electroplating process, thus forming a circuit layer, resulting in a multilayer printed circuit board.
A better understanding of the present invention may be obtained via the following examples and comparative examples which are set forth to illustrate, but are not to be construed as limiting the present invention.
Preparation of Liquid Crystal Oligomer
To a 20 L glass reactor, 218.26 g (2.0 mol) of 4-aminophenol, 415.33 g (2.5 mol) of isophthalic acid, 276.24 g (2.0 mol) of 4-hydroxybenzoic acid, 282.27 g (1.5 mol) of 6-hydroxy-2-naphthoic acid, 648.54 g (2.0 mol) of 9,10-dihydroxy-9-oxa-10-phosphophenanthrene-10-oxide (DOPO), and 1531.35 g (15.0 mol) of acetic anhydride were added. The inside of the reactor was sufficiently purged with nitrogen gas, the inner temperature of the reactor was increased to 230° C. under nitrogen gas stream and maintained, and the reaction mixture was refluxed for 4 hr. 188.18 g (1.0 mol) of 6-hydroxy-2-naphthoic acid as an end-capping agent was further added, after which reaction byproducts, that is, acetic acid and unreacted acetic anhydride, were removed, thus preparing a liquid crystal oligomer having a molecular weight of about 4500 as represented by Chemical Formula 2.
10 g of graphene oxide was dispersed in methylethylketone, thus preparing a 70 wt % graphene oxide slurry. Subsequently, 5 g of tetrafunctional epoxy having an average epoxy equivalent of 380˜440 (KDT-4400, available from Kukdo Chemical) was added to the prepared graphene oxide slurry, and stirred at room temperature at 300 rpm so as to be dissolved, thus preparing a mixture. Subsequently, the mixture was added with 5 g of an amine curing agent (DDM, available from Kukdo Chemical) and 5 g of the liquid crystal oligomer of Preparation Example 1 dissolved in dimethylacetamide, and then further stirred at 300 rpm for 1 hr, thus preparing a resin composition. The solid content of the obtained varnish based on the total weight thereof was 70 wt %. This varnish was applied to a thickness of 100 μm on the shiny surface of a copper foil using a doctor blade process, thus manufacturing a film. The film was dried at room temperature for 2 hr, dried in a vacuum oven at 80° C. for 1 hr, and then further dried at 110° C. for 1 hr, thus obtaining a semi-cured state (B-stage). This film was completely cured using a vacuum press. As such, the maximum temperature was 230° C. and the maximum pressure was 2 MPa.
A film was manufactured in the same manner as in Example 1, with the exception that the amount of graphene oxide was changed to 5 g.
Preparation of Prepreg
Glass fibers (2116, available from Nittobo) were uniformly impregnated with the varnish of Example 1. The glass fibers impregnated with the varnish were semi-cured through a heating zone at 200° C., thus obtaining a prepreg. As such, the amount of the polymer based on the total weight of the prepreg was 54 wt %.
A film was manufactured in the same manner as in Example 1, with the exception that silica was used instead of graphene oxide.
Glass fibers (2116, available from Nittobo) were uniformly impregnated with the varnish of Comparative Example 1. The glass fibers impregnated with the varnish were semi-cured through a heating zone at 200° C., thus obtaining a prepreg. The amount of the polymer based on the total weight of the prepreg was 54 wt %.
Measurement of Thermal Properties
The CTE of the insulating films and the prepregs of Examples 1 and 3 and Comparative Examples 1 and 2 was measured using a thermomechanical analyzer (TMA), and Tg thereof was measured in the range to 270° C. (1st cycle), 300° C. (2nd cycle) at a heating rate of 10° C./min in a nitrogen atmosphere using a thermomechanical analyzer (TA Instruments TMA 2940) by differential scanning calorimetry (DSC). The results are shown in Tables 1 and 2 below.
Heat-Releasing Properties
The heat-releasing properties of the insulating films of Examples 1 and 2 were measured using a laser flash method. The results are shown in Table 2 below.
As is apparent from Tables 1 and 2, the insulating film and the prepreg of Examples 1 and 3 using graphene oxide manifested superior thermal conductivity while exhibiting similar CTE and Tg compared to the insulating film and the prepreg of Comparative Examples 1 and 2 using only silica.
As described hereinbefore, the present invention provides a resin composition with enhanced heat-releasing properties, a heat-releasing film, an insulating film, and a prepreg. According to the present invention, the resin composition can be easily dispersed because graphene oxide can easily form a covalent bond with main resins by means of the surface functional group thereof. Thus, when a film is formed using the resin composition, heat-releasing properties, which are inherent properties of graphene oxide, can be effectively exhibited, as along with superior heat resistance and mechanical strength.
Although the embodiments of the present invention have been disclosed for illustrative purposes, those skilled in the art will appreciate that a variety of different modifications, additions and substitutions are possible, without departing from the scope and spirit of the invention as disclosed in the accompanying claims.
Accordingly, such modifications, additions and substitutions should also be understood as falling within the scope of the present invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10-2012-0157259 | Dec 2012 | KR | national |
