This application claims benefit of priority to Korean Patent Application No. 10-2019-0165450 filed on Dec. 12, 2019 in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference in its entirety.
The present disclosure relates to a resistor component.
A resistor component is a passive electronic component for implementing a precision resistor. A resistor component may adjust a current and may increase and decrease a voltage in an electronic circuit.
As electronic devices have been designed to have a reduced size and a precise design, a size of an electronic circuit employed in electronic devices has been reduced, and a size of a resistor component has also been reduced. Recently, to reduce costs and time for producing a resistor component, various measures have been suggested to reduce the number of manufacturing processes.
An aspect of the present disclosure is to provide a resistor component having improved cohesion reliability with a mounting substrate.
Another aspect of the present disclosure is to provide a resistor component which may improve efficiency of manufacturing processes.
According to an aspect of the present disclosure, a resistor component includes an insulating substrate having one surface and the other surface opposing each other and one end surface and the other end surface connecting the one surface and the other surface to each other and opposing each other, a slit portion disposed on the one end surface and the other end surface of the insulating substrate and extending to the one surface and the other surface of the insulating substrate, a resistor layer disposed on the one surface of the insulating substrate, and a first terminal and a second terminal connected to the resistor layer. The first and second terminals include: an internal electrode layer including an upper electrode disposed on the one surface of the insulating substrate, a lower electrode disposed on the other surface of the insulating substrate, and a slit electrode disposed on an internal wall of the slit portion and connecting the upper electrode and the lower electrode to each other, and an external electrode layer disposed on the one end surface of the insulating substrate, the other end surface of the insulating substrate, and the internal wall of the slit portion, in contact with the slit electrode, having a thickness less than a thickness of the internal electrode layer.
According to an aspect of the present disclosure, a resistor component includes an insulating substrate having one surface and the other surface opposing each other, and one end surface and the other end surface connecting the one surface and the other surface to each other and opposing each other; first and second slit portions disposed at the one end surface and the other end surface of the insulating substrate, respectively, and each extending to the one surface and the other surface of the insulating substrate; a resistor layer disposed on the one surface of the insulating substrate; and a first terminal and a second terminal connected to the resistor layer, respectively. The first terminal include: a first internal electrode layer including a first upper electrode disposed on the one surface of the insulating substrate, a first lower electrode disposed on the other surface of the insulating substrate, and a first slit electrode disposed on an internal wall of the first slit portion and connecting the first upper electrode and the first lower electrode to each other; and a first external electrode layer disposed on the one end surface of the insulating substrate and covering the first slit electrode. The second terminal include: a second internal electrode layer including a second upper electrode disposed on the one surface of the insulating substrate, a second lower electrode disposed on the other surface of the insulating substrate, and a second slit electrode disposed on an internal wall of the second slit portion and connecting the second upper electrode and the second lower electrode to each other; and a second external electrode layer disposed on the other end surface of the insulating substrate and covering the second slit electrode. Among the one surface of the insulating substrate, the other surface of the insulating substrate, and the one end surface of the insulating substrate, the first external electrode layer is disposed on only the one end surface of the insulating substrate. Among the one surface of the insulating substrate, the other surface of the insulating substrate, and the other end surface of the insulating substrate, the second external electrode layer is disposed on only the other end surface of the insulating substrate.
The above and other aspects, features, and advantages of the present disclosure will be more clearly understood from the following detailed description, taken in conjunction with the accompanying drawings, in which:
Hereinafter, embodiments of the present disclosure will be described as follows with reference to the attached drawings.
The terms used in the exemplary embodiments are used to simply describe an exemplary embodiment, and are not intended to limit the present disclosure. A singular term includes a plural form unless otherwise indicated. The terms, “include,” “comprise,” “is configured to,” etc. of the description are used to indicate the presence of features, numbers, steps, operations, elements, parts or combination thereof, and do not exclude the possibilities of combination or addition of one or more features, numbers, steps, operations, elements, parts or combination thereof. Also, the term “disposed on,” “positioned on,” and the like, may indicate that an element is positioned on or beneath an object, and does not necessarily mean that the element is positioned on the object with reference to a gravity direction.
The term “coupled to,” “combined to,” and the like, may not only indicate that elements are directly and physically in contact with each other, but also include the configuration in which the other element is interposed between the elements such that the elements are also in contact with the other component.
Sizes and thicknesses of elements illustrated in the drawings are indicated as examples for ease of description, and exemplary embodiments in the present disclosure are not limited thereto.
A value used to describe a parameter such as a 1-D dimension of an element including, but not limited to, “length,” “width,” “thickness,” diameter,” “distance,” “gap,” and/or “size,” a 2-D dimension of an element including, but not limited to, “area” and/or “size,” a 3-D dimension of an element including, but not limited to, “volume” and/or “size”, and a property of an element including, not limited to, “roughness,” “density,” “weight,” “weight ratio,” and/or “molar ratio” may be obtained by the method(s) and/or the tool(s) described in the present disclosure. The present disclosure, however, is not limited thereto. Other methods and/or tools appreciated by one of ordinary skill in the art, even if not described in the present disclosure, may also be used
In the drawings, a W direction is a first direction or a width direction, an L direction is a second direction or a length direction, and a T direction is a third direction or a thickness direction.
In the descriptions described with reference to the accompanied drawings, the same elements or elements corresponding to each other will be described using the same reference numerals, and overlapped descriptions will not be repeated.
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The insulating substrate 100 may have a plate shape having a predetermined thickness, and may include a material for effectively emitting heat generated from the resistor layer 200. The insulating substrate 100 may include a ceramic material such as alumina (Al2O3), but an example embodiment thereof is not limited thereto. The insulating substrate 100 may include a polymer material. As an example, the insulating substrate 100 may be configured as an alumina insulating substrate obtained by anodizing a surface of aluminum, but an example embodiment thereof is not limited thereto.
Referring to
The slit portions S1 and S2 may be disposed on central portions of the one end surface 103 and the other end surface 104 of the insulating substrate 100 in a width direction W, respectively. As the slit portions S1 and S2 are disposed on central portions of the one end surface 103 and the other end surface 104 of the insulating substrate 100 in the width direction W, respectively, solder, or the like, used to mount the resistor component 1000 on a printed circuit board may be stably bonded to the resistor component in the example embodiment.
Each of the slit portions S1 and S2 may have a semicircular shape with reference to an end surface in parallel to the one surface 101 of the insulating substrate 100. The slit portions S1 and S2 may be formed by processing a through-hole having a circular shaped end surface in a dicing line, a boundary between unit substrates of a large unit substrate, and separating a plurality of unit substrates by cutting out the large unit substrate along the dicing line. Accordingly, an end surface of each of the slit portions S1 and S2 formed on the one end surface 103 and the other end surface 104 of each unit substrate may have a semicircular shape. However, an example embodiment thereof is not limited thereto. A shape of the slit portions S1 and S2 may be varied according to an end surface of a hole formed in a large unit substrate.
The resistor layer 200 may be disposed on the one surface 101 of the insulating substrate 100. The resistor layer 200 may be connected to the first and second terminals 300 and 400 disposed on both end portions of the insulating substrate 100 in the length direction L and may exhibit a function of the resistor component 1000. The resistor layer 200 may have an area overlapping the first terminal 300 and the second terminal 400.
The resistor layer 200 may include a metal, a metal alloy, a metal oxide, or the like. In an example embodiment, the resistor layer 200 may include at least one of a Cu—Ni based alloy, an Ni—Cr based alloy, an Ru oxide, an Si oxide, or an Mn based alloy. The resistor layer 200 may be formed by applying a conductive paste including a metal, a metal alloy, a metal oxide, or the like, on one surface 101 of the insulating substrate 100 by a screen printing method, or the like, and sintering the paste.
The first terminal 300 and the second terminal 400 may be disposed on the insulating substrate 100 and may oppose each other in the length direction L. The first terminal 300 and the second terminal 400 may be connected to the resistor layer 200.
The first terminal 300 and the second terminal 400 may include internal electrode layers 310 and 410 including upper electrodes 311 and 411 disposed on the one surface 101 of the insulating substrate 100, lower electrodes 312 and 412 disposed on the other surface 102 of the insulating substrate 100, and slit electrodes 313 and 413 disposed on internal walls of the slit portions S1 and S2 and connecting the upper electrodes 311 and 411 to the lower electrodes 312 and 412, respectively, and external electrode layers 320 and 420 disposed on the one end surface 103 of the insulating substrate 100, the other end surface 104 of the insulating substrate 100, and the internal walls of the slit portions S1 and S2 to cover the slit portions S1 and S2 and having a thickness less than a thickness of each of the internal electrode layers 310 and 410, respectively.
For example, the first terminal 300 may include a first internal electrode layer 310 including a first upper electrode 311 disposed on the one surface 101 of the insulating substrate 100, a first lower electrode 312 disposed on the other surface 102 of the insulating substrate 100, and a first slit electrode 313 disposed on an internal wall of the first slit portion S1, and a first external electrode layer 320 disposed on the one end surface 103 of the insulating substrate 100 and the internal wall of the first slit portion S1. The second terminal 400 may include a second internal electrode layer 410 including a second upper electrode 411 disposed on the one surface 101 of the insulating substrate 100, a second lower electrode 412 disposed on the other surface 102 of the insulating substrate 100, and a second slit electrode 413 disposed on the internal wall of the second slit portion S2, and a second external electrode layer 420 disposed on the other end surface 104 of the insulating substrate 100 and the internal wall of the second slit portion S2. In one example, the first and second external electrode layers 320 and 420 may be disposed only on the one end surface 103 and the other end surface 104, respectively, without considering a thickness of the first internal electrode layer 310 and the second internal electrode layer 410. In one example, the first and second external electrode layers 320 and 420 may not be disposed on the one surface 101 of the insulating substrate 100, and the first and second external electrode layers 320 and 420 may not be formed the other surface 102 of the insulating substrate 100. The present disclosure, however, is not limited thereto.
The internal electrode layers 310 and 410 may be formed by applying a conductive paste on the one surface 101 of the insulating substrate 100, the other surface 102 of the insulating substrate 100, and the internal walls of the slit portions S1 and S2 and sintering the paste. Accordingly, the first upper electrode 311, the first lower electrode 312, and the first slit electrode 313 included in the first internal electrode layer 310 may be integrated with one another to conform to the one surface 101 of the insulating substrate 100, the other surface 102 of the insulating substrate 100, and the internal wall of the slit portion S1. Also, the second upper electrode 411, the second lower electrode 412, and the second slit electrode 413 included in the second internal electrode layer 410 may be integrated with one another to conform to the one surface 101 of the insulating substrate 100, the other surface 102 of the insulating substrate 100, and the internal wall of the second slit portion S2. The conductive paste for forming the internal electrode layers 310 and 410 may include metal powder such as copper (Cu), silver (Ag), nickel (Ni), a binder, and a glass composition. Accordingly, the internal electrode layers 310 and 410 may include glass and metal compositions.
A thickness d1 of each of the internal electrode layers 310 and 410 may be equal to or greater than 3 μm and equal to or less than 6 μm. When the thickness d1 of each of the internal electrode layers 310 and 410 is less than 3 μm, it may not be easy to form the slit electrodes 313 and 413 in the internal walls of the slit portions S1 and S2. When the thickness d1 of each of the internal electrode layers 310 and 410 exceeds 6 μm, an overall thickness of each of the first and second terminals 300 and 400 may increase such that it may be difficult to reduce a thickness of the component.
In one example, the thickness d1 of the internal electrode layer 310 may refer to a distance from one point of a line segment corresponding to one surface of the internal electrode layer 310 (a left side surface of the internal electrode layer 310 based on the direction in
Alternatively, based on an optical micrograph of a longitudinal-thickness cross-section (an LT cross-section) in the central portion of the resistor component 1000 in the width direction W, the thickness d1 of the internal electrode layer 310 may indicate, when normals respectively extend from a plurality of one points of a line segment corresponding to one surface of the internal electrode layer 310 (a left side surface of the internal electrode layer 310 based on the direction in
The internal electrode layers 310 and 410 may expose the one end surface 103 and the other end surface 104 of the insulating substrate 100, respectively. As the internal electrode layers 310 and 410 may be formed in a state of a large unit substrate in which the above-described through-hole is formed, the internal electrode layers 310 and 410 may not be formed on a plurality of side surfaces of a plurality of unit substrates obtained by cutting out the large unit substrate. Accordingly, the internal electrode layers 310 and 410 may not be formed on the one end surface 103 and the other end surface 104 of the insulating substrate 100 in the example embodiment.
As an example, the external electrode layers 320 and 420 may be formed by a vapor deposition method such as a sputtering process and may be formed of a metal. The external electrode layers 320 and 420 may be formed by forming a metal layer including at least one of titanium (Ti), chromium (Cr), molybdenum (Mo), and alloys thereof on the one end surface 103 and the other end surface 104 of the insulating substrate 100. Thus, the external electrode layers 320 and 420 may entirely cover each of the one end surface 103 and the other end surface 104 of the insulating substrate 100, respectively.
A thickness d2 of each of the external electrode layers 320 and 420 may be 0.07 μm or greater and 0.15 μm or less. When the thickness d2 of each of the external electrode layers 320 and 420 is less than 0.07 μm, cohesion force between the external electrode layers 320 and 420 and the one end surface 103 and the other end surface 104 of the insulating substrate 100 may decrease, and it may be difficult to form a plating electrode on the external electrode layers 320 and 420 by an electrolytic plating process. When the thickness d2 of each of the external electrode layers 320 and 420 exceeds 0.15 μm, process time and manufacturing costs may increase.
The thickness d2 of the external electrode layer 320 may refer to a distance from one point of a line segment corresponding to one surface of the external electrode layer 320 (a left side surface of the external electrode layers 320 based on the direction in
Alternatively, based on an optical micrograph of the longitudinal-thickness cross-section (an LT cross-section) in the central portion of the resistor component 1000 in the width direction W, the thickness d2 of the external electrode layer 320 may indicate, when normals respectively extend from a plurality of one points of a line segment corresponding to one surface of the external electrode layer 320 (a left side surface of the external electrode layers 320 based on the direction in
Although not illustrated in the diagrams, the first and second terminals 300 and 400 may further include plating electrodes disposed on the upper electrodes 311 and 411, the lower electrodes 312 and 412, and the external electrode layers 320 and 420, respectively. The plating electrode may be formed by an electrolytic plating process using the upper electrodes 311 and 411, the lower electrodes 312 and 412, and the external electrode layers 320 and 420 as seed layers. As the plating electrode is formed by an electrolytic plating process using at least one of a copper plating solution, a nickel plating solution, and a tin plating solution, the plating electrode may include at least one of copper (Cu), nickel (Ni), and tin (Sn). As an example, although not limited thereto, each of the plating electrodes may include a first layer, a nickel (Ni) plated layer, and a second layer, a tin (Sn) plated layer.
A protective layer G may be disposed on a surface of the resistor layer 200 on which the first and second terminals 300 and 400 are not disposed to protect the resistor layer 200 from external impacts. As an example, although not limited thereto, a protective layer 140 may be formed of silicon (SiO2) or a glass material.
The resistor component 1000 in the example embodiment may include the first and second terminals 300 and 400 each having a relatively reduced thickness, and may have improved reliability against external impacts such as vibrations, heat, or the like, such that connection reliability with a mounting substrate may be secured. For example, the first and second terminals 300 and 400 may be configured to include the internal electrode layers 310 and 410 formed on a surface of the insulating substrate 100 by a sintering process, and the external electrode layers 320 and 420 formed on the internal electrode layers 310 and 410 and a surface of the insulating substrate 100 by a vapor deposition process such as a sputtering process. As for the internal electrode layers 310 and 410, as a glass composition thereof may be chemically bonded with the insulating substrate 100 in a sintering process, cohesion force between the first and second terminals 300 and 400 and the insulating substrate 100 may improve. As the external electrode layers 320 and 420 are formed by a vapor deposition process such as a sputtering process, the external electrode layers 320 and 420 may have a reduced thickness and may be disposed on the one end surface 103 and the other end surface 104 of the insulating substrate 100 on which the internal electrode layers 310 and 410 are not disposed, and on the slit electrodes 313 and 413 of the internal electrode layers 310 and 410, and an electrolytic plating layer may be formed on the external electrode layers 320 and 420. Accordingly, an electrolytic plating layer may be formed to conform to the one end surface 103 of the insulating substrate 100, the other end surface 104 of the insulating substrate 100, and the internal walls of the slit portions S1 and S2 such that solder, or the like, for connection with a mounting substrate may be formed both of the one end surface 103 and the other end surface 104 of the insulating substrate 100.
The resistor component 1000 in the example embodiment may be manufactured by an efficient manufacturing process. For example, by forming the internal electrode layers 310 and 410 collectively on a large area substrate in which a through-hole is formed, a side surface process separately performed on a side surface of a unit substrate to connect an upper electrode to a lower electrode after a cutting out process may not be performed. Also, by collectively forming the external electrode layers 320 and 420 on exposed surfaces of a plurality of bar-shaped substrates obtained by primarily cutting out a large area substrate, the external electrode layer may be formed more efficiently as compared to a general process of forming the external electrode layer, performed after a secondary cutting out process for obtaining unit substrates.
When comparing a general process in which slit portions are not formed on one end surface and the other end surface of an insulating substrate with the example embodiment, in the example embodiment, the slit electrodes 313 and 413, sintered electrodes, may be formed along internal walls of the slit portions S1 and S2, and the external electrode layers 320 and 420 may be in contact with the slit electrodes 313 and 413, a difference from the general process. In the case of the general process, the external electrode layers 320 and 420 may only be in contact with an insulating substrate, and in this case, cohesion force between the elements may be relatively weak due to relatively low cohesion force between different materials. In the example embodiment, as the external electrode layers 320 and 420 may be in contact with the insulating substrate 100 (e.g., the one end surface 103 and the other end surface 104 of the insulating substrate 100) and may also be in contact with the slit electrodes 313 and 413 including the same material, cohesion force between the internal electrode layers 310 and 410 and the insulating substrate 100 and the external electrode layers 320 and 420 may improve.
Referring to
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Although not illustrated in the diagrams, before forming the first conductive layer 10 on the base insulating substrate 100A, a process of forming a non-penetrative type scribing line in the base insulating substrate 100A along the divisional lines C1 and C2 illustrated in
According to the aforementioned example embodiments, the resistor component may have improved cohesion reliability with a mounting substrate.
Also, efficiency of a method of manufacturing a resistor component may improve.
While the exemplary embodiments have been shown and described above, it will be apparent to those skilled in the art that modifications and variations could be made without departing from the scope of the present invention as defined by the appended claims.
Number | Date | Country | Kind |
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10-2019-0165450 | Dec 2019 | KR | national |
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3964087 | Mallon | Jun 1976 | A |
4486738 | Sadlo | Dec 1984 | A |
4788523 | Robbins | Nov 1988 | A |
6005474 | Takeuchi | Dec 1999 | A |
9396849 | Wyatt | Jul 2016 | B1 |
10332660 | Lee | Jun 2019 | B2 |
20030005576 | Tsukada | Jan 2003 | A1 |
20060132277 | Hetherton | Jun 2006 | A1 |
Number | Date | Country |
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H07-183108 | Jul 1995 | JP |
2006-19323 | Jan 2006 | JP |
Entry |
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JP H07-183108, Tamaki et al., machine translation. (Year: 1995). |