Claims
- 1. A rinse aid composition containing a non-nitrogen containing organo diphosphonic acid or a salt or complex thereof, at least 5% by weight of a surfactant system, and from 1% to 60% by weight of a carboxylate or polycarboxylate detergent builder selected from the group consisting of water soluble salts of lactic acid, glycolic acid and ethers thereof, succinic acid, malonic acid, (ethylenedioxy) diacetic acid, maleic acid, diglycolic acid, tartaric acid, tartronic acid, lamatic acid, citric acid, aconitic acid, and citraconic acid, the pH of said composition as a 1% solution in distilled water at 20.degree. C. being less than 7.
- 2. A rinse aid composition according to claim 1, wherein the detergent builder is included in an amount of from 2% to 30% by weight.
- 3. A rinse aid composition according to claim 1, wherein the detergent builder is included in an amount of from 2% to 20% by weight.
- 4. A rinse aid composition according to claim 1 containing an organic polymer containing acrylic acid or its salts, having an average molecular weight of less than 15,000.
- 5. A rinse aid composition according to claim 4 wherein said organic polymer is a homopolymer having a molecular weight of from 500 to 12,000.
- 6. A rinse aid composition according to claim 4 wherein said organic polymer is present at a level of from 0.005% to 20% by weight of the composition.
- 7. A rinse aid composition according to claim 1 wherein said non-nitrogen containing organo diphosphonic acid is a C.sub.1 to C.sub.4 diphosphonic acid present at a level of from 0.005% to 20% by weight of the composition.
- 8. A rinse aid composition according to claim 7 wherein said non-nitrogen containing organo diphosphonic acid is ethane-1-hydroxy-1,1 diphosphonic acid present at a level of from 0.1% to 15% by weight of the composition.
- 9. A rinse aid composition according to claim 1 containing from 0.005% to 20% by weight of a heavy metal ion sequestrant comprising at least one organo aminophosphonate, nitrilotriacetic acid, polyaminocarboxylic acid or iminodiacetic acid derivative.
- 10. A rinse aid composition according to claim 1 containing from 5% to 40% by weight of the surfactant system.
- 11. A rinse aid composition according to claim 1, wherein the pH of said composition as a 1% solution in distilled water at 20.degree. C. is from 0.5 to 6.5.
- 12. A rinse aid composition according to claim 1, wherein the pH of said composition as a 1% solution in distilled water at 20.degree. C. is from 1.0 to 5.0.
- 13. A rinse aid composition according to claim 1, wherein the surfactant system comprises at least one surfactant selected from the group consisting of anionic, cationic, nonionic, ampholytic and zwitterionic surfactants, and mixtures thereof.
- 14. A rinse aid composition containing a non-nitrogen containing organo diphosphonic acid or a salt or complex thereof, a surfactant system comprising at least one nonionic surfactant, and from 2% to 60% by weight of a carboxylate or polycarboxylate detergent builder selected from the group consisting of water soluble salts of lactic acid, glycolic acid and ethers thereof, succinic acid, malonic acid, (ethylenedioxy) diacetic acid, maleic acid, diglycolic acid, tartaric acid, tartronic acid, fumaric acid, citric acid, aconitic acid, and citraconic acid, the pH of said composition as a 1% solution in distilled water at 20.degree. C. being less than 7.
- 15. A rinse aid composition according to claim 14, wherein the detergent builder is included in an amount of from 2% to 30% by weight.
- 16. A rinse aid composition according to claim 14, wherein the detergent builder is included in an amount of from 2% to 20% by weight.
- 17. A rinse aid composition according to claim 14 containing an organic polymer containing acrylic acid or its salts, having an average molecular weight of less than 15,000.
- 18. A rinse aid composition according to claim 17 wherein said organic polymer is a homopolymer having a molecular weight of from 500 to 12,000.
- 19. A rinse aid composition according to claim 17 wherein said organic polymer is present at a level of from 0.005% to 20% by weight of the composition.
- 20. A rinse aid composition according to claim 14 wherein said non-nitrogen containing organo diphosphonic acid is a C.sub.1 to C.sub.4 diphosphonic acid present at a level of from 0.005% to 20% by weight of the composition.
- 21. A rinse aid composition according to claim 20 wherein said non-nitrogen containing organo diphosphonic acid is ethane-1-hydroxy-1,1 diphosphonic acid present at a level of from 0.1% to 15% by weight of the composition.
- 22. A rinse aid composition according to claim 14, wherein the surfactant system comprises at least one nonionic surfactant selected from the group consisting of ethoxylated and propoxylated nonionic surfactants.
- 23. A rinse aid composition according to claim 14, wherein the surfactant system is included in the composition in an amount of from 1% to 30% by weight.
- 24. A rinse aid composition according to claim 14, wherein the surfactant system is included in the composition in an mount of from 5% to 20% by weight.
- 25. A rinse aid composition according to claim 14 containing from 0.005% to 20% by weight of a heavy metal ion sequestrant comprising at least one organo aminophosphonate, nitrilotriacetic acid, polyaminocarboxylic acid or iminodiacetic acid derivative.
- 26. A rinse aid composition according to claim 14 containing from 0.5% to 40% by weight of the surfactant system.
Priority Claims (1)
Number |
Date |
Country |
Kind |
9326235 |
Dec 1993 |
GBX |
|
Parent Case Info
This is a continuation of application Ser. No. 08/350,352, filed on Dec. 6, 1994, now abandoned.
US Referenced Citations (12)
Foreign Referenced Citations (6)
Number |
Date |
Country |
0 364 067 |
Apr 1990 |
EPX |
4-332800 |
Nov 1992 |
JPX |
4332800 |
Nov 1992 |
JPX |
673 033 A5 |
Jan 1990 |
CHX |
2203163 |
Oct 1988 |
GBX |
2227021 |
Jul 1990 |
GBX |
Non-Patent Literature Citations (2)
Entry |
Chemical Abstract Accession No. 118:215376, for JP 4-332800, Nov. 19, 1992. |
Derwent Abstract Accession No. 93-004727, for JP 4-332800, Nov. 19, 1992. |
Continuations (1)
|
Number |
Date |
Country |
Parent |
350352 |
Dec 1994 |
|