The present application claims the benefit of TAIWAN Patent Application Serial Number 106142586 and 107105481 respectfully filed on Dec. 5, 2017 and Feb. 14, 2018, which are herein incorporated by reference.
The present invention relates to a mask, and particularly to a sanitary mask.
Recently, the ultraviolet ray is extremely strong and thus affects the recovery after facial cosmetic surgery especially seriously. Currently, all of the sanitary masks on the market only have the function of filtering out dust only. However, the traditional mask is unable to filter PM 2.5 particles and fail to have anti-UV function.
The present invention relates to a sanitary mask with the following properties. The present invention discloses a sanitary mask, including: an inner layer; a middle layer disposed on the inner layer and including an ultra-micro-perforated filtering membrane; and an outer layer disposed on the middle layer.
In another aspect, a sanitary mask includes an inner layer including scent molecules; a middle layer disposed on the inner layer and including an ultra-micro-perforated filtering membrane; and an outer layer disposed on the outer layer.
In still another aspect, a sanitary mask includes an inner layer; an ultra-micro-perforated filtering membrane formed over the inner layer; an antibacterial layer formed over the ultra-micro-perforated filtering membrane; and an outer layer disposed on the antibacterial layer.
In yet another aspect, a sanitary mask includes an inner layer; a middle layer disposed on the inner layer; and an outer layer disposed on the middle layer and wherein the outer layer includes antibacterial ingredients, wherein the antibacterial ingredients include lysozyme or anti-influenza medicine.
Generally, a sanitary mask at least includes three layers including an inner layer, a middle layer as a filter layer and an outer layer. The sanitary mask of the present invention includes a substrate including the outer layer manufactured by the following process, so as to have UV protection function.
A roll to roll device 106 is configured such that the roll to roll device 106 at least includes three rolls 102, wherein at least one roll is disposed in a dipping tank 104. The dipping tank 104 is employed to be loaded with dye. The rolls 102 may be driven by driving devices such as motors, so as to render them to rotate around an axis of rotation respectively and tug the soft substrate to move for example as shown by the curved arrow in
As the manufacturing process progresses, the substrate is moved from one undipped end to another end. At this time, the dipped substrate will be moved to another end to be collected. The dipped substrate can be rolled at another end because the substrate is flexible. If necessary, the heating device may be actuated to provide the heat energy for the drying process. Then, the rolled substrate may be performed with subsequent processing to form the sanitary mask or other articles, such as anti-UV umbrella fabric, anti-UV shade fabric. If necessary, the soft substrate may be coated with a buffer layer or a protective layer.
The present invention may employ non-metal or non-metallic oxide materials as the anti-UV material to avoid environmental pollution. The flexible substrate may be utilized such that the material may be manufactured into thin films on large scale via the roll to roll device of the present invention and the manufacturing process will not pollute the environment. The rotation speed of the axis of rotation may be controlled to control the growth thickness of the thin film and render the thin film to be attached to irregular or uneven surfaces.
Please refer to
The fabric surface of the anti-UV mask may be spray coated, dipped or coated with the anti-UV absorbent material or photochromic dye to achieve the anti-UV function. If the anti-UV coating is spray coated on the surface, the color change of the mask may be observed, thereby indicating the function of anti-UV. The traditional mask is not available to offer the anti-UV function, let alone observing the protective effect thereof. Actually, the traditional mask fails to provide any protection and thus is disadvantageous to the care after facial cosmetic surgery. The prevention from UV radiation is the most important procedure for the care after cosmetic surgery. Therefore, the present invention offers advantages of the skin care after cosmetic surgery. The traditional mask cannot achieve the aforementioned function at all.
The present invention dopes resin for example aqueous resin with the photochromic dye, and may mix the photochromic dye in the form of micro powders, capsules or liquid and the resin. For instance, the aqueous resin may be employed to mix with the hydrophilous photochromic dye to form the dip solution. The mixing ratio of the photochromic dye and the resin may be about 1:5 to about 1:20, wherein the dip solution may be diluted with water to adjust the viscosity thereof. The photochromic dye may absorb sunlight or ultraviolet radiation, and the chemical structure of the photochromic dye is changed after receiving the radiation. The photochromic dye can generate reversible chemical change after illuminated by the sunlight or UV radiation, thereby resulting in change of color. When not illuminated by the sunlight or UV light, the color of the mask changes back to the original color.
The photochromic dye may be optionally doped in the resin together with light stabilizer and UV absorber to assist in absorbing UV radiation. Adding antioxidant or/and UV absorber into the resin can enhance the anti-light fatigue. The photochromic dye may be, but be not limited to, spiropyrans, spiroxazines, fulgide, fulgimides, benzopyran, naphthopyran, spirobenzopyran, spironaphthopyran, spirobenzoxazine or spironaphthoxazine.
Synthetic fiber is monomer raw material obtained from nature and forms fiber by polymerization and fiber spinning. For example, condensation polymer: (A) polyamide fiber: Nylon 6, Nylon 6.6, Nylonll; (B) polyester fiber: PET, PBT, PTT; (C) addition polymer: (1) polyacrylonitrile fiber: PAN (also referred to as acrylic fiber); (2) polyethylene fiber: PE; (3) polypropylene fiber: PP; (4) polyvinylalcohol fiber: PVA; (5) polyvinylchloride fiber: PVC; (6) polytetrafluoroethylene fiber: PTFE; (7) polyurethane fiber: PU. Carbon fiber and glass fiber are classified as inorganic synthetic fiber. High functional fiber may include poly lactic acid, PBO fiber (p-phenylene-2,6-benzobisoxazole), high-tenacity polyester, polyamide, polyolefine, p-aromatic polyamide and meta-aromatic polyamide, carbon fiber, high-modulus polyethylene (HMPE), polyphenylene sulfide (PPS), phenlic fiber of polymer, polyether ether ketone (PEEK), P84, etc. The drying temperature may be below 150 degrees Celsius based on the choice of the photochromic dye and the processing temperature.
In another embodiment, the fusion process of the dye and the polymer may employ the following methods. For example, the melt spinning method: the photochromic material or color changeable material and the polymeric base material are melt spun, or the photochromic material is distributed in the resin carrier which can be mixed and melted in the spun polymer and is further mixed with polymer such as polyester, Nylon, polypropylene to perform melt spinning.
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The ultraviolet radiation with a wavelength from 100 nm to 280 nm has shorter wavelength and stronger energy. The most harmful to the skin is UVC which is mostly isolated by ozone layer in atmospheric layer and almost fails to reach the ground. The UV radiation with a wavelength from 280 nm to 320 nm has lower energy than that of UVC and can induce immediate sunburn of the skin and cause skin cutin thickening, darker skin, erythrosis, conjuncitivitis, painful and drier skin, which are mainly because of UVB.
The foregoing description is a preferred embodiment of the present invention. It should be appreciated that this embodiment is described for purposes of illustration only, not for limiting, and that numerous alterations and modifications may be practiced by those skilled in the art without departing from the spirit and scope of the present invention. It is intended that all such modifications and alterations are included insofar as they come within the scope of the present invention as claimed or the equivalents thereof.
Number | Date | Country | Kind |
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106142586 | Dec 2017 | TW | national |
107105481 | Feb 2018 | TW | national |