SBIR Phase I: Bottom Anti-Reflective Coatings - BARCs - for Production of Advanced Semiconductor Devices by 157 nm Lithography

Information

  • NSF Award
  • 0319158
Owner
  • Award Id
    0319158
  • Award Effective Date
    7/1/2003 - 21 years ago
  • Award Expiration Date
    12/31/2003 - 21 years ago
  • Award Amount
    $ 100,000.00
  • Award Instrument
    Standard Grant

SBIR Phase I: Bottom Anti-Reflective Coatings - BARCs - for Production of Advanced Semiconductor Devices by 157 nm Lithography

This Small Business Innovation Research Phase I project will develop bottom anti-reflective coatings (BARCs) for production of advanced semiconductor devices by 157 nm lithography . The NSF Phase I technical objectives are to demonstrate the feasibility of potential technical approaches to workable 157nm BARCs. The prototype 157 nm BARCs will be produced and characterized for critical industry requirements such as low reflectivity, fast plasma etching rate, and lithographic performance. At least one prototype will be selected and optimized for use with 157-nm photoresists so that the commercialization will be projected in the Phase II. <br/> The 157-nm BARCs developed from the NSF Phase I study will result in a significant step forward for 157-nm lithography technology and contribute to the future of advanced semiconductor devices (integrated circuits) fabrication.

  • Program Officer
    Muralidharan S. Nair
  • Min Amd Letter Date
    5/30/2003 - 21 years ago
  • Max Amd Letter Date
    5/30/2003 - 21 years ago
  • ARRA Amount

Institutions

  • Name
    Brewer Science Incorporated
  • City
    ROLLA
  • State
    MO
  • Country
    United States
  • Address
    2401 BREWER DR
  • Postal Code
    654017003
  • Phone Number
    5733640300

Investigators

  • First Name
    Liu
  • Last Name
    He
  • Email Address
    liu.he@brewerscience.com
  • Start Date
    5/30/2003 12:00:00 AM

FOA Information

  • Name
    Materials Research
  • Code
    106000