SBIR Phase I: EUV Source for Semiconductor Metrology

Information

• NSF Award
• 0839349

Owner

• KAPTEYN-MURNANE LABORATORIES, INC.

• Award Id

  0839349

• Award Effective Date

  1/1/2009 - 16 years ago

• Award Expiration Date

  6/30/2009 - 16 years ago

• Award Amount

  $ 99,518.00

• Award Instrument

  Standard Grant

This Small Business Innovation Research Phase I project is to develop a coherent extreme ultraviolet (EUV) light source for industrial application in support of EUV lithography.<br/><br/>The Broad impact of this project represents an area of fundamental interest to optical science. The High Harmonic Generation (HHG) process is the result of basic quantum physics at the extreme of high energy and short time scales. The development of phase matching techniques for HHG represents the precise coherent manipulation of matter on unprecedented short length and time scales. A further understanding may make it possible in future to generate coherent light at even shorter wavelengths, suitable for ultrahigh resolution biological imaging.

• Program Officer

  William Haines

• Min Amd Letter Date

  12/2/2008 - 16 years ago

• Max Amd Letter Date

  12/2/2008 - 16 years ago

• ARRA Amount

• Name

  KAPTEYN-MURNANE LABORATORIES, INC.

• City

  Boulder

• State

  CO

• Country

  United States

• Address

  4775 Walnut St. 102

• Postal Code

  803013081

• Phone Number

  3035449068

• First Name

  Sterling

• Last Name

  Backus

• Email Address

  sbackus@kmlabs.com

• Start Date

  12/2/2008 12:00:00 AM

• Name

  Industrial Technology

• Code

  308000

• Text

  SMALL BUSINESS PHASE I

• Code

  5371

• Text

  ELECT, PHOTONICS, & DEVICE TEC

• Code

  1517

• Text

  ELECTRONIC/PHOTONIC MATERIALS

• Code

  1775

• Text

  INFORMATION INFRASTRUCTURE & TECH APPL

• Code

  9139

• Text

  HIGH PERFORMANCE COMPUTING & COMM