SBIR Phase I: High Throughput Nanoscale Patterning with an Array of Carbon Nanotube Cold Field Emission Guns for Electron Beam Lithography

Information

• NSF Award
• 0945253

Owner

• 4WIND SCIENCE AND ENGINEERING, LLC.

• Award Id

  0945253

• Award Effective Date

  1/1/2010 - 14 years ago

• Award Expiration Date

  6/30/2010 - 14 years ago

• Award Amount

  $ 148,964.00

• Award Instrument

  Standard Grant

This Small Business Innovation Research Phase I project will prove the technical<br/>and commercial feasibility of a parallel electron beam (e-beam) lithography system utilizing an array of individually addressable carbon nanotube (CNT) cold field emitters. In Phase I, a 3×3 array of individually addressable CNT electron guns will be built and a suitable array of microcolumns will be explored. A higher throughput e-beam lithography system based on an array of electron sources will be built and characterized and is anticipated to achieve better than 10 nm patterning capability.<br/><br/>This novel nanoelectromechanical system (NEMS) technology will enable a low cost nanoscale lithography system for general laboratory usage, thus significantly increasing the accessibility of nanoscale patterning. The work will be conducted in an Industry, University, Government collaboration and thus facilitate the transfer of knowledge amongst these entities.

• Program Officer

  Grace Jinliu Wang

• Min Amd Letter Date

  9/17/2009 - 14 years ago

• Max Amd Letter Date

  9/17/2009 - 14 years ago

• ARRA Amount

• Name

  4WIND SCIENCE AND ENGINEERING, LLC.

• City

  Moffett Field

• State

  CA

• Country

  United States

• Address

  NASA Ames Research Center

• Postal Code

  940350000

• Phone Number

  6503365539

• First Name

  Cattien

• Last Name

  Nguyen

• Email Address

  cattien.nguyen@4windse.com

• Start Date

  9/17/2009 12:00:00 AM

• Name

  Industrial Technology

• Code

  308000