SBIR Phase I: In-Situ Characterization of Photoresist Properties by Fourier Transform Infrared Based IR Spectroscopy

Information

• NSF Award
• 9860798

Owner

• On-Line Technologies Incorporated

• Award Id

  9860798

• Award Effective Date

  1/1/1999 - 25 years ago

• Award Expiration Date

  6/30/1999 - 25 years ago

• Award Amount

  $ 99,699.00

• Award Instrument

  Standard Grant

9860798<br/> This Small Business Innovation Research Phase I will develop an in-line, FTIR-based sensor to monitor the chemistry of new deep ultraviolet chemically amplified resist materials used for advanced submicron photolithography in the semiconductor industry. A novel Fourier Transform InfraRed microscope integrated directly upon a commercial lithographic cluster tool will be developed that will provide rapid data on the resist chemistry between process steps. The sensor will incorporate optics and algorithms tailored to the analysis of photoresist chemistry. The proposed technology will lead to improved understanding of new, chemically amplified resists used for sub-micron lithography of semiconductor devices, which will lead to decreased process and product development times, higher yields and potentially closed-loop process control for lithographic applications.

• Program Officer

  Michael F. Crowley

• Min Amd Letter Date

  11/25/1998 - 26 years ago

• Max Amd Letter Date

  11/25/1998 - 26 years ago

• ARRA Amount

• Name

  On-Line Technologies Incorporated

• City

  East Hartford

• State

  CT

• Country

  United States

• Address

  87 Church Street

• Postal Code

  061083720

• Phone Number

  8602910719

• First Name

  Matthew

• Last Name

  Richter

• Email Address

  mattr@online-ftir.com

• Start Date

  11/25/1998 12:00:00 AM

• Name

  Engineering & Computer Science

• Code

  510403