SBIR Phase I: Molecular Layer Chemical Vapor Deposition for Advanced Metallization

Information

• NSF Award
• 9860994

Owner

• TimeDomain CVD Incorporated

• Award Id

  9860994

• Award Effective Date

  1/1/1999 - 26 years ago

• Award Expiration Date

  6/30/1999 - 25 years ago

• Award Amount

  $ 91,960.00

• Award Instrument

  Standard Grant

9860994<br/> This Small Business Innovation Research Phase I project from TimeDomain CVD Inc. will develop molecular layer chemical vapor deposition (MLCVD) processes and equipment for deposition of barrier metals, which are employed in IC manufacturing to prevent undesired interactions between layers. MLCVD techniques for titanium and tantalum-based barrier metals required for Cu metallization will be developed. The films deposited are intrinsically conformal, as well as intrinsically uniform in thickness across the substrate. Processing capabilities arising from this work can be incorporated in the barrier modules of cluster deposition tools.

• Program Officer

  Michael F. Crowley

• Min Amd Letter Date

  11/25/1998 - 26 years ago

• Max Amd Letter Date

  11/25/1998 - 26 years ago

• ARRA Amount

• Name

  TimeDomain CVD Incorporated

• City

  Fremont

• State

  CA

• Country

  United States

• Address

  4432 Enterprise St. Ste. I

• Postal Code

  945386331

• Phone Number

  5109791000

• First Name

  Daniel

• Last Name

  Dobkin

• Email Address

  dan d@timedomaincvd.com

• Start Date

  11/25/1998 12:00:00 AM

• Name

  Engineering & Computer Science

• Code

  510403