SBIR Phase I: Real-Time Sensing and Control for Physical Vapor Deposition (PVD) Processes in IC Manufacture

Information

  • NSF Award
  • 9761085
Owner
  • Award Id
    9761085
  • Award Effective Date
    1/1/1998 - 27 years ago
  • Award Expiration Date
    6/30/1998 - 26 years ago
  • Award Amount
    $ 100,000.00
  • Award Instrument
    Standard Grant

SBIR Phase I: Real-Time Sensing and Control for Physical Vapor Deposition (PVD) Processes in IC Manufacture

Sensys Instruments Corp. will develop innovative acoustic sensor and model-based multivariable control technology to measure and control wafer temperature and film thickness in Physical Vapor Deposition (PVD) processes, a key technology used in semiconductor device wafer fabrication. There are currently no commercially available sensors that can provide real-time measurements of wafer temperature and thickness in PVD processes. This project will create an integrated package of sensor hardware, signal processing software and control software, adapted for PVD equipment.

  • Program Officer
    Michael F. Crowley
  • Min Amd Letter Date
    11/13/1997 - 27 years ago
  • Max Amd Letter Date
    11/13/1997 - 27 years ago
  • ARRA Amount

Institutions

  • Name
    Sensys Instruments Corporation
  • City
    Santa Clara
  • State
    CA
  • Country
    United States
  • Address
    2090 Duane Avenue
  • Postal Code
    950543306
  • Phone Number
    4088440440

Investigators

  • First Name
    Fred
  • Last Name
    Stanke
  • Email Address
    fstanke@thermawave.com
  • Start Date
    11/13/1997 12:00:00 AM

FOA Information

  • Name
    Industrial Technology
  • Code
    308000