SBIR Phase II: Advanced Laser Patterning of Large Area Thin-Film Electrochromic Devices

Information

  • NSF Award
  • 0618631
Owner
  • Award Id
    0618631
  • Award Effective Date
    7/15/2006 - 17 years ago
  • Award Expiration Date
    6/30/2009 - 14 years ago
  • Award Amount
    $ 497,013.00
  • Award Instrument
    Standard Grant

SBIR Phase II: Advanced Laser Patterning of Large Area Thin-Film Electrochromic Devices

This Small Business Innovation Research (SBIR) Phase II project has the objective of developing and transfering to the production line laser ablation technology for the manufacture of large area thin-film electrochromic (EC) windows. Shadow masking is commonly used to pattern the electrochromic coatings on glass, but it results in unacceptable edge definition and is expensive. Laser ablation can replace masking to allow precise definition of window areas, regardless of size and shape, and has the potential to significantly reduce manufacturing costs.<br/><br/>Broader acceptance of electrochromic windows for commercial and residential buildings will enable significant energy savings, and the laser ablation technology is applicable to non-flat shapes, which could extend use of EC windows to other applications.

  • Program Officer
    Cheryl F. Albus
  • Min Amd Letter Date
    7/13/2006 - 17 years ago
  • Max Amd Letter Date
    5/12/2008 - 15 years ago
  • ARRA Amount

Institutions

  • Name
    SAGE ELECTROCHROMICS,INC.
  • City
    Faribault
  • State
    MN
  • Country
    United States
  • Address
    ONE SAGE WAY
  • Postal Code
    550215081
  • Phone Number
    5073314902

Investigators

  • First Name
    Harvey
  • Last Name
    Kalweit
  • Email Address
    hkalweit@sage-ec.com
  • Start Date
    7/13/2006 12:00:00 AM

FOA Information

  • Name
    Industrial Technology
  • Code
    308000
  • Name
    High Technology Materials
  • Code
    522100