NSF Award
9710637
*** 9710637 Dunn This Small Business Innovation Research Phase II project addresses the problems associated with current microelectronic lithography systems which utilize masking technology. These problems include: the need for multiple masks required for subsequent layers of an electronic module; the difficulties associated with generating large-area masks; and the dependence on foreign suppliers for mask substrates. The only available technology which does not require masks is laser direct-write imaging which suffers from an inherently slow speed due to it's bit-by-bit, serial mode of addressing. This project would eliminate those short-comings through the development of a maskless, large-area, high-throughput, high-resolution, lithography system which combines a Digital Micromirror Device (DMD) with patterning technology. The DMD is a micro-mechanical, spatial light modulator with high parallel-processing power which replaces the conventional mask seamless scanning technology. It can generate any possible pattern with high resolution over an unlimited area. The proposed program will fill a critical need in the microelectronics manufacturing industry, and also significantly increase U.S. competitiveness in an enabling technology area. The composite market for maskless lithography systems comprise four major application segments; flat-panel displays, (FPD's), multi-chip modules (MCM's), printed circuit boards (PCB's), and semiconductor integrated circuits (IC's). The total sales for these products exceeded $750 million in 1996 and is project to grow to over $1.5 billion in the 2002. ***
