SBIR Phase II: Ultra-Low k Interlayer Dielectrics for 22 nm Technology Node and Beyond

Information

• NSF Award
• 0848490

Owner

• DENDRITECH, INC

• Award Id

  0848490

• Award Effective Date

  1/15/2009 - 15 years ago

• Award Expiration Date

  3/31/2011 - 13 years ago

• Award Amount

  $ 500,000.00

• Award Instrument

  Standard Grant

This Small Business Innovation Research Phase II project is to develop a new technology for manufacturing ultra-low dielectric constant materials for leading-edge logic devices for the 22 nm technology node and beyond. The research approach is based on the bottom-up synthesis of honeycomb-like nano-structured films in which porogen component is pre-built into the nano-sized cells and can be decomposed in a strictly controlled manner. <br/><br/>By extending microchip miniaturization this project may impact information technologies and related fields. This program may also significantly expand the overall knowledge and understanding of nano-structured materials and nanotechnology in general.

• Program Officer

  Grace Jinliu Wang

• Min Amd Letter Date

  1/12/2009 - 15 years ago

• Max Amd Letter Date

  1/12/2009 - 15 years ago

• ARRA Amount

• Name

  DENDRITECH, INC

• City

  MIDLAND

• State

  MI

• Country

  United States

• Address

  3110 SCHUETTE DRIVE

• Postal Code

  486426944

• Phone Number

  9894962016

• First Name

  Petar

• Last Name

  Dvornic

• Email Address

  pdvornic@pittstate.edu

• Start Date

  1/12/2009 12:00:00 AM

• Name

  Industrial Technology

• Code

  308000