Claims
- 1. In a process for the recovery of:
- (a) C.sub.2+ hydrocarbons together with sulfur compounds, or
- (b) C.sub.3+ hydrocarbons together with sulfur compounds, from a gaseous mixture containing the hydrocarbons, CO.sub.2, at least one of H.sub.2 S, COS or a mercaptan and at least one of CH.sub.4 or an inert gas from the group comprising H.sub.2, N.sub.2 and CO, said process comprising scrubbing said gaseous mixture with a physical scrubbing medium to selectively remove (a) or (b) by absorption and regenerating resultant loaded scrubbing medium to produce a product stream containing (a) or (b) and regenerated scrubbing medium, the improvement wherein the scrubbing medium comprises a compound having one to two rings formed by 5 to 6 carbon atoms, respectively, wherein the compound comprises in total at least 9 and at the most 17 carbon atoms, and the rings are saturated, unsaturated or partially saturated.
- 2. A process according to claim 1, said compounds being of the following formulas: ##STR13## wherein in the positions 1 to 6 there may be one or two substituted groups, being identical or different, representing a hydrogen atom or an alkyl radical of 1-5 carbon atoms.
- 3. A process according to claim 1 wherein the compound is an alkylated mononuclear ring of 9 or 10 carbon atoms in total.
- 4. A process according to claim 1, said compound being isomeric trimethylbenzenes or propylbenzenes.
- 5. A process according to claim 1, said compound being of the following formulas: ##STR14## wherein in the positions 1 to 5 there may be one or two substituted groups, being identical or different, representing a hydrogen atom or an alkyl radical of 1-5 carbon atoms.
- 6. A process according to claim 1, said compound being trimethylcyclohexane, propylcyclohexane, or butylcyclohexane.
- 7. A process according to claim 1, said compound being butylcyclopentane.
- 8. A process according to claim 1, said compound being of the following formulas: ##STR15## wherein in the positions 1 to 8, 9 or 10 there may be one or two substituted groups, being identical or different, representing a hydrogen atom or an alkyl radical of 1 to 5 carbon atoms.
- 9. A process according to claim 1, said compounds being decahydronaphthalene, tetrahydronaphthalene, or 1-methylnaphthalene.
- 10. A process according to claim 1, said compound being of the following formulas: ##STR16## wherein in the positions 1 to 7 or 9, there may be one or two substituted groups, being identical or different, representing a hydrogen atom or an alkyl radical of 1 to 5 carbon atoms.
- 11. A process according to claim 1, said compound being indan or indene.
- 12. A process according to claim 1, said compound being of the following formulas: ##STR17## wherein in the positions 1 to 9, 10 or 11 there may be one or two substituted groups, being identical or different, representing a hydrogen atom or an alkyl radical of 1 to 5 carbon atoms.
- 13. A process according to claim 1, said compound being of the following formulas: ##STR18## wherein in the positions 1 to 8 or 10 there may be one or two substituted groups, being identical or different, representing a hydrogen atom or an alkyl radical of 1 to 5 carbon atoms.
- 14. A process according to claim 1, said compound being halogen-substituted.
- 15. A process according to claim 14, said compound being chlorine-substituted.
- 16. A process according to claim 1, where the scrubbing medium comprises a mixture of at least two of said compounds.
- 17. A process according to claim 1, said scrubbing medium further comprising toluene or xylene.
- 18. A process according to claim 1, said scrubbing medium further comprising a minor amount of a polar, organic, water-dissolving, physical solvent.
- 19. A process according to claim 17, said scrubbing medium further comprising a minor amount of a polar, organic, water-dissolving, physical solvent.
- 20. A process according to claim 17, said toluene, or xylenes being present in an amount of up to 25% by weight of said compound.
- 21. A process according to claim 1, characterized by conducting the scrubbing operation at temperatures of between -20.degree. C. and +40.degree. C.
- 22. A process according to claim 1, wherein said gaseous mixture contains CH.sub.4 and said scrubbing agent consists essentially of at least one alkylated ring compound of 9 or 10 carbon atoms.
- 23. A process according to claim 22, wherein the gaseous mixture contains a major amount of CH.sub.4.
- 24. A process according to claim 22, said alkylated ring compound being admixed with toluene or xylene.
- 25. A process according to claim 22, said alkylated ring compound being admixed with a polar, organic, water-dissolving, physical solvent to remove H.sub.2 O from the gas.
- 26. A process according to claim 22, wherein the alkylated ring compound is trimethylbenzene propylbenzene, decaline or tetraline.
- 27. In a process for the recovery of:
- (a) C.sub.2+ hydrocarbons together with sulfur compounds,
- (b) C.sub.3+ hydrocarbons together with sulfur compounds from a gaseous mixture containing the hydrocarbons, at least one of H.sub.2 S, COS or a mercaptan and at least one of CH.sub.4 or an inert gas from the group comprising H.sub.2, N.sub.2 and CO, said process comprising scrubbing said gaseous mixture with a physical scrubbing medium to selectively remove (a) or (b) by absorption and regenerating resultant loaded scrubbing medium to produce a product stream containing (a) or (b) and regenerated scrubbing medium, the improvement wherein the scrubbing medium comprises a compound having one to two rings formed by 5 to 6 carbon atoms, respectively, wherein the compound comprises in total at least 9 and at the most 17 carbon atoms, and the rings are saturated or partially saturated.
Priority Claims (2)
Number |
Date |
Country |
Kind |
3529216 |
Aug 1985 |
DEX |
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3535764 |
Oct 1985 |
DEX |
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Parent Case Info
This application is a continuation-in-part of Ser. No. 871,988, filed June 9, 1986.
US Referenced Citations (15)
Foreign Referenced Citations (3)
Number |
Date |
Country |
6630081 |
Aug 1984 |
AUX |
936650 |
Dec 1955 |
DEX |
1115786 |
Sep 1984 |
SUX |
Non-Patent Literature Citations (1)
Entry |
Rompps Chemie-Lexikon, 8. Auflage, pp. 875 and 3524 (1981). |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
871988 |
Jun 1986 |
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